KR980005403A - Plasma processing apparatus of semiconductor element - Google Patents
Plasma processing apparatus of semiconductor element Download PDFInfo
- Publication number
- KR980005403A KR980005403A KR1019960023903A KR19960023903A KR980005403A KR 980005403 A KR980005403 A KR 980005403A KR 1019960023903 A KR1019960023903 A KR 1019960023903A KR 19960023903 A KR19960023903 A KR 19960023903A KR 980005403 A KR980005403 A KR 980005403A
- Authority
- KR
- South Korea
- Prior art keywords
- processing apparatus
- plasma processing
- chamber
- semiconductor element
- semiconductor device
- Prior art date
Links
Abstract
본 발명에 의한 반도체 소자의 플라즈마 처리 장치는 챔버 내부의 가스를 펌핑 아웃하는 배기라인과 상기 챔버가 연결되는 부분에 전압을 인가함으로써, 종래와 같이 플라즈마 공정후 상기 챔버내에 남아있는 파티클이 웨이퍼 표면에 부착되는 현상을 방지할 수 있다.In the plasma processing apparatus of the semiconductor device according to the present invention, by applying a voltage to an exhaust line for pumping out the gas inside the chamber and a portion where the chamber is connected, particles remaining in the chamber after the plasma process, as in the prior art, are applied to the wafer surface. The phenomenon of sticking can be prevented.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제1도는 본 발명에 의한 반도체 소자의 플라즈마 처리 장치를 나타낸 블럭도이다.1 is a block diagram showing a plasma processing apparatus of a semiconductor device according to the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960023903A KR980005403A (en) | 1996-06-26 | 1996-06-26 | Plasma processing apparatus of semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960023903A KR980005403A (en) | 1996-06-26 | 1996-06-26 | Plasma processing apparatus of semiconductor element |
Publications (1)
Publication Number | Publication Date |
---|---|
KR980005403A true KR980005403A (en) | 1998-03-30 |
Family
ID=66288425
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960023903A KR980005403A (en) | 1996-06-26 | 1996-06-26 | Plasma processing apparatus of semiconductor element |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR980005403A (en) |
-
1996
- 1996-06-26 KR KR1019960023903A patent/KR980005403A/en not_active Application Discontinuation
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Legal Events
Date | Code | Title | Description |
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WITN | Withdrawal due to no request for examination |