KR970046747U - Anode of plasma etching equipment - Google Patents

Anode of plasma etching equipment

Info

Publication number
KR970046747U
KR970046747U KR2019950045678U KR19950045678U KR970046747U KR 970046747 U KR970046747 U KR 970046747U KR 2019950045678 U KR2019950045678 U KR 2019950045678U KR 19950045678 U KR19950045678 U KR 19950045678U KR 970046747 U KR970046747 U KR 970046747U
Authority
KR
South Korea
Prior art keywords
anode
plasma etching
etching equipment
equipment
plasma
Prior art date
Application number
KR2019950045678U
Other languages
Korean (ko)
Other versions
KR0134559Y1 (en
Inventor
권창헌
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019950045678U priority Critical patent/KR0134559Y1/en
Publication of KR970046747U publication Critical patent/KR970046747U/en
Application granted granted Critical
Publication of KR0134559Y1 publication Critical patent/KR0134559Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32559—Protection means, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/3255—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
KR2019950045678U 1995-12-22 1995-12-22 Anode of plasma etching apparatus KR0134559Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950045678U KR0134559Y1 (en) 1995-12-22 1995-12-22 Anode of plasma etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950045678U KR0134559Y1 (en) 1995-12-22 1995-12-22 Anode of plasma etching apparatus

Publications (2)

Publication Number Publication Date
KR970046747U true KR970046747U (en) 1997-07-31
KR0134559Y1 KR0134559Y1 (en) 1999-03-20

Family

ID=19437097

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950045678U KR0134559Y1 (en) 1995-12-22 1995-12-22 Anode of plasma etching apparatus

Country Status (1)

Country Link
KR (1) KR0134559Y1 (en)

Also Published As

Publication number Publication date
KR0134559Y1 (en) 1999-03-20

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20090922

Year of fee payment: 12

LAPS Lapse due to unpaid annual fee