KR970049055A - Deformation aperture and projection exposure apparatus for deformed lighting using same - Google Patents

Deformation aperture and projection exposure apparatus for deformed lighting using same Download PDF

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Publication number
KR970049055A
KR970049055A KR1019950056987A KR19950056987A KR970049055A KR 970049055 A KR970049055 A KR 970049055A KR 1019950056987 A KR1019950056987 A KR 1019950056987A KR 19950056987 A KR19950056987 A KR 19950056987A KR 970049055 A KR970049055 A KR 970049055A
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KR
South Korea
Prior art keywords
aperture
radius
exposure apparatus
projection exposure
phase shift
Prior art date
Application number
KR1019950056987A
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Korean (ko)
Inventor
김철홍
Original Assignee
김광호
삼성전자 주식회사
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Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950056987A priority Critical patent/KR970049055A/en
Publication of KR970049055A publication Critical patent/KR970049055A/en

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

변형 조리개 및 이를 이용한 투영노광장치에 관해 개시한다. 본 발명은 제1반지름의 광투과영역을 지니는 제1조리개와, 상기 제1반지름보다 작고, 제1반지름과 동일중심의 서로다른 반지름을 가지는 N개의 원이 중첩되어 형성된 N개의 고리영역이 교대로 형성한 N-1(N이 홀수일때) 또는 N-2(N이 짝수일때)개의 위상변이 영역을 구비하는 제2조리개를 구비하는 것을 특징으로 하느 사입사 조명용 조리개를 제공한다. 본 발명은 또한 상기 변형조명용 조리개를 이용한 투영노광장치를 제공한다.A deformed aperture and a projection exposure apparatus using the same will be described. According to the present invention, a first aperture having a light transmission region having a first radius and N ring regions formed by overlapping N circles smaller than the first radius and having different radii of the same center as the first radius are alternately formed. A diaphragm for an incidence illumination is provided, comprising a second aperture formed with N-1 (when N is odd) or N-2 (when N is even) phase shift regions. The present invention also provides a projection exposure apparatus using the modified illumination aperture.

본 발명에 의하면 위상변이영역을 통과한 광이 콘덴서 렌즈의 가장자리부위로 회절함으로서 제1조리개의 광투과영역을 통과하여 조명된 사입사 조명성분의 광강도를 중대시킨다.According to the present invention, the light passing through the phase shifting region is diffracted to the edge portion of the condenser lens, thereby increasing the light intensity of the incidence illumination component illuminated through the light transmitting region of the first aperture.

Description

변형 조리래 및 이를 이용한 변형조명용 투영노광장치Deformed cooker and projection exposure apparatus for deformed lighting using same

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제3도는 본 발명의 실시예에 의한 변형조명용 조리개의 평면도이다,3 is a plan view of a modified illumination stop according to an embodiment of the present invention,

제4도는 본 발명의 실시예에 의한 변형 조명용 조리개를 X-X'측으로 절단한 단면도이다.4 is a cross-sectional view of the modified illumination diaphragm cut to the X-X 'side according to an embodiment of the present invention.

Claims (7)

제1반지름의 광투과영역을 지니는 제1조리개와, 상기 제1반지름보다 작고, 제1반지름과 동일조건의 서로 다른 반지름을 가지는 N개의 원이 중첩되어 형성된 N개의 고리영역이 교대로 형성한 N-1(N이 홀수일 때)또는 N-2(N이 짝수일때)개의 위상변이영역을 구비하는 제2조리개를 구비하는 것을 특징으로 하는 사입사 조명용 조리개.N first ring having a light transmission region having a first radius, and N ring regions formed by overlapping N circles having a smaller radius than the first radius and having different radii with the same conditions as the first radius are alternately formed. A diaphragm for an incidence illumination comprising a second aperture having a phase shift region of -1 (when N is odd) or N-2 (when N is even). 제1항에 있어서, 상기 위상변이영역은 조리개의 기판을 식각하여 형성하는 것을 특징으로 하는 사입사 조명용 조리개.The diaphragm illumination aperture of claim 1, wherein the phase shift region is formed by etching a substrate of an aperture. 제1항에 있어서, 상기 위상변이영역은 위상이동물질층으로 형성되는 것을 특징으로 하는 사입사 조명용 조리개.The iris of claim 1, wherein the phase shift region is formed of a phase shift material layer. 제1항에 있어서, 상기 제2조리개는 석영, LE, SLW 중에서 어느 하나를 이용하여 형성하는 것을 특징으로 하는 사입사 조명용 조리개.The iris of claim 1, wherein the second aperture is formed using one of quartz, LE, and SLW. 제1항에 있어서, 상기 제2조리개는 광이 입사되는 면에 무반사층이 형성되어 있는 것을 특징으로 하는 사입사 조명용 조리개.According to claim 1, wherein the second aperture is a non-reflective illumination aperture, characterized in that the non-reflective layer is formed on the surface on which light is incident. 조리개를 통과한 광선을 이용하여 마스크를 패턴을 웨이퍼에 전사하기 위한 변형투영노광장치에 있어서, 제1반지름의 제1광투과영역을 지니는 제1조리개와, 상기 제1반지름보다 적고, 제1반지름과 동일중심의 서로 다른 반지름을 가지는 N개의 원이 중첩되어 형성된 N개의 고리영역이 교대로 형성한 N-1(N이 홀수일때) 또는 N-2(N이 짝수일때)개의 위상변이영역을 구비하는 제2조리개를 구비하는 것을 특징으로 하는 변형조명용 투영노광장치.A deformation projection exposure apparatus for transferring a mask onto a wafer using a light beam passing through an aperture, comprising: a first aperture having a first light transmission region having a first radius, and less than the first radius and having a first radius And N-1 (when N is odd) or N-2 (when N is even) phase shift regions formed by alternating N ring regions formed by overlapping N circles having different radii of the same center Projection exposure apparatus for a deformed light, characterized in that it comprises a second aperture. 제6항에 있어서, 상기 제2조리개는 투영노광장치의 파리눈 렌즈와 콘덴서 렌즈 사이에 위치하는 것을 특징으로 하는 변형조명용 투영노광장치.The projection exposure apparatus of claim 6, wherein the second aperture is positioned between the fly's eye lens and the condenser lens of the projection exposure apparatus. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950056987A 1995-12-26 1995-12-26 Deformation aperture and projection exposure apparatus for deformed lighting using same KR970049055A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950056987A KR970049055A (en) 1995-12-26 1995-12-26 Deformation aperture and projection exposure apparatus for deformed lighting using same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950056987A KR970049055A (en) 1995-12-26 1995-12-26 Deformation aperture and projection exposure apparatus for deformed lighting using same

Publications (1)

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KR970049055A true KR970049055A (en) 1997-07-29

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