KR970066723A - Focus adjustment method of exposure apparatus - Google Patents
Focus adjustment method of exposure apparatus Download PDFInfo
- Publication number
- KR970066723A KR970066723A KR1019960006024A KR19960006024A KR970066723A KR 970066723 A KR970066723 A KR 970066723A KR 1019960006024 A KR1019960006024 A KR 1019960006024A KR 19960006024 A KR19960006024 A KR 19960006024A KR 970066723 A KR970066723 A KR 970066723A
- Authority
- KR
- South Korea
- Prior art keywords
- exposure apparatus
- exposure
- predetermined
- lens
- distance
- Prior art date
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
1. 청구범위에 기재된 발명이 속한 기술분야1. Technical field to which the invention described in the claims belongs
반도체 소자 제조용 노광 장치.An exposure apparatus for manufacturing semiconductor devices.
2. 발명이 해결하려고 하는 기술적 과제2. Technical Challenges to be Solved by the Invention
노광 장치의 초점 틀어짐 현상은 노광 및 현상 공정을 진행한 후에만 체크 가능하여 웨이퍼를 검사하는 과정에서 전사된 패턴의 찌그러짐 현상 등이 발견되면 재작업을 실시해야 함으로써 공정 시간의 증가로 제조 수율을 저하시키는 문제점이 발생함.The focus shift phenomenon of the exposure apparatus can be checked only after the exposure and development processes are performed, and if the transferred pattern is found to be distorted during the inspection of the wafer, rework must be performed, Problems occur.
3. 발명의 해결방범의 요지3. The point of solution security of invention
노광 장치의 초점이 최적으로 유지될 때의 렌즈와 웨이퍼 스테이지의 거리와 노광을 수행한 후의 렌즈와 웨이퍼 스테이지의 거리의 차이를 소정의 기준값과 비교하여 기준값을 초과할 때에는 경보를 울리게 함으로써 초점 틀어짐 현상을 체크할 수 있도록 함.The distance between the lens and the wafer stage when the focal point of the exposure apparatus is optimally maintained, and the distance between the lens and the wafer stage after the exposure is performed is compared with a predetermined reference value, and when the reference value is exceeded, an alarm is sounded, To be checked.
4. 발명의 중요한 용도4. Important Uses of the Invention
노광 장치의 초점 조절에 이용됨.Used to adjust the focus of the exposure equipment.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제1도는 본 발명에 따른 노광 장치의 초점 조절 방법을 설명하기 위한 순서도.FIG. 1 is a flowchart for explaining a focusing method of an exposure apparatus according to the present invention; FIG.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960006024A KR970066723A (en) | 1996-03-08 | 1996-03-08 | Focus adjustment method of exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960006024A KR970066723A (en) | 1996-03-08 | 1996-03-08 | Focus adjustment method of exposure apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970066723A true KR970066723A (en) | 1997-10-13 |
Family
ID=66215507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960006024A KR970066723A (en) | 1996-03-08 | 1996-03-08 | Focus adjustment method of exposure apparatus |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970066723A (en) |
-
1996
- 1996-03-08 KR KR1019960006024A patent/KR970066723A/en not_active Application Discontinuation
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