KR970066723A - Focus adjustment method of exposure apparatus - Google Patents

Focus adjustment method of exposure apparatus Download PDF

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Publication number
KR970066723A
KR970066723A KR1019960006024A KR19960006024A KR970066723A KR 970066723 A KR970066723 A KR 970066723A KR 1019960006024 A KR1019960006024 A KR 1019960006024A KR 19960006024 A KR19960006024 A KR 19960006024A KR 970066723 A KR970066723 A KR 970066723A
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KR
South Korea
Prior art keywords
exposure apparatus
exposure
predetermined
lens
distance
Prior art date
Application number
KR1019960006024A
Other languages
Korean (ko)
Inventor
정영배
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019960006024A priority Critical patent/KR970066723A/en
Publication of KR970066723A publication Critical patent/KR970066723A/en

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

1. 청구범위에 기재된 발명이 속한 기술분야1. Technical field to which the invention described in the claims belongs

반도체 소자 제조용 노광 장치.An exposure apparatus for manufacturing semiconductor devices.

2. 발명이 해결하려고 하는 기술적 과제2. Technical Challenges to be Solved by the Invention

노광 장치의 초점 틀어짐 현상은 노광 및 현상 공정을 진행한 후에만 체크 가능하여 웨이퍼를 검사하는 과정에서 전사된 패턴의 찌그러짐 현상 등이 발견되면 재작업을 실시해야 함으로써 공정 시간의 증가로 제조 수율을 저하시키는 문제점이 발생함.The focus shift phenomenon of the exposure apparatus can be checked only after the exposure and development processes are performed, and if the transferred pattern is found to be distorted during the inspection of the wafer, rework must be performed, Problems occur.

3. 발명의 해결방범의 요지3. The point of solution security of invention

노광 장치의 초점이 최적으로 유지될 때의 렌즈와 웨이퍼 스테이지의 거리와 노광을 수행한 후의 렌즈와 웨이퍼 스테이지의 거리의 차이를 소정의 기준값과 비교하여 기준값을 초과할 때에는 경보를 울리게 함으로써 초점 틀어짐 현상을 체크할 수 있도록 함.The distance between the lens and the wafer stage when the focal point of the exposure apparatus is optimally maintained, and the distance between the lens and the wafer stage after the exposure is performed is compared with a predetermined reference value, and when the reference value is exceeded, an alarm is sounded, To be checked.

4. 발명의 중요한 용도4. Important Uses of the Invention

노광 장치의 초점 조절에 이용됨.Used to adjust the focus of the exposure equipment.

Description

노광 장치의 초점 조절 방법Focus adjustment method of exposure apparatus

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제1도는 본 발명에 따른 노광 장치의 초점 조절 방법을 설명하기 위한 순서도.FIG. 1 is a flowchart for explaining a focusing method of an exposure apparatus according to the present invention; FIG.

Claims (1)

반도체 소자 제조용 노광 장치의 초점 조절 방법에 있어서, 상기 노광 장치의 렌즈와 웨이퍼 스테이지의 거리를 측정하여 소정의 제1측정값을 얻는 단계와, 제1웨이퍼를 로딩하는 단계와, 자동 초점 조절 단계와, 노광 및 웨이퍼 언로딩 단계와, 상기 노광 장치의 렌즈와 웨이퍼 스테이지의 거리를 측정하여 소정의 제2측정값을 얻는 단계와, 상기 소정의 제1측정값과 상기 소정의 제2측정값을 비교하여 상기 제2측정값이 상기 제1측정값 이상인 경우에는 경보를 울리도록 하는 단계 및 상기 소정의 제1측정값과 상기 소정의 제2측정값을 비교하여 상기 제2측정값이 상기 제1측정값이 이하인 경우에는 제2웨이퍼를 로딩하는 단계를 포함해서 이루어진 노광 장치의 초점 조절 방법.A focus adjustment method for an exposure apparatus for manufacturing a semiconductor device, comprising the steps of: measuring a distance between a lens of the exposure apparatus and a wafer stage to obtain a predetermined first measurement value; loading a first wafer; Measuring a distance between the lens of the exposure apparatus and the wafer stage to obtain a predetermined second measurement value; comparing the predetermined first measurement value with the predetermined second measurement value; Causing an alarm to sound if the second measured value is greater than or equal to the first measured value; comparing the predetermined first measured value with the predetermined second measured value to determine whether the second measured value is greater than the first measured value And loading the second wafer when the value is less than or equal to the predetermined value. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960006024A 1996-03-08 1996-03-08 Focus adjustment method of exposure apparatus KR970066723A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960006024A KR970066723A (en) 1996-03-08 1996-03-08 Focus adjustment method of exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960006024A KR970066723A (en) 1996-03-08 1996-03-08 Focus adjustment method of exposure apparatus

Publications (1)

Publication Number Publication Date
KR970066723A true KR970066723A (en) 1997-10-13

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960006024A KR970066723A (en) 1996-03-08 1996-03-08 Focus adjustment method of exposure apparatus

Country Status (1)

Country Link
KR (1) KR970066723A (en)

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