LV14938A - Gaseous-discharge electron gun - Google Patents
Gaseous-discharge electron gunInfo
- Publication number
- LV14938A LV14938A LVP-13-73A LV130073A LV14938A LV 14938 A LV14938 A LV 14938A LV 130073 A LV130073 A LV 130073A LV 14938 A LV14938 A LV 14938A
- Authority
- LV
- Latvia
- Prior art keywords
- amacr
- emacr
- scaron
- imacr
- electron
- Prior art date
Links
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 239000012212 insulator Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/301—Arrangements enabling beams to pass between regions of different pressure
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/16—Remelting metals
- C22B9/22—Remelting metals with heating by wave energy or particle radiation
- C22B9/228—Remelting metals with heating by wave energy or particle radiation by particle radiation, e.g. electron beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/077—Electron guns using discharge in gases or vapours as electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06325—Cold-cathode sources
- H01J2237/06366—Gas discharge electron sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Toxicology (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Izgudrojums attiecas uz elektroniku, konkrēti - uz tehnoloģiska pielietojuma gāzizlādes elektronu lielgabaliem, un var tikt izmantots kausēšanai, iztvaicēšanai un citiem termiskiem procesiem, ko veic vakuumā, izmantojot dažādas gāzes, ieskaitot reaktīvās gāzes, un jaudīgus elektronu kūļus. Tā mērķis ir darba spiedienu diapazona paplašināšana, termiskajos procesos izmantojot gāzizlādes elektronu lielgabalus un palielinot to darba stabilitāti. Piedāvātais gāizlādes elektronu lielgabals, kas satur hermētiskā korpusā uz augstsprieguma izolatoriem izvietotus katodu un anodu, kura ass sakrīt ar katoda asi un kurā ir atvērums elektronu staru izvadei, kā arī satur pie anoda pievienotu staru vadu ar divām fokusējošām lēcām un kūli novirzošām spolēm, kuras ir piestiprinātas pie staruvada, ir raksturīgs ar to, ka starp fokusējošo lēcu un novirzošajām spolēm ir izvietota gāzes balasta kamera, kura aptver staruvadu, ir aprīkota ar atsūknēšanai paredzēto īscauruli un ar staruvadu ir savienota ar atvērumiem, kuru šķērsizmērs nepārsniedz 5 līdz 6 mm, bet to summārā gāzes vadītspēja pārsniedz staruvada vadītspēju starp gāzes balasta kameru un tā griezumu.The invention relates to electronics, concrete & emacration-to-technology & gateway & gateway & emacration electron guns, and can be used for ē š evacuation ē š and other thermal processes performed by ā ā g ā s, including Reaction ī v Ā s Ā s Ā g ā gus electron ū ļ us. T ā m ē r ķ is a range of work pressure ranges š in & amacr & scaron, using g ā zizl ā des electron guns and increasing their operational stability ā A & amacr & gt > em & c > electron gun containing ē tisk ā housing ā cathode and anode placed on high-voltage insulators, the axis of which coax ī t with the cathode axis and where ā rum ē rum electron beam output, k ā with ī contains an anode connected beam with div ā m ē š ā ē c ā < tb > ē ē that between the focus ē in š o ē cu and š ā m spol ē m located in the g ā with a beam is connected to the ē ķ ē s ē s ē is less than 5 l ī 6 mm, but the sum ā r ā g & amacr t & emacr tsp ē if ā r ’ t & t &rs; ē between g ā ballast chamber & t ā cut.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
LVP-13-73A LV14938B (en) | 2013-05-31 | 2013-05-31 | Gaseous-discharge electron gun |
PCT/LV2013/000013 WO2014193207A1 (en) | 2013-05-31 | 2013-11-27 | The gas-discharge electron gun |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
LVP-13-73A LV14938B (en) | 2013-05-31 | 2013-05-31 | Gaseous-discharge electron gun |
Publications (2)
Publication Number | Publication Date |
---|---|
LV14938A true LV14938A (en) | 2014-12-20 |
LV14938B LV14938B (en) | 2015-02-20 |
Family
ID=49958646
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
LVP-13-73A LV14938B (en) | 2013-05-31 | 2013-05-31 | Gaseous-discharge electron gun |
Country Status (2)
Country | Link |
---|---|
LV (1) | LV14938B (en) |
WO (1) | WO2014193207A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104505325B (en) * | 2014-12-15 | 2016-08-17 | 中国航空工业集团公司北京航空制造工程研究所 | A kind of high voltage gas discharge electron gun arrangements |
CN105992449A (en) * | 2015-02-26 | 2016-10-05 | 李晓粉 | Beam leading-out device of accelerator |
LV15213B (en) * | 2016-10-21 | 2017-04-20 | Kepp Eu, Sia | Gaseous-discharge electron-beam gun |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3308325A (en) * | 1962-09-08 | 1967-03-07 | Bendix Balzers Vacuum Inc | Electron beam tube with ion shield |
US3271556A (en) * | 1963-10-31 | 1966-09-06 | Lockheed Aircraft Corp | Atmospheric charged particle beam welding |
RU2323502C1 (en) | 2006-07-03 | 2008-04-27 | Открытое акционерное общество "Чепецкий механический завод" (ОАО ЧМЗ) | Gaseous-discharge electron gun |
UA18148U (en) * | 2006-07-04 | 2006-10-16 | Mykola Petrovych Kondratii | Gas-discharge electron gun |
-
2013
- 2013-05-31 LV LVP-13-73A patent/LV14938B/en unknown
- 2013-11-27 WO PCT/LV2013/000013 patent/WO2014193207A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2014193207A1 (en) | 2014-12-04 |
LV14938B (en) | 2015-02-20 |
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