KR970049055A - Deformation aperture and projection exposure apparatus for deformed lighting using same - Google Patents
Deformation aperture and projection exposure apparatus for deformed lighting using same Download PDFInfo
- Publication number
- KR970049055A KR970049055A KR1019950056987A KR19950056987A KR970049055A KR 970049055 A KR970049055 A KR 970049055A KR 1019950056987 A KR1019950056987 A KR 1019950056987A KR 19950056987 A KR19950056987 A KR 19950056987A KR 970049055 A KR970049055 A KR 970049055A
- Authority
- KR
- South Korea
- Prior art keywords
- aperture
- radius
- exposure apparatus
- projection exposure
- phase shift
- Prior art date
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
변형 조리개 및 이를 이용한 투영노광장치에 관해 개시한다. 본 발명은 제1반지름의 광투과영역을 지니는 제1조리개와, 상기 제1반지름보다 작고, 제1반지름과 동일중심의 서로다른 반지름을 가지는 N개의 원이 중첩되어 형성된 N개의 고리영역이 교대로 형성한 N-1(N이 홀수일때) 또는 N-2(N이 짝수일때)개의 위상변이 영역을 구비하는 제2조리개를 구비하는 것을 특징으로 하느 사입사 조명용 조리개를 제공한다. 본 발명은 또한 상기 변형조명용 조리개를 이용한 투영노광장치를 제공한다.A deformed aperture and a projection exposure apparatus using the same will be described. According to the present invention, a first aperture having a light transmission region having a first radius and N ring regions formed by overlapping N circles smaller than the first radius and having different radii of the same center as the first radius are alternately formed. A diaphragm for an incidence illumination is provided, comprising a second aperture formed with N-1 (when N is odd) or N-2 (when N is even) phase shift regions. The present invention also provides a projection exposure apparatus using the modified illumination aperture.
본 발명에 의하면 위상변이영역을 통과한 광이 콘덴서 렌즈의 가장자리부위로 회절함으로서 제1조리개의 광투과영역을 통과하여 조명된 사입사 조명성분의 광강도를 중대시킨다.According to the present invention, the light passing through the phase shifting region is diffracted to the edge portion of the condenser lens, thereby increasing the light intensity of the incidence illumination component illuminated through the light transmitting region of the first aperture.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제3도는 본 발명의 실시예에 의한 변형조명용 조리개의 평면도이다,3 is a plan view of a modified illumination stop according to an embodiment of the present invention,
제4도는 본 발명의 실시예에 의한 변형 조명용 조리개를 X-X'측으로 절단한 단면도이다.4 is a cross-sectional view of the modified illumination diaphragm cut to the X-X 'side according to an embodiment of the present invention.
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950056987A KR970049055A (en) | 1995-12-26 | 1995-12-26 | Deformation aperture and projection exposure apparatus for deformed lighting using same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950056987A KR970049055A (en) | 1995-12-26 | 1995-12-26 | Deformation aperture and projection exposure apparatus for deformed lighting using same |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970049055A true KR970049055A (en) | 1997-07-29 |
Family
ID=66617279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950056987A KR970049055A (en) | 1995-12-26 | 1995-12-26 | Deformation aperture and projection exposure apparatus for deformed lighting using same |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970049055A (en) |
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1995
- 1995-12-26 KR KR1019950056987A patent/KR970049055A/en not_active Application Discontinuation
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WITN | Withdrawal due to no request for examination |