KR970064184U - Drying device for semiconductor wafers - Google Patents

Drying device for semiconductor wafers

Info

Publication number
KR970064184U
KR970064184U KR2019960010529U KR19960010529U KR970064184U KR 970064184 U KR970064184 U KR 970064184U KR 2019960010529 U KR2019960010529 U KR 2019960010529U KR 19960010529 U KR19960010529 U KR 19960010529U KR 970064184 U KR970064184 U KR 970064184U
Authority
KR
South Korea
Prior art keywords
drying device
semiconductor wafers
wafers
semiconductor
drying
Prior art date
Application number
KR2019960010529U
Other languages
Korean (ko)
Other versions
KR200150516Y1 (en
Inventor
박갑진
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019960010529U priority Critical patent/KR200150516Y1/en
Publication of KR970064184U publication Critical patent/KR970064184U/en
Application granted granted Critical
Publication of KR200150516Y1 publication Critical patent/KR200150516Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019960010529U 1996-05-02 1996-05-02 Dry apparatus of semiconductor wafer KR200150516Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960010529U KR200150516Y1 (en) 1996-05-02 1996-05-02 Dry apparatus of semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960010529U KR200150516Y1 (en) 1996-05-02 1996-05-02 Dry apparatus of semiconductor wafer

Publications (2)

Publication Number Publication Date
KR970064184U true KR970064184U (en) 1997-12-11
KR200150516Y1 KR200150516Y1 (en) 1999-07-01

Family

ID=19455289

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960010529U KR200150516Y1 (en) 1996-05-02 1996-05-02 Dry apparatus of semiconductor wafer

Country Status (1)

Country Link
KR (1) KR200150516Y1 (en)

Also Published As

Publication number Publication date
KR200150516Y1 (en) 1999-07-01

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Legal Events

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E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20070327

Year of fee payment: 9

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