KR980005322U - 반도체 설비의 배기가스량 확인장치 - Google Patents

반도체 설비의 배기가스량 확인장치

Info

Publication number
KR980005322U
KR980005322U KR2019960016020U KR19960016020U KR980005322U KR 980005322 U KR980005322 U KR 980005322U KR 2019960016020 U KR2019960016020 U KR 2019960016020U KR 19960016020 U KR19960016020 U KR 19960016020U KR 980005322 U KR980005322 U KR 980005322U
Authority
KR
South Korea
Prior art keywords
exhaust gas
semiconductor equipment
checking
checking exhaust
semiconductor
Prior art date
Application number
KR2019960016020U
Other languages
English (en)
Other versions
KR200153149Y1 (ko
Inventor
허명준
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019960016020U priority Critical patent/KR200153149Y1/ko
Publication of KR980005322U publication Critical patent/KR980005322U/ko
Application granted granted Critical
Publication of KR200153149Y1 publication Critical patent/KR200153149Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
KR2019960016020U 1996-06-15 1996-06-15 반도체 설비의 배기가스량 확인장치 KR200153149Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960016020U KR200153149Y1 (ko) 1996-06-15 1996-06-15 반도체 설비의 배기가스량 확인장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960016020U KR200153149Y1 (ko) 1996-06-15 1996-06-15 반도체 설비의 배기가스량 확인장치

Publications (2)

Publication Number Publication Date
KR980005322U true KR980005322U (ko) 1998-03-30
KR200153149Y1 KR200153149Y1 (ko) 1999-08-02

Family

ID=19458659

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960016020U KR200153149Y1 (ko) 1996-06-15 1996-06-15 반도체 설비의 배기가스량 확인장치

Country Status (1)

Country Link
KR (1) KR200153149Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112051012A (zh) * 2019-06-06 2020-12-08 Asm Ip私人控股有限公司 包括气体检测器的气相反应器系统

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112051012A (zh) * 2019-06-06 2020-12-08 Asm Ip私人控股有限公司 包括气体检测器的气相反应器系统
CN112051012B (zh) * 2019-06-06 2024-04-09 Asmip私人控股有限公司 包括气体检测器的气相反应器系统

Also Published As

Publication number Publication date
KR200153149Y1 (ko) 1999-08-02

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20070418

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee