LT5930B - Method for identification of material resources - Google Patents

Abstract

The invention relates to identification of material resources domain and can be used for marking of electrically conductive parts. Material resource identification method is characterized by applying on the identification tag identification number, information grid and reproducible matrix, forming a surface by physical methods, and the introduction to the database identification number. New is that unrecognizable matrix is formed separately from the product on a nano-film stochastically by dotted evaporation of nano-film areas or forming its surface roughness and then applying on an object (product) surface.

Description

The invention is within the scope of material resource identification and can be used to identify electrically conductive parts, for example, vehicle surfaces coated with nanofilm.

A known method for identifying solids (see Republic of Moldova Patent No. 3390, G08 G 1/017, 1999) is by surface marking with high-speed particle flow. This method of identification can only be used for marking relatively soft metal surfaces.

It is also known that nanoplastic is used to increase the hardness, abrasion resistance, and other preprogrammed surface quality parameters of metal surfaces.

Known method of identifying metal parts (see Moldovan Republic Patent No. 3389, G08 G 1/017, 1999), where metal surfaces are marked by a mesh and non-reproducible matrix so that the electrical discharge between the tag and electrode and the common identification number and non-recoverable matrices enter the database. The disadvantage of the given analogue is that the spark discharges on the metal surface leave an unpredictable shape. This feature guarantees object recognition during an identification examination, during which the expert compares the marks on the tag (Fig. 1) with the spots in the database. Fig. 1 shows that there are many obstructions between the spark discharge spots that are unrelated to the spark discharge process. This complicates the automation of the identification process as it is difficult to define the spark discharge problem while at the same time forming an objective database.

There is a known non-repetitive method of carrying the identification tag (see RF Positive Application No. 2007119974), in which the tag is divided into several areas, which allows certain technological processes to be performed. This makes it difficult to fit many areas into a unit of area while controlling the process while protecting other areas with a dielectric stencil.

This method is adopted as a prototype.

The object of the present invention is to increase the efficiency of the method of applying the non-reproducible identification mark.

The object of the invention is achieved by applying the identification number, the information grid and the non-reproducible matrix to the identification tag during the manufacturing process in one of the following physical steps: realizing the discharge between the tag and the electrode; impact of pulsed laser; plasma method; evaporation and condensation; the introduction of electrons, atomic ions, and individual nanoparticles in a cluster using primary emission, and the common identification number and non-repeatable matrix in the database.

The peculiarity of the presented method is that the non-repeatable matrix is formed separately from the article (object) on the nanofilm stochastically by spot evaporation or by creating surface irregularities and then deposited on the object surface. In this method, the spark discharge on the nanofilm forms individual holes. Scanning the nanofilm thus prepared (Fig.2) clearly shows the contours of the stain left by the spark discharge process, thus avoiding the uncertainty and any hindrance to database formation. The nanofilm thus prepared, i.e. Nano-tag properties are applied to the surface of the article (object) according to a known methodology. There are many methods of depositing nanofilms that require matching the properties of the film itself with the surface properties of the article (object). It is undesirable to use nanofilm with nano-tag properties in areas where there is extremely high friction.

Fig. 3 is a schematic view of the device (side view) whereby all the parameters of the identification tag are formed on the nanofilm.

The device consists of a high voltage pointed electrode 1 connected to a high voltage source 2, a capacitor 3, a nanofilm 4, an article (object) for identification which is not directly connected to the spark discharge process and on which a nanofilm is subsequently deposited.

Fig. 4 is a schematic diagram (top view) of a nanofilm 4 having an identification number 6, a grid 7, and a non-reproducible matrix 8 consisting of a set of points resulting from the evaporation process.

First example of a method implementation:

A 100-110 nanometer thickness nanofilm was used to realize the method.

The gap between the nanofilm and the high voltage pointed electrode is maintained between 15 and 20 millimeters. An 18-22 kilovolt voltage is supplied to the electrode from a high voltage source through a discharge capacitor with a capacitance of 470 to 1000 picofarads. Indentification tags during the application process i.e. From 30 to 40 seconds, 80 to 120 different size and shape holes were recorded on the nanofilm. The likelihood of reproducing such a nanofilm is practically unrealistic.

Second example of a method implementation:

300-350 nanometer thickness nanofilm was used to implement the method. The gap between the nanofilm and the high voltage pointed electrode is maintained between 12 and 16 millimeters. A 14-16 kilovolt voltage is supplied to the electrode from a high voltage source through a discharge capacitor with a capacitance of 200 to 470 picofarads. Indentification tags during the application process i.e. Between 60 and 80 different size and shape holes were recorded on the nanofilm in 30-40 seconds. In this case, the relatively thick nanofilm had a smaller number of holes due to insufficient high voltage source energy. However, the likelihood of reproducing such a nanofilm is practically unrealistic.

The third example of a method implementation:

The equipment employs a laser with a pulse energy of up to 10 joules and a pulse duration of 10 ' ³ to 10 ⁴ seconds. The future nanofilm was molded on a refrigerated tray in a vacuum chamber with an optically transparent laser beam. This method has resulted in a number of surface effects forming the nanofilm, which can be used to create areas of information recording.

Fourth example of a method implementation:

The equipment uses a gas discharge source ΗΠΦ-800 located in a vacuum chamber. A pulse sequence frequency of up to 10 hertz, a duration of 10 ' ³ seconds, and an energy discharge of 800 Joules provide a temperature control of up to 25,000 ° Kelvin during which atoms;

nanoparticles; nanoparticle clusters evaporate from the surface, thereby forming traces of unlimited information in the nanofilm.

Claims (5)

Definition of the Invention 1. A method of identifying material resources by applying an identification number, a mesh and an irreversible matrix to the identification tag, physically mapping the surface and entering an identification number into the database, except that the non-reproducible matrix is formed stoastically on the nanofilm spot evaporation of the nanofilm areas or formation of surface irregularities thereon and subsequently deposited on the surface of the (article) object. 2. A method as claimed in claim 1, characterized in that the deposition of the nanofilm can be carried out by atomic layers Xj (where i = 1,2,3 ... number of layers) by angstroms, which allows forming a wide variety of tags enabling the technological requirements of the product (object). . 3. A process according to claim 2, characterized in that the nanofilms can be formed from various materials and their alloys by injection technology. 4. A process according to claim 3, characterized in that the nanofilms can be formed from various materials and their alloys using laser deposition, plasma method, evaporation and condensation as well as primary emission and electron implantation, atoms, ions, photons, nanoparticles and nanoparticle clusters. . 5. A method according to claim 2.3, characterized in that the operations referred to in said claims may be combined.