MA56073A - Solution de révélateur pour founir des plaques d'impression flexographiques et procédé pour fabriquer des plaques d'impression flexographique utilisant celle-ci - Google Patents
Solution de révélateur pour founir des plaques d'impression flexographiques et procédé pour fabriquer des plaques d'impression flexographique utilisant celle-ciInfo
- Publication number
- MA56073A MA56073A MA056073A MA56073A MA56073A MA 56073 A MA56073 A MA 56073A MA 056073 A MA056073 A MA 056073A MA 56073 A MA56073 A MA 56073A MA 56073 A MA56073 A MA 56073A
- Authority
- MA
- Morocco
- Prior art keywords
- flexographic printing
- printing plates
- same
- developer solution
- providing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20159517.0A EP3872569A1 (fr) | 2020-02-26 | 2020-02-26 | Solution de révélateur pour founir des plaques d'impression flexographiques et procédé pour fabriquer des plaques d'impression flexographique utilisant celle-ci |
Publications (1)
Publication Number | Publication Date |
---|---|
MA56073A true MA56073A (fr) | 2022-04-06 |
Family
ID=69740225
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MA056073A MA56073A (fr) | 2020-02-26 | 2021-02-25 | Solution de révélateur pour founir des plaques d'impression flexographiques et procédé pour fabriquer des plaques d'impression flexographique utilisant celle-ci |
Country Status (3)
Country | Link |
---|---|
US (1) | US11650507B2 (fr) |
EP (2) | EP3872569A1 (fr) |
MA (1) | MA56073A (fr) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04147261A (ja) * | 1990-10-11 | 1992-05-20 | Konica Corp | 湿し水不要感光性平版印刷版 |
US6162593A (en) * | 1999-10-26 | 2000-12-19 | Wyatt; Marion F. | Diisopropylbenzene containing solvent and method of developing flexographic printing plates |
US20060040218A1 (en) * | 2004-08-18 | 2006-02-23 | Wyatt Marion F | Terpene ether solvents |
EP2040124A1 (fr) * | 2007-09-24 | 2009-03-25 | Eastman Kodak Company | Procédé de fabrication de plaques d'impression lithographiques |
US8632961B2 (en) * | 2010-01-28 | 2014-01-21 | Eastman Kodak Company | Flexographic processing solution and use |
FR2976290B1 (fr) * | 2011-06-09 | 2014-08-15 | Jerome Daviot | Composition de solutions et conditions d'utilisation permettant le retrait et la dissolution complete de resines photo-lithographiques |
KR102475604B1 (ko) * | 2016-08-25 | 2022-12-08 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 |
-
2020
- 2020-02-26 EP EP20159517.0A patent/EP3872569A1/fr not_active Withdrawn
-
2021
- 2021-02-25 MA MA056073A patent/MA56073A/fr unknown
- 2021-02-25 US US17/184,790 patent/US11650507B2/en active Active
- 2021-02-25 EP EP21159349.6A patent/EP3872570A1/fr active Pending
Also Published As
Publication number | Publication date |
---|---|
EP3872570A1 (fr) | 2021-09-01 |
US11650507B2 (en) | 2023-05-16 |
EP3872569A1 (fr) | 2021-09-01 |
US20210263417A1 (en) | 2021-08-26 |
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