KR970067747A - Pattern inspection method and device - Google Patents

Pattern inspection method and device Download PDF

Info

Publication number
KR970067747A
KR970067747A KR1019970004732A KR19970004732A KR970067747A KR 970067747 A KR970067747 A KR 970067747A KR 1019970004732 A KR1019970004732 A KR 1019970004732A KR 19970004732 A KR19970004732 A KR 19970004732A KR 970067747 A KR970067747 A KR 970067747A
Authority
KR
South Korea
Prior art keywords
image
window
pattern
pixel
tested
Prior art date
Application number
KR1019970004732A
Other languages
Korean (ko)
Other versions
KR100268147B1 (en
Inventor
야스시 사사
다카오 카나이
히로유키 오오니시
테쯔오 호오키
이찌로오 만다이
Original Assignee
이시다 아키라
다이닛뽕 스크린 세이조오 가부키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이시다 아키라, 다이닛뽕 스크린 세이조오 가부키가이샤 filed Critical 이시다 아키라
Publication of KR970067747A publication Critical patent/KR970067747A/en
Application granted granted Critical
Publication of KR100268147B1 publication Critical patent/KR100268147B1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Image Analysis (AREA)
  • Image Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

적절하고 정확하게 결함검출이 가능한 패턴검사방법을 제공한다, 피검사패턴을 가지는 피검사화상(I1)과 표준화상(Io1)을 겹치게 하고, 화소마다 배타적논리합을 구하고, 이 배타적논리합을 화소치로서 가지는 상위화상(Ie1)을 얻는다. 상위화상(Ie1)상에 윈도우(W1)를 설정하고, 윈도우(W1)를 화소를 단위로 하여 상위화상(Ie1) 위를 주사시킨다, 위도우(W1)의 각 위치에서 윈도우(W1)내의 화소의 화소치의 합(윈도우측징량)을 구하고, 이 값과 미리 설정된 판정기준치와 비교한다. 윈도우(W1)의 어느 하나의 위치에서 윈도우 특징량이 판정기준치를 초과한 경우, 피검사화상(1)에는 결함이 존재하는 것으로 판정한다.A pattern inspection method capable of detecting defects properly and accurately is provided. The inspection image I1 and the normalized image I1 having the inspected pattern are superimposed, an exclusive logic sum is obtained for each pixel, and the exclusive logic sum has a pixel value. The higher picture Ie1 is obtained. The window W1 is set on the upper image Ie1, and the window W1 is scanned on the upper image Ie1 in units of pixels, and the pixels in the window W1 are positioned at the respective positions of the widow W1. The sum of the pixel values (window measurement) is obtained, and this value is compared with a predetermined reference value. When the window feature amount at any one position of the window W1 exceeds the determination reference value, it is determined that a defect exists in the inspected image 1.

Description

패턴 검사방법 및 장치Pattern inspection method and device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명의 패턴 검사방법의 설명도.1 is an explanatory diagram of a pattern inspection method of the present invention.

Claims (5)

피검사패턴을 가지는 피검사화상과, 비교기준으로 되는 표준패턴을 가지는 표준화상을 화소단위로 비교함으로써, 상기 피검사패턴의 결함을 검출하는 패턴검사방법에 있어서, (a) 상기 피검사화상과 상기 표준화상을 화소단위로 상호 비교하고, 상기 피검사화상과 상기 표준화상의 상위부분을 화소단위의 상위패턴으로 표현한 상위화상을 생성하는 상위화상 생성공정과, (b) 상기 상위화상을 소정 사이즈의 윈도우로 주사하는 윈도우 주사공정과, (c) 상기 주사의 각각의 위치에 있어서, 상기 상위패턴중 상기 윈도우내에 존재하는 부분의 화소수에 따른 윈도우 특징량을 구하는 연산공정과, (d)상기 윈도우 특징량과 소정의 판정기준치를 비교하여 상기 피검사패턴에서의 결함의 유무를 판정하는 판정공정을 가지는 것을 특징으로 하는 패턴 검사방법.In the pattern inspection method which detects the defect of the to-be-tested pattern by comparing the to-be-tested image which has a to-be-tested pattern and the standardized image which has a standard pattern used as a comparative reference on a pixel basis, (a) the said to-be-tested image and A higher image generation step of comparing the normalized images in pixel units and generating an upper image in which the inspected image and an upper portion of the normalized image are expressed in an upper pattern in pixel units; and (b) the upper image is a predetermined size. A window scanning step of scanning into a window, (c) a calculation step of obtaining a window feature amount corresponding to the number of pixels of a portion of the upper pattern existing in the window at each position of the scanning; and (d) the window And a determination step of determining the presence or absence of a defect in the inspected pattern by comparing the feature amount with a predetermined criterion value. 제1항에 있어서, 상기 연산공정이, (c1) 상기 표준패턴의 에지를 검출하는 공정과, (c2) 상기 에지에 대응하는 상기 상위화상의 화소에 대하여 다른 화소보다 큰 가중보정을 하면서 상기 화소수의 카운트를 행하여 상기 윈도우특징량을 구하는 공정을 가지고, 상기 판정기준치가 상기 윈도우의 사이즈에 대응하는 화소수의 12에 상응하는 값보다 작은 값으로 되어 있는 것을 특징으로 하는 패턴검사방법.2. The pixel as claimed in claim 1, wherein the computing step comprises: (c1) detecting an edge of the standard pattern; and (c2) performing weighted correction larger than another pixel on the pixel of the upper image corresponding to the edge. And counting the number to obtain the window feature amount, wherein the determination criterion value is smaller than the value corresponding to 12 of the number of pixels corresponding to the size of the window. 제1항에 있어서, 상기 연산공정이, (c1) 상기 표준패턴의 에지를 검출하는 공정과, (c2) 상기 에지에 대응하는 상기 상위화상의 화소에 대해 다른 화소보다 작은 가중보정을 하면서 상기 화소수의 카운트를 행하여 상기 윈도우특징량을 구하는 공정을 가지고, 상기 판정기준치가 상기 윈도우의 사이즈에 대응하는 화소수의 1/2에 상응하는 값보다 큰 값으로 되어 있는 특징으로 하는 패턴검사방법.2. The pixel as claimed in claim 1, wherein the computing step comprises: (c1) detecting an edge of the standard pattern; and (c2) performing a weighted correction smaller than other pixels with respect to the upper picture pixel corresponding to the edge. And counting the number to obtain the window feature amount, wherein the determination criterion value is larger than a value corresponding to 1/2 of the number of pixels corresponding to the size of the window. 피검사패턴을 가지는 피검사화상과, 비교기준으로 되는 표준패턴을 가지는 표준화상을 화소단위로 비교함으로써, 상기 피검사패턴의 결함을 검출하는 패턴감사장치에 있어서, (A) 상기 피검사화상을 입력하는 피검사 화상입력수단과, (B)는 상기 표준화상을 입력하는 표준화상입력수단과, (C) 상기 피검사화상과 상기 표준화상이 배타적논리합을 화소마다 구함으로써, 상기 피검사화상과 상기 표준화상의 상위부분을 화소단위의 상위패턴으로서 표현한 상위화상을 생성하는 상위화상 생성수단과, (D) 상기 상위화상을 소정 사이즈의 윈도우로 주사하는 윈도우 주사수단과, (E) 상기 주사의 각각의 위치에 있어서, 상기 상위패턴중, 상기 윈도우내에 존재하는 부분의 화소수에 상응하는 윈도우특징량을 구하는 연산수단과, (F) 상기 윈도우특징량과 소정의 판정기준치를 비교하고, 상기 피검사패턴에서 결함의 유무를 판정하는 판정수단을 가지는 것을 특징으로 하는 패턴검사장치.In the pattern inspection apparatus which detects the defect of the to-be-tested pattern by comparing the to-be-tested image which has a to-be-tested pattern and the standardized image which has a standard pattern used as a comparative reference on a pixel basis, (A) The to-be-tested image is The inspected image input means for inputting, (B) the normalized image input means for inputting the normalized image, (C) the inspected image and the normalized image by obtaining an exclusive logical sum of the inspected image and the normalized image for each pixel; Upper image generating means for generating an upper image in which upper portions of the normalized image are expressed as upper patterns in pixel units, (D) window scanning means for scanning the upper image into a window having a predetermined size, and (E) each of the scanning Calculation means for calculating a window feature amount corresponding to the number of pixels of the portion of the upper pattern in the window at the position; (F) the window feature amount and the predetermined And a judging means for comparing the judging reference values and determining the presence or absence of a defect in the inspected pattern. 제4항에 있어서, 상기 연산수단이 (E1) 상기 배타적 논리함을 구하는 각 화소가 상기 표준패턴의 에지에 대응하는 화소인지 아닌지의 에지정보를 생성하는 에지정보 생성수단과, (E2) 상기 에지정보에 의거하여 상기 배타적논리함의 값을 보정하는 보정수단을 가지는 것을 특징으로 하는 패턴검사장치.5. An edge information generating means according to claim 4, wherein said computing means (E1) generates edge information of whether or not each pixel for which said exclusive logic is a pixel corresponding to an edge of said standard pattern, and (E2) said edge And a correction means for correcting the value of the exclusive logic based on the information.
KR1019970004732A 1996-03-04 1997-02-17 A method of and an apparatus for detecting defects on an object pattern KR100268147B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8046151A JPH09236416A (en) 1996-03-04 1996-03-04 Method and device for inspecting pattern
JP96-46151 1996-03-04

Publications (2)

Publication Number Publication Date
KR970067747A true KR970067747A (en) 1997-10-13
KR100268147B1 KR100268147B1 (en) 2000-11-01

Family

ID=12738990

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970004732A KR100268147B1 (en) 1996-03-04 1997-02-17 A method of and an apparatus for detecting defects on an object pattern

Country Status (2)

Country Link
JP (1) JPH09236416A (en)
KR (1) KR100268147B1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100755372B1 (en) 2006-08-25 2007-09-04 삼성전자주식회사 Wafer inspecting method
CN114152627B (en) * 2022-02-09 2022-05-03 季华实验室 Chip circuit defect detection method and device, electronic equipment and storage medium

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04212432A (en) * 1990-08-23 1992-08-04 Sharp Corp Wiring pattern inspection equipment
JP2533245B2 (en) * 1991-03-28 1996-09-11 株式会社東芝 Pattern defect inspection system

Also Published As

Publication number Publication date
KR100268147B1 (en) 2000-11-01
JPH09236416A (en) 1997-09-09

Similar Documents

Publication Publication Date Title
US7024041B2 (en) Pattern inspection apparatus and method
KR102168724B1 (en) Method And Apparatus for Discriminating Normal and Abnormal by using Vision Inspection
KR100668029B1 (en) Automatic Inspection of Print Quality Using an Elastic Model
JP4230880B2 (en) Defect inspection method
CN115375610A (en) Detection method and device, detection equipment and storage medium
WO2014103617A1 (en) Alignment device, defect inspection device, alignment method, and control program
JP4910128B2 (en) Defect inspection method for object surface
KR101022187B1 (en) Substrate inspection device
JP2009250937A (en) Pattern inspection device and method
JP2017161435A (en) Inspection method of transparent body
JP2005283197A (en) Detecting method and system for streak defect of screen
KR970067747A (en) Pattern inspection method and device
JPH08327559A (en) Device and method for inspecting pattern
JP2924859B2 (en) Appearance inspection method and device
JP2710527B2 (en) Inspection equipment for periodic patterns
JP2004219291A (en) Line defect detection method and device for screen
US20040228516A1 (en) Defect detection method
JPH0592646A (en) Method for inspecting printed matter
JPH1195408A (en) Defect inspection method
JP2000258349A (en) Apparatus for visual examination of photomask
CN117495846B (en) Image detection method, device, electronic equipment and storage medium
JPH09288037A (en) Inspection method for lcd panel
KR20040055471A (en) Method for detecting defect of wafer
WO2024166608A1 (en) Visual inspection method and visual inspection device
JPH0679862A (en) Method for inspecting quality of printing paper surface and apparatus therefor

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20070625

Year of fee payment: 8

LAPS Lapse due to unpaid annual fee