KR970022579A - Modified Aperture and Modified Illumination Method Using the Same - Google Patents

Modified Aperture and Modified Illumination Method Using the Same Download PDF

Info

Publication number
KR970022579A
KR970022579A KR1019950036436A KR19950036436A KR970022579A KR 970022579 A KR970022579 A KR 970022579A KR 1019950036436 A KR1019950036436 A KR 1019950036436A KR 19950036436 A KR19950036436 A KR 19950036436A KR 970022579 A KR970022579 A KR 970022579A
Authority
KR
South Korea
Prior art keywords
radius
light
aperture
light transmission
transmission region
Prior art date
Application number
KR1019950036436A
Other languages
Korean (ko)
Inventor
손창진
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950036436A priority Critical patent/KR970022579A/en
Publication of KR970022579A publication Critical patent/KR970022579A/en

Links

Landscapes

  • Electroluminescent Light Sources (AREA)

Abstract

변형 조리개 및 이를 이용한 변형조명방법에 관해 개시한다. 본 발명은 차광영역과 광투과영역을 구비하는 사입사 조명용 조리개에 있어서, 동일중심의 제1반지름을 가지는 원과 제2반지름를 가지는 원의 공통부분으로 형성된 제1광투과영역 및 상기 제1광투과영역과 중첩되어 형성된 제3반지름을 가지는 복수개의 원으로 형성된 제2광투과영역을 구비하는 것을 특징으로 하는 사입사 조명용 조리개를 제공한다. 본 발명은 또한 상기 변형 조명용 조리개를 이용한 변형조명방법을 제공한다.A modified aperture and a modified illumination method using the same are disclosed. According to an aspect of the present invention, there is provided a light emitting area and a light transmitting area, including: a first light transmission area and a first light transmission area formed of a common part of a circle having a first radius and a second radius of the same center. It provides a diaphragm illumination aperture characterized in that it comprises a second light transmission region formed of a plurality of circles having a third radius formed overlapping with the region. The present invention also provides a modified illumination method using the modified illumination aperture.

본 발명에 의하면 조리개를 통과한 사입사 조명성분의 광강도를 높임과 동시에 패턴의 방향성을 보장할 수 있으므로 효율적인 변형조명을 구현할 수 있게 되어 생산성을 향상시킬 수 있다.According to the present invention, since the light intensity of the incident light component passing through the aperture can be increased and the directionality of the pattern can be ensured, efficient deformation lighting can be realized, thereby improving productivity.

Description

변형 조리개 및 이를 이용한 변형조명방법Modified Aperture and Modified Illumination Method Using the Same

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제3도는 본 발명의 제1실시예에 의한 변형 조리개의 평면도이다.3 is a plan view of the modified stop according to the first embodiment of the present invention.

제4도는 본 발명의 제2실시예에 의한 변형 조리개의 평면도이다.4 is a plan view of a modified stop according to a second embodiment of the present invention.

Claims (6)

차광영역과 광투과영역을 구비하는 사입사 조명용 조리개에 있어서, 동일중심의 제1반지름을 가지는 원과 제2반지름을 가지는 원의 공통부분으로 형성된 제1광투과영역; 및 상기 제2광투과영역과 중첩되어 형성된 제3반지름을 가지는 복수개의 원으로 형성된 제2광투과영역을 구비하는 것을 특징으로 하는 사입사 조명용 조리개.An illumination injecting aperture having a light shielding area and a light transmitting area, comprising: a first light transmitting area formed by a common part of a circle having a first radius of the same center and a circle having a second radius; And a second light transmission region formed of a plurality of circles having a third radius formed to overlap with the second light transmission region. 제1항에 있어서, 상기 제2광투과영역은 4개의 원으로 구성되는 것을 특징으로 하는 사입사 조명용 조리개.The diaphragm illumination iris according to claim 1, wherein the second light transmission region is composed of four circles. 차광영역과 광투과영역을 구비하는 사입사 조명용 조리개에 있어서, 동일중심의 제1반지름을 가지는 원과 제2반지름을 가지는 원의 공통부분으로 형성된 제1광투과영역; 상기 제1광투과영역과 중첩되어 형성된 제3반지름을 가지는 복수개의 원으로 형성된 제2광투과영역; 및 상기 제1반지름보다 작고, 동일중심의 서로 다른반지름을 가지는 N개의 원이 중첩되어 형성된 N개의 고리영역이 교대로 형성한 N-1(N이 홀수인 때) 또는 N-2(N이 짝수일 때)개의 제3광투과영역을 구비하는 것을 특징으로 하는 사입사 조명용 조리개.An illumination injecting aperture having a light shielding area and a light transmitting area, comprising: a first light transmitting area formed by a common part of a circle having a first radius of the same center and a circle having a second radius; A second light transmission region formed of a plurality of circles having a third radius formed overlapping with the first light transmission region; N-1 (when N is an odd number) or N-2 (where N is an even number) formed by alternating N ring regions formed by overlapping N circles each having a different radius of the same center and smaller than the first radius. And) a third light transmitting area. 제3항에 있어서, 상기 제3광투과영역은 조리개의 기판을 식각하여 형성하는 것을 특징으로 하는 사입사 조명용 조리개.The diaphragm illuminating aperture of claim 3, wherein the third light transmitting region is formed by etching a substrate of the diaphragm. 제3항에 있어서, 상기 제3광투과영역은 통과한 빛이 직진하지 않고 콘덴서 렌즈의 가장자리부위로 회절하도록 형성된 것을 특징으로 하는 사입사 조명용 조리개.The diaphragm illumination aperture of claim 3, wherein the third light transmission region is formed so that light passing through the light beam is diffracted to an edge portion of the condenser lens without going straight. 제3항에 있어서, 상기 조리개는 석영, LE, SLW 중에서 어느 하나를 이용하여 형성하는 것을 특징으로 하는 사입사 조명용 조리개.The diaphragm illumination iris according to claim 3, wherein the iris is formed using one of quartz, LE, and SLW. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950036436A 1995-10-20 1995-10-20 Modified Aperture and Modified Illumination Method Using the Same KR970022579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950036436A KR970022579A (en) 1995-10-20 1995-10-20 Modified Aperture and Modified Illumination Method Using the Same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950036436A KR970022579A (en) 1995-10-20 1995-10-20 Modified Aperture and Modified Illumination Method Using the Same

Publications (1)

Publication Number Publication Date
KR970022579A true KR970022579A (en) 1997-05-30

Family

ID=66583909

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950036436A KR970022579A (en) 1995-10-20 1995-10-20 Modified Aperture and Modified Illumination Method Using the Same

Country Status (1)

Country Link
KR (1) KR970022579A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100510461B1 (en) * 1998-03-20 2005-10-24 삼성전자주식회사 Illumination apparatus comprising an aperture having a high resolution, method for fabricating the same and illuminating method using the same
KR100513440B1 (en) * 1998-09-22 2005-11-25 삼성전자주식회사 Lighting device for exposure equipment for semiconductor device manufacturing and modified illumination method using same
KR100606495B1 (en) * 2003-02-14 2006-08-01 에이에스엠엘 네델란즈 비.브이. Device and method for wafer alignment with reduced tilt sensitivity

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100510461B1 (en) * 1998-03-20 2005-10-24 삼성전자주식회사 Illumination apparatus comprising an aperture having a high resolution, method for fabricating the same and illuminating method using the same
KR100513440B1 (en) * 1998-09-22 2005-11-25 삼성전자주식회사 Lighting device for exposure equipment for semiconductor device manufacturing and modified illumination method using same
KR100606495B1 (en) * 2003-02-14 2006-08-01 에이에스엠엘 네델란즈 비.브이. Device and method for wafer alignment with reduced tilt sensitivity

Similar Documents

Publication Publication Date Title
KR20010049945A (en) Compact light source module
KR910005069A (en) Diffraction lens
WO1999050596A3 (en) Illumination device for generating non-symmetric light beam, optical lens array and optical lens
WO2010058663A1 (en) Lighting device for vehicle
KR970077704A (en) Mask for microlens pattern
KR970022579A (en) Modified Aperture and Modified Illumination Method Using the Same
KR970012966A (en) Deformed aperture and projection exposure apparatus using the same
US5386266A (en) Projection exposure system
ATE45629T1 (en) ILLUMINATION DEVICE FOR THE OPTICAL, ESPECIALLY IMAGE ANALYTICAL EVALUATION OF MICROBIOLOGICAL OBJECTS.
US7195387B2 (en) Device and method for emitting light with increased brightness using diffractive grating pattern
EP0961136A2 (en) Optical diffuser and lighting device equipped therewith
KR100510455B1 (en) Mask pattern for formation of an isolated pattern, method for fabricating the same and method for forming an isolated pattern using the same
US5387961A (en) Illumination system for projection exposing apparatus
KR970049055A (en) Deformation aperture and projection exposure apparatus for deformed lighting using same
KR970049056A (en) Deformed aperture and projection exposure apparatus using the same
KR0147602B1 (en) Lighting apparatus for increase of contrast
KR950014995A (en) PROJECTION EXPOSURE APPARATUS
JPS62127717A (en) Liquid crystal display device
SU1105724A1 (en) Lighting system
KR19990026083A (en) Deformed lighting device and its formation method
KR970028856A (en) Projection Exposure Equipment and Exposure Method
SU1636618A1 (en) Decorative lamp
KR100510461B1 (en) Illumination apparatus comprising an aperture having a high resolution, method for fabricating the same and illuminating method using the same
KR100245900B1 (en) Display system
KR200145796Y1 (en) Multi annular aperture for exposuring process

Legal Events

Date Code Title Description
WITN Withdrawal due to no request for examination