KR970060431A - Deterioration prevention device of pressure sensor for semiconductor manufacturing - Google Patents

Deterioration prevention device of pressure sensor for semiconductor manufacturing Download PDF

Info

Publication number
KR970060431A
KR970060431A KR1019960001890A KR19960001890A KR970060431A KR 970060431 A KR970060431 A KR 970060431A KR 1019960001890 A KR1019960001890 A KR 1019960001890A KR 19960001890 A KR19960001890 A KR 19960001890A KR 970060431 A KR970060431 A KR 970060431A
Authority
KR
South Korea
Prior art keywords
gas
pressure sensor
sensor
diaphragm
pressure regulating
Prior art date
Application number
KR1019960001890A
Other languages
Korean (ko)
Inventor
박호현
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019960001890A priority Critical patent/KR970060431A/en
Publication of KR970060431A publication Critical patent/KR970060431A/en

Links

Abstract

본 발명은 반도체 제조용 압력 조절 센서의 열화 방지 장치에 관한 것으로서, 반응관 내의 반응 가스를 진공 펌프로 배기시키는 배기관에 격막의 상하 작용으로 압력을 조절하는 압력 조절 센서를 설치하되, 상기 배기관과 압력 조절 센서 사이에는 배출 반응 가스에 수반되는 분진이 격막에 직접 접촉될 수 없도록 가스를 공급하여 가스 커튼을 형성시키는 가스 공급 수단이 부설되는 것을 특징으로 하여, 상기 압력 조절 센서의 감지 능력이 저하되는 것을 막을 수 있으므로 공정 설비의 안정화를 기할 수 있어 반도체 제품의 품질 불량을 감소시킬 뿐만 아니라 센서의 교체 주기를 연장할 수 있어 부품 비용도 절감하는 효과가 있다.The present invention relates to an apparatus for preventing deterioration of a pressure regulating sensor for manufacturing a semiconductor, and more particularly, to an exhaust pipe for evacuating a reaction gas in a reaction tube by a vacuum pump, a pressure regulating sensor for regulating the pressure of the diaphragm, And gas supply means for supplying a gas to the gas sensor so as to prevent dust accompanying the discharge reaction gas from directly contacting the diaphragm is provided between the sensors to prevent the sensing ability of the pressure regulating sensor from being degraded. It is possible to stabilize the process equipments, thereby not only reducing the quality defects of the semiconductor products but also extending the replacement cycle of the sensors, thereby reducing the parts cost.

Description

반도체 제조용 압력 감지 센서의 열화 방지 장치Deterioration prevention device of pressure sensor for semiconductor manufacturing

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제2도는 본 발명에 따른 압력 감지 센서의 열화 방지 장치의 구성 및 작동 상태를 나타낸 개략도.FIG. 2 is a schematic view showing a configuration and operation state of an apparatus for preventing deterioration of a pressure sensing sensor according to the present invention; FIG.

Claims (2)

반응관 내의 반응 가스를 진공 펌프로 배기시키는 배기관에 격막의 상하 작용으로 압력을 감지하는 압력 감지 센서를 설치하되, 상기 배기관과 압력 감지 센서 사이에는 배출 반응 가스에 수반되는 분진이 격막에 직접 접촉될 수 없도록 가스를 공급하여 가스 커튼을 형성시키는 가스 공급 수단이 부설되는 것을 특징으로 하는 반도체 제조용 압력 감지 센서의 열화 방지 장치.A pressure sensor for detecting the pressure by the action of the diaphragm vertically is installed in an exhaust pipe for evacuating the reaction gas in the reaction tube by a vacuum pump and dust accompanying the exhaust gas is directly contacted with the diaphragm between the exhaust pipe and the pressure sensor And a gas supply means for supplying a gas so as to form a gas curtain is provided on the outer circumferential surface of the pressure sensor. 제1항에 있어서, 상기 가스 공급 수단은 N₂가스를 공급하는 것을 특징으로 하는 반도체 제조용 압력 감지 센서의 열화 방지 장치.The apparatus according to claim 1, wherein the gas supply means supplies N 2 gas. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960001890A 1996-01-29 1996-01-29 Deterioration prevention device of pressure sensor for semiconductor manufacturing KR970060431A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960001890A KR970060431A (en) 1996-01-29 1996-01-29 Deterioration prevention device of pressure sensor for semiconductor manufacturing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960001890A KR970060431A (en) 1996-01-29 1996-01-29 Deterioration prevention device of pressure sensor for semiconductor manufacturing

Publications (1)

Publication Number Publication Date
KR970060431A true KR970060431A (en) 1997-08-12

Family

ID=66219086

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960001890A KR970060431A (en) 1996-01-29 1996-01-29 Deterioration prevention device of pressure sensor for semiconductor manufacturing

Country Status (1)

Country Link
KR (1) KR970060431A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030053283A (en) * 2001-12-22 2003-06-28 동부전자 주식회사 Deposition system of oxidation layer of a semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030053283A (en) * 2001-12-22 2003-06-28 동부전자 주식회사 Deposition system of oxidation layer of a semiconductor device

Similar Documents

Publication Publication Date Title
KR101976059B1 (en) Reticle cleaner using plasma
ATE252726T1 (en) LEAK DETECTOR ARRANGEMENT AND SYSTEM
KR970060431A (en) Deterioration prevention device of pressure sensor for semiconductor manufacturing
EP0322981A3 (en) Apparatus for determining rate of discharge from nozzle for spraying aqueous solution of hydrogen peroxide
JPH05106612A (en) Linear type drive and operating method thereof
KR102467469B1 (en) Gas leak sensor with inhalation fan
JPS61246645A (en) Detector for leaked part
KR970072127A (en) Gas box of semiconductor manufacturing equipment
TR199800731A3 (en) Casting device for resin-made membrane formation
KR100414303B1 (en) Apparatus for preventing failure of detecting gas contamination in semiconductor wafer manufacturing equipment
KR970072060A (en) Pressure sensor deterioration prevention device in LP CVD diffusion furnace
KR980005395A (en) Vertical Semiconductor Low Pressure Chemical Vapor Deposition Device
KR970077315A (en) Plasma etching equipment to prevent polymer from sinking
AU2003222728A1 (en) Traction device for a web of fabric
KR19980022649U (en) Semiconductor Wafer Deposition Equipment
KR970063471A (en) Gas flow rate control device
JP2000005669A (en) Coating hopper and manufacture of catalytic converter
JPS6082849A (en) Oxygen concentration measuring apparatus
KR20040082883A (en) Vacuum device of semiconductor manufacturing equipment having improved bellows
KR970067615A (en) Gas supply apparatus and method for semiconductor chemical vapor deposition process
KR970052112A (en) Gas and power abnormality supply alarm device of semiconductor manufacturing system
JPH0578158B2 (en)
KR19990034098U (en) Leak detector
JP2000093908A (en) Submerged heater for cleaning tank and cleaning tank provided with same
JP2001205159A (en) Coating hopper and sealing method at supplying slurry

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application