KR970022579A - Modified Aperture and Modified Illumination Method Using the Same - Google Patents
Modified Aperture and Modified Illumination Method Using the Same Download PDFInfo
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- KR970022579A KR970022579A KR1019950036436A KR19950036436A KR970022579A KR 970022579 A KR970022579 A KR 970022579A KR 1019950036436 A KR1019950036436 A KR 1019950036436A KR 19950036436 A KR19950036436 A KR 19950036436A KR 970022579 A KR970022579 A KR 970022579A
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- light transmission
- transmission region
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Abstract
변형 조리개 및 이를 이용한 변형조명방법에 관해 개시한다. 본 발명은 차광영역과 광투과영역을 구비하는 사입사 조명용 조리개에 있어서, 동일중심의 제1반지름을 가지는 원과 제2반지름를 가지는 원의 공통부분으로 형성된 제1광투과영역 및 상기 제1광투과영역과 중첩되어 형성된 제3반지름을 가지는 복수개의 원으로 형성된 제2광투과영역을 구비하는 것을 특징으로 하는 사입사 조명용 조리개를 제공한다. 본 발명은 또한 상기 변형 조명용 조리개를 이용한 변형조명방법을 제공한다.A modified aperture and a modified illumination method using the same are disclosed. According to an aspect of the present invention, there is provided a light emitting area and a light transmitting area, including: a first light transmission area and a first light transmission area formed of a common part of a circle having a first radius and a second radius of the same center. It provides a diaphragm illumination aperture characterized in that it comprises a second light transmission region formed of a plurality of circles having a third radius formed overlapping with the region. The present invention also provides a modified illumination method using the modified illumination aperture.
본 발명에 의하면 조리개를 통과한 사입사 조명성분의 광강도를 높임과 동시에 패턴의 방향성을 보장할 수 있으므로 효율적인 변형조명을 구현할 수 있게 되어 생산성을 향상시킬 수 있다.According to the present invention, since the light intensity of the incident light component passing through the aperture can be increased and the directionality of the pattern can be ensured, efficient deformation lighting can be realized, thereby improving productivity.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제3도는 본 발명의 제1실시예에 의한 변형 조리개의 평면도이다.3 is a plan view of the modified stop according to the first embodiment of the present invention.
제4도는 본 발명의 제2실시예에 의한 변형 조리개의 평면도이다.4 is a plan view of a modified stop according to a second embodiment of the present invention.
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950036436A KR970022579A (en) | 1995-10-20 | 1995-10-20 | Modified Aperture and Modified Illumination Method Using the Same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950036436A KR970022579A (en) | 1995-10-20 | 1995-10-20 | Modified Aperture and Modified Illumination Method Using the Same |
Publications (1)
Publication Number | Publication Date |
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KR970022579A true KR970022579A (en) | 1997-05-30 |
Family
ID=66583909
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1019950036436A KR970022579A (en) | 1995-10-20 | 1995-10-20 | Modified Aperture and Modified Illumination Method Using the Same |
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KR (1) | KR970022579A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100510461B1 (en) * | 1998-03-20 | 2005-10-24 | 삼성전자주식회사 | Illumination apparatus comprising an aperture having a high resolution, method for fabricating the same and illuminating method using the same |
KR100513440B1 (en) * | 1998-09-22 | 2005-11-25 | 삼성전자주식회사 | Lighting device for exposure equipment for semiconductor device manufacturing and modified illumination method using same |
KR100606495B1 (en) * | 2003-02-14 | 2006-08-01 | 에이에스엠엘 네델란즈 비.브이. | Device and method for wafer alignment with reduced tilt sensitivity |
-
1995
- 1995-10-20 KR KR1019950036436A patent/KR970022579A/en not_active Application Discontinuation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100510461B1 (en) * | 1998-03-20 | 2005-10-24 | 삼성전자주식회사 | Illumination apparatus comprising an aperture having a high resolution, method for fabricating the same and illuminating method using the same |
KR100513440B1 (en) * | 1998-09-22 | 2005-11-25 | 삼성전자주식회사 | Lighting device for exposure equipment for semiconductor device manufacturing and modified illumination method using same |
KR100606495B1 (en) * | 2003-02-14 | 2006-08-01 | 에이에스엠엘 네델란즈 비.브이. | Device and method for wafer alignment with reduced tilt sensitivity |
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