KR980003697A - Reflection type substrate, manufacturing method thereof, and liquid crystal display device using the same - Google Patents

Reflection type substrate, manufacturing method thereof, and liquid crystal display device using the same Download PDF

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Publication number
KR980003697A
KR980003697A KR1019960026329A KR19960026329A KR980003697A KR 980003697 A KR980003697 A KR 980003697A KR 1019960026329 A KR1019960026329 A KR 1019960026329A KR 19960026329 A KR19960026329 A KR 19960026329A KR 980003697 A KR980003697 A KR 980003697A
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KR
South Korea
Prior art keywords
substrate
type substrate
liquid crystal
crystal display
light reflection
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Application number
KR1019960026329A
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Korean (ko)
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KR100460060B1 (en
Inventor
박한준
노봉규
이승희
Original Assignee
김주용
현대전자산업 주식회사
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Priority to KR1019960026329A priority Critical patent/KR100460060B1/en
Publication of KR980003697A publication Critical patent/KR980003697A/en
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Publication of KR100460060B1 publication Critical patent/KR100460060B1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/02—Function characteristic reflective

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  • Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)

Abstract

본 발명은 반사형 기판, 그의 제조 방법 및 그를 사용한 액정표시장치가 개시된다.Disclosed is a reflective type substrate, a method of manufacturing the same, and a liquid crystal display device using the same.

본 발명에 따르면, 광반사 기능을 갖는 화소전극이나 대향전극을 연속적인 파형 형태로 형성하여 파장 의존성을 축소시킴으로써, 어떤 간섭색도 없는 만족할만한 밝은 표시를 얻을 수 있다. 그 외에도, 포토마스크를 이용해 포토리소그래피 공정으로 볼록부들을 형성하면, 볼록부들을 재현성이 양호하게 형성할 수 있고, 이 볼록부 때문에 화소전극 윗면도 재현성이 양호하게 만들 수 있다.According to the present invention, satisfactory bright display without any interference color can be obtained by forming the pixel electrode or the counter electrode having the light reflection function in a continuous wave form and reducing the wavelength dependency. In addition, when the convex portions are formed by a photolithography process using a photomask, the convex portions can be formed with good reproducibility, and the convex portion can also improve the reproducibility of the top surface of the pixel electrode.

Description

반사형 기판, 그의 제조 방법 및 그를 사용한 액정표시장치Reflection type substrate, manufacturing method thereof, and liquid crystal display device using the same

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제3도는 본 발명의 반사형 액티브 매트릭스 기판의 단면도.FIG. 3 is a cross-sectional view of a reflective active matrix substrate of the present invention. FIG.

제4a도 내지 제4e도는 제1도의 반사형 액티브매트릭스 기판에 화소전극을 제조하기 위한 고정을 나타낸 단면도.Figs. 4a to 4e are cross-sectional views showing fixation for manufacturing a pixel electrode on a reflective active matrix substrate of Fig. 1; Fig.

제5도는 실시예 1의 반사형 액티브매트릭스 기판을 제조하기 위해 사용되는 포토마스크를 도시한 평면도.FIG. 5 is a plan view showing a photomask used for manufacturing a reflective active matrix substrate of Example 1. FIG.

Claims (7)

광반사 방지막이 소자가 형성되어질 절연 하부기판의 배면에 어떠한 평판부도 없이 연속 파형을 갖는 것을 특징으로 하는 반사형 기판.Wherein the light reflection preventing film has a continuous waveform on the back surface of the insulating lower substrate on which the device is to be formed without any flat plate. 제1항에 있어서, 상기 절연 하부 기판 전면에는 폴리머 수지막이 형성되고, 상기 폴리머 수지막은 광감성 수지로 형성된 것을 특징으로 하는 반사형 기판.The reflective type substrate according to claim 1, wherein a polymer resin film is formed on the entire surface of the insulating lower substrate, and the polymer resin film is formed of a photosensitive resin. 제1항에 있어서, 상기 광 반사 방지막은 Al, Ni, Cr, Ag 금속중 선택되는 하나의 금속으로 형성되는 것을 특징으로 하는 반사형 기판.The reflection type substrate according to claim 1, wherein the light reflection prevention film is formed of one selected from the group consisting of Al, Ni, Cr and Ag metals. 광반사 방지막이 절연 하부 기판의 소자가 형성되는 면 타측이 어떠한 평탄부도 없이 연속파형을 갖는 반사형 기판을 제조하기 위한 방법으로서, 상기 방법은, 전극이 제공되는 영역에 둘 이상의 다른 높이를 갖는 다수의 볼록부를 형성하는단계, 상기 볼록부들을 갖는 기판상에 어떠한 평탄부도 없이 연속파형의 상면을 갖는 폴리머 수지막을 형성하는 단계, 및 상기 전극이 연속파형을 갖도록 폴리머 수지막상에 광반사 방지막을 형성하는 단계를 포함하는 것을 특징으로 하는 반사형 기판의 제조방법.A method for fabricating a reflective type substrate in which a light reflection preventing film has a continuous wave form on the other side of a surface on which an element of an insulating lower substrate is formed without any flattening, Forming a polymer resin film having an upper surface of a continuous wave shape on the substrate having the convex portions without any flat portions, and forming a light reflection preventing film on the polymer resin film so that the electrode has a continuous wave shape And forming a reflective layer on the reflective substrate. 제4항에 있어서, 상기 볼록부는 포토 마스크를 사용하여 광학적으로 형성되는 것을 특징으로 하는 반사형 기판의 제조방법.The method of manufacturing a reflective type substrate according to claim 4, wherein the convex portions are optically formed using a photomask. 광반사 방지막이 절연 하부기판의 배면에 형성되는 반사형 기판, 상기 반사형 기판에 대향하여 제공된 제2기판, 및 상기 반사형 기판과 상기 제2기판 사이에 봉입된 액정층을 포함하는 특징으로 하는 액정표시장치.A reflection type substrate on which a light reflection preventing film is formed on the back surface of an insulating lower substrate, a second substrate provided opposite to the reflection type substrate, and a liquid crystal layer sealed between the reflection type substrate and the second substrate. Liquid crystal display device. 제6항에 있어서, 상기 전극은 절연 하부기판상에 형성된 대향전극인 것을 특징으로 하는 액정표시장치.The liquid crystal display of claim 6, wherein the electrode is an opposing electrode formed on an insulating lower substrate. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960026329A 1996-06-29 1996-06-29 Reflective substrate, its manufacturing method and reflective liquid crystal display device KR100460060B1 (en)

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KR1019960026329A KR100460060B1 (en) 1996-06-29 1996-06-29 Reflective substrate, its manufacturing method and reflective liquid crystal display device

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KR100460060B1 KR100460060B1 (en) 2005-05-19

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100465861B1 (en) * 2000-12-07 2005-01-13 가부시키가이샤 히타치세이사쿠쇼 Liquid crystal display device
US7515233B2 (en) 2004-03-31 2009-04-07 Samsung Electronics Co., Ltd. Liquid crystal display having dual pattern protrusions formed on an electrode

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3066192B2 (en) * 1992-07-10 2000-07-17 シャープ株式会社 Method for manufacturing reflective active matrix substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100465861B1 (en) * 2000-12-07 2005-01-13 가부시키가이샤 히타치세이사쿠쇼 Liquid crystal display device
US7515233B2 (en) 2004-03-31 2009-04-07 Samsung Electronics Co., Ltd. Liquid crystal display having dual pattern protrusions formed on an electrode

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