KR970074972A - Pressure conversion method of chemical vapor deposition equipment - Google Patents

Pressure conversion method of chemical vapor deposition equipment Download PDF

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Publication number
KR970074972A
KR970074972A KR1019960014207A KR19960014207A KR970074972A KR 970074972 A KR970074972 A KR 970074972A KR 1019960014207 A KR1019960014207 A KR 1019960014207A KR 19960014207 A KR19960014207 A KR 19960014207A KR 970074972 A KR970074972 A KR 970074972A
Authority
KR
South Korea
Prior art keywords
pressure
chemical vapor
vapor deposition
conversion method
pressure conversion
Prior art date
Application number
KR1019960014207A
Other languages
Korean (ko)
Inventor
정진수
최돈전
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019960014207A priority Critical patent/KR970074972A/en
Publication of KR970074972A publication Critical patent/KR970074972A/en

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Abstract

본 발명은 화학증착 장비의 압력 변환방법을 제공하는 것으로, 압력 변환시 변환되는 시간을 길게 유지하여 오버슈트 및 다운슈트를 없애므로써 폴리실리콘층의 파티클 감소로 소자의 특성을 향상시킬 수 있는 과가 있다.The present invention provides a method of converting a pressure in a chemical vapor deposition apparatus, which can improve the characteristics of a device by reducing the particles of the polysilicon layer by eliminating overshoot and downshoot by maintaining a long time during pressure conversion .

Description

화학기상 증착장비의 압력 변환방법Pressure conversion method of chemical vapor deposition equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

Claims (2)

로딩단계, 압력낮춤단계, 펌핑단계, 압력높임단계 및 증착단계를 통하여 공정이 실시되는 화학기상 증착장비의 압력 변환방법에 있어서, 고압에서 저압으로의 압력 낮춤단계에서 안정화공정을 추가하여 압력변환이 서서히 이루어지도록 하는 것을 특징으로 하는 화학기상 증착장비의 압력 변환방법.A pressure conversion method of a chemical vapor deposition apparatus in which a process is carried out through a loading step, a pressure lowering step, a pumping step, a pressure raising step and a deposition step, the stabilizing step is added at a pressure lowering step from high pressure to low pressure, And the pressure of the gas is gradually increased. 제1항에 있어서, 상기 안정화 공정은 웨이퍼가 수용된 보트로의 공정가스 공급을 제어하는 밸브를 완전히 개방함과 함께 상기 보트내의 공기 및 가스를 빼내는 공정인 것을 특징으로 하는 화학기상 증착장비의 압력 변환방법.2. The chemical vapor deposition apparatus as claimed in claim 1, wherein the stabilization step is a step of fully opening a valve for controlling the supply of process gas to the boat accommodated in the wafer and extracting air and gas from the boat. Way. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960014207A 1996-05-02 1996-05-02 Pressure conversion method of chemical vapor deposition equipment KR970074972A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960014207A KR970074972A (en) 1996-05-02 1996-05-02 Pressure conversion method of chemical vapor deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960014207A KR970074972A (en) 1996-05-02 1996-05-02 Pressure conversion method of chemical vapor deposition equipment

Publications (1)

Publication Number Publication Date
KR970074972A true KR970074972A (en) 1997-12-10

Family

ID=66216888

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960014207A KR970074972A (en) 1996-05-02 1996-05-02 Pressure conversion method of chemical vapor deposition equipment

Country Status (1)

Country Link
KR (1) KR970074972A (en)

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