KR970051802A - Exhaust Treatment Apparatus and Exhaust Treatment Method of Semiconductor Device Using the Apparatus - Google Patents
Exhaust Treatment Apparatus and Exhaust Treatment Method of Semiconductor Device Using the Apparatus Download PDFInfo
- Publication number
- KR970051802A KR970051802A KR1019950046903A KR19950046903A KR970051802A KR 970051802 A KR970051802 A KR 970051802A KR 1019950046903 A KR1019950046903 A KR 1019950046903A KR 19950046903 A KR19950046903 A KR 19950046903A KR 970051802 A KR970051802 A KR 970051802A
- Authority
- KR
- South Korea
- Prior art keywords
- exhaust
- inflow
- exhaust treatment
- valve
- semiconductor device
- Prior art date
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Abstract
본 발명은 배기물 처리장치 및 이 장치를 이용하는 반도체장치의 배기물 처리방법에 관해 개시한다. 본 발명에 의한 배기물 처리장치는 배기물 발생원에 상기 배기물 발생원에 유입되는 유입물에 따라 자동적으로 해당 유입물의 배기물을 조절할 수 있는 수단을 구비한다. 상기 수단은 상기 배기물 발생원과 병렬로 연결된 복수개의 배기물 조절 밸브와 상기 각 배기물 조절 밸브에 직렬로 연결된 배기 개폐용 밸브를 구비한다. 본 발명에 의한 배기물 처리장치는 배기 개폐용 밸브 구동을 위한 별도의 시스템이 필요하지 않으며, 배기물질 발생원(예컨대, 반응챔버)에 유입되는 물질(가스)의 유입밸브가 설치된 공급라인에 배기 개폐용 밸브가 함께 설치되어 있고, 자동화된 배기물 처리장치의 구성이 간단하고 고나리가 쉬워 매우 경제적이다. 이와 같은 장치를 이용하는 반도체장치의 배기물 처리방법은 배기물의 가변이 용이하고 민감하여 안정적인 공정진행과 품질향상을 기할 수 있다.The present invention relates to an exhaust treatment apparatus and an exhaust treatment method for a semiconductor device using the apparatus. The exhaust treatment apparatus according to the present invention includes means for automatically controlling the exhaust of the inflow of the exhaust in accordance with the inflow of the exhaust inflow source. The means has a plurality of exhaust control valves connected in parallel with the exhaust generating source and an exhaust opening / closing valve connected in series with the respective exhaust control valves. The exhaust treatment apparatus according to the present invention does not require a separate system for driving the valve for opening and closing the exhaust, and opens and closes the exhaust line in a supply line in which an inlet valve for a substance (gas) flowing into an exhaust material generating source (eg, a reaction chamber) is installed. The valve is installed together, and the configuration of the automated exhaust treatment device is simple and easy to handle, which is very economical. The exhaust treatment method of a semiconductor device using such a device is easy and variable in exhaust, so that stable process progress and quality improvement can be achieved.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2도는 본 발명에 의한 배기물 처리장치를 나타낸 도면이다.2 is a view showing an exhaust treatment apparatus according to the present invention.
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950046903A KR970051802A (en) | 1995-12-05 | 1995-12-05 | Exhaust Treatment Apparatus and Exhaust Treatment Method of Semiconductor Device Using the Apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950046903A KR970051802A (en) | 1995-12-05 | 1995-12-05 | Exhaust Treatment Apparatus and Exhaust Treatment Method of Semiconductor Device Using the Apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970051802A true KR970051802A (en) | 1997-07-29 |
Family
ID=66593676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950046903A KR970051802A (en) | 1995-12-05 | 1995-12-05 | Exhaust Treatment Apparatus and Exhaust Treatment Method of Semiconductor Device Using the Apparatus |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970051802A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100434493B1 (en) * | 2001-10-05 | 2004-06-05 | 삼성전자주식회사 | Apparatus for atomic layer deposition and method for operating the same |
WO2013134151A1 (en) * | 2012-03-09 | 2013-09-12 | Novellus Systems, Inc. | Split pumping method, apparatus, and system |
-
1995
- 1995-12-05 KR KR1019950046903A patent/KR970051802A/en not_active Application Discontinuation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100434493B1 (en) * | 2001-10-05 | 2004-06-05 | 삼성전자주식회사 | Apparatus for atomic layer deposition and method for operating the same |
WO2013134151A1 (en) * | 2012-03-09 | 2013-09-12 | Novellus Systems, Inc. | Split pumping method, apparatus, and system |
US20130237063A1 (en) * | 2012-03-09 | 2013-09-12 | Seshasayee Varadarajan | Split pumping method, apparatus, and system |
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WITN | Withdrawal due to no request for examination |