KR970051939A - Misalignment correction method of reticle for semiconductor manufacturing - Google Patents

Misalignment correction method of reticle for semiconductor manufacturing Download PDF

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Publication number
KR970051939A
KR970051939A KR1019950072227A KR19950072227A KR970051939A KR 970051939 A KR970051939 A KR 970051939A KR 1019950072227 A KR1019950072227 A KR 1019950072227A KR 19950072227 A KR19950072227 A KR 19950072227A KR 970051939 A KR970051939 A KR 970051939A
Authority
KR
South Korea
Prior art keywords
reticle
semiconductor manufacturing
wafer
alignment
rotation
Prior art date
Application number
KR1019950072227A
Other languages
Korean (ko)
Inventor
최동순
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019950072227A priority Critical patent/KR970051939A/en
Publication of KR970051939A publication Critical patent/KR970051939A/en

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Abstract

1. 청구 범위에 기재된 발명이 속한 기술분야1. TECHNICAL FIELD OF THE INVENTION

반도체 제조 공정중 노광 공정.Exposure process during semiconductor manufacturing process.

2. 발명이 해결하려고 하는 기술적 과제2. The technical problem to be solved by the invention

레티클이 회전한 상태로 로딩되는 경우에 이를 보정하기 위하여 웨이퍼-레티클 정렬 과정에서 보다 세심한 주의를 기우려야 했으므로 정렬 시간이 늘어나 공정 시간이 증가하는 문제가 발생함.When the reticle is loaded in rotation, it is necessary to pay more attention to the wafer-reticle alignment process in order to compensate for this, which increases the alignment time and increases the process time.

3. 발명의 해결방법의 요지3. Summary of Solution to Invention

정렬 공정을 수행하기 전에 미리 소정의 기준선과 비교하여 레티클의 회전으로 인한 오정렬 정도를 미리측정한 후 상기 레티클의 회전 각도만큼 웨이퍼를 회전시켜 상기 오정렬을 보정할 수 있도록 함.Before performing the alignment process, the misalignment caused by the rotation of the reticle is measured in advance in comparison with a predetermined reference line, and then the wafer is rotated by the rotation angle of the reticle to correct the misalignment.

4. 발명이 중요한 용도4. Intended Use

반도체 제조 공정 중 웨이퍼-레티클 정렬에 이용됨.Used for wafer-reticle alignment in semiconductor manufacturing processes.

Description

반도체 제조용 레티클의 오정렬 보정 방법Misalignment correction method of reticle for semiconductor manufacturing

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명에 따른 반도체 제조용 레티클의 오정렬 보정 방법을 설명하기 위한 도면.2 is a view for explaining a misalignment correction method of a reticle for semiconductor manufacturing according to the present invention.

Claims (1)

반도체 제조용 레티클의 오정렬 보정 방법에 있어서, 스테퍼에 페티클을 로딩한 후 소정의 기준선과 비교하여 상기 레티클의 소정의 회전 각도를 측정하는 단계 및 스테퍼의 스테이지에 웨이퍼를 로딩한 후 상기 측정된 레티클의 소정의 회전 각도만큼 상기 웨이퍼를 회전시키는 단계를 포함해서 이루어진 반도체 제조용 레티클의 오정렬 보정 방법.A method for correcting misalignment of a reticle for semiconductor manufacturing, comprising: measuring a predetermined angle of rotation of the reticle compared to a predetermined baseline after loading a pellicle into a stepper; and loading a wafer on a stage of the stepper, A method for correcting misalignment of a reticle for semiconductor manufacturing, comprising rotating the wafer by a predetermined rotation angle. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950072227A 1995-12-29 1995-12-29 Misalignment correction method of reticle for semiconductor manufacturing KR970051939A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950072227A KR970051939A (en) 1995-12-29 1995-12-29 Misalignment correction method of reticle for semiconductor manufacturing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950072227A KR970051939A (en) 1995-12-29 1995-12-29 Misalignment correction method of reticle for semiconductor manufacturing

Publications (1)

Publication Number Publication Date
KR970051939A true KR970051939A (en) 1997-07-29

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ID=66645483

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950072227A KR970051939A (en) 1995-12-29 1995-12-29 Misalignment correction method of reticle for semiconductor manufacturing

Country Status (1)

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KR (1) KR970051939A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100587910B1 (en) * 2004-12-28 2006-06-09 동부일렉트로닉스 주식회사 Method and apparatus for reticle rotation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100587910B1 (en) * 2004-12-28 2006-06-09 동부일렉트로닉스 주식회사 Method and apparatus for reticle rotation

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