KR970030239A - Chemical liquid discharge nozzle - Google Patents

Chemical liquid discharge nozzle Download PDF

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Publication number
KR970030239A
KR970030239A KR1019960055322A KR19960055322A KR970030239A KR 970030239 A KR970030239 A KR 970030239A KR 1019960055322 A KR1019960055322 A KR 1019960055322A KR 19960055322 A KR19960055322 A KR 19960055322A KR 970030239 A KR970030239 A KR 970030239A
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South Korea
Prior art keywords
chemical liquid
liquid discharge
substrate
discharge tube
removing means
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KR1019960055322A
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Korean (ko)
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KR100221700B1 (en
Inventor
히로시 요시이
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이시다 아키라
다이닛뽕스크린 세이조오 가부시키가이샤
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Publication of KR970030239A publication Critical patent/KR970030239A/en
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Publication of KR100221700B1 publication Critical patent/KR100221700B1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Coating Apparatus (AREA)
  • Nozzles (AREA)

Abstract

본 발명은 기판(반도체웨이퍼, 액정디스플레이(LCD)의 베이스로 되는 유리기판, 포토마스크용의 유리기판, 광디스크용의 기판 등)의 표면에 약액을 공급하기 위한 약액토출노즐에 관한 것이다. 약액토출노즐에 있어서, 기판에 근접하는 최하부의 형상은 점 또는 선에 의해 구성된다. 기판의 표면에서 튀어 되돌아와 부착된 약액 및/또는 약액토출구멍에서 누출된 약액은 각각의 자신의 중량에 의해 약액토출노즐의 외면을 타고흘러 점 또는 선에 의해 구성된 최하부에 도달하면, 점 또는 선에 의해 구성되어 있는 최하부와 접촉면적이 작게 되어 당해 최하부에서 낙하한다.The present invention relates to a chemical liquid discharge nozzle for supplying a chemical liquid to the surface of a substrate (a semiconductor wafer, a glass substrate serving as a base of a liquid crystal display (LCD), a glass substrate for a photomask, a substrate for an optical disk, etc.). In the chemical liquid ejecting nozzle, the shape of the lowermost portion close to the substrate is constituted by dots or lines. When the chemical liquid that bounces off the surface of the substrate and leaks from the chemical liquid ejection orifice leaks through the outer surface of the chemical liquid ejection nozzle by its own weight and reaches the bottom constituted by a dot or line, a point or line The contact area with the lowest part comprised by this becomes small and falls from the said lowest part.

Description

약액 토출노즐Chemical liquid discharge nozzle

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명의 일실시예에 관한 현상액 토출노즐을 구비한 현상장치의 구성을 나타내는 불럭도.1 is a block diagram showing the configuration of a developing apparatus with a developer discharge nozzle according to an embodiment of the present invention.

Claims (13)

기판의 상방에서 당해 기판의 표면을 행해 약액을 토출하기 위한 약액토출 노즐에 있어서, 외부에서 공급된 약액을 소정의 위치로 인도하는 약액유로와, 상기 약액유로에 의해 인도된 약액을 상기 기판표면상에 토출하는 약액토출구멍과, 상기 기판에 근접하는 하단부에 형성되고, 그의 최하부의 형상이 점 또는 선에 의해 구성된 약액제거수단을 구비하는 약액토출노즐.A chemical liquid discharge nozzle for discharging a chemical liquid through the surface of the substrate above the substrate, comprising: a chemical liquid channel for guiding the chemical liquid supplied from the outside to a predetermined position, and a chemical liquid guided by the chemical liquid channel on the substrate surface. A chemical liquid ejecting nozzle comprising a chemical liquid ejecting hole discharged to the substrate, and a chemical liquid removing means formed at a lower end portion adjacent to the substrate, the lowermost portion of which is formed by dots or lines. 제1항에 있어서, 상기 약액제거수단은 거의 최하부의 형상이 원형이고, 당해 원형의 원주에서 중심을 향해 상향으로 경사진 경사면을 가지고 있는 것을 특징으로 하는 약액토출노즐.The chemical liquid ejecting nozzle according to claim 1, wherein the chemical liquid removing means has a substantially lowermost circular shape and has an inclined surface inclined upwardly toward the center from the circular circumference. 제1항에 있어서, 상기 약액제거수단은 그의 최하부의 형상이 다각형이고, 당해 다각형의 중심을 향해 동일하게 경사각도를 가지고 경사진 경사면을 가지고 있는 것을 특징으로 하는 약액토출노즐.2. The chemical liquid ejecting nozzle according to claim 1, wherein the chemical liquid removing means has a shape of a lowermost part of the polygon and has an inclined surface inclined at the same angle toward the center of the polygon. 제1항에 있어서, 상기 약액제거수단은 그의 최하부의 형상이 점이고, 당해 점에서 주위를 향해 원호상으로 경사진 경사면을 가지고 있는 것을 특징으로 하는 약액토출노즐.The chemical liquid ejecting nozzle according to claim 1, wherein the chemical liquid removing means has a lowermost shape and has an inclined surface that is inclined in an arc toward the periphery thereof. 제1항에 있어서, 상기 약액토출구멍의 최하단은 상기 약액제거수단의 가장 바깥둘레부와 접하고 있는 것을 특징으로 하는 약액토출노즐.The chemical liquid discharge nozzle according to claim 1, wherein the lowermost end of the chemical liquid discharge hole is in contact with the outermost peripheral portion of the chemical liquid removing means. 제1항에 있어서, 상기 약액유로에 의해 인도된 약액을 상기 약액토출구멍까지 인도하는 약액토출관을 더 구비하고, 상기 약액토출관은 상기 약액유로를 구성하는 통체의 측면에서 바깥을 향해 돌출하여 있고, 상기 약액토출구멍을 향해서 하방향으로 경사져 있는 것을 특징으로 하는 약액토출노즐.2. The chemical liquid discharge tube according to claim 1, further comprising a chemical liquid discharge tube for guiding the chemical liquid guided by the chemical liquid flow path to the chemical liquid discharge hole, wherein the chemical liquid discharge tube protrudes outward from the side of the cylinder constituting the chemical liquid flow path. And inclined downward toward the chemical liquid ejection hole. 제2항에 있어서, 상기 약액토출구멍의 최하단은 상기 약액제거수단의 가장 바깥둘레와 접하고 있는 것을 특징으로 하는 약액토출노즐.3. The chemical liquid discharge nozzle according to claim 2, wherein the lowermost end of the chemical liquid discharge hole is in contact with the outermost circumference of the chemical liquid removing means. 제2항에 있어서, 상기 약액유로에 의해 인도된 약액을 상기 약액토출구멍까지 인도하는 약액토출관을 더 구비하고, 상기 약액토출관은 상기 약액유로를 구성하는 통체의 측면에서 바깥을 향해 돌출하여 있고, 상기 약액토출구멍을 향해서 하방향으로 경사진 것을 특징으로 하는 약액토출노즐.3. The chemical liquid discharge tube according to claim 2, further comprising a chemical liquid discharge tube for guiding the chemical liquid guided by the chemical liquid channel to the chemical liquid discharge hole, wherein the chemical liquid discharge tube protrudes outward from the side of the cylinder constituting the chemical liquid channel. And inclined downward toward the chemical liquid ejection hole. 제3항에 있어서, 상기 약액토출구멍의 최하단은 상기 약액제거수단의 가장 바깥둘레부와 접하고 있는 것을 특징으로 하는 약액토출노즐.4. The chemical liquid discharge nozzle according to claim 3, wherein the lowermost end of the chemical liquid discharge hole is in contact with the outermost peripheral portion of the chemical liquid removing means. 제3항에 있어서, 상기 약액유로에 의해 인도된 약액을 상기 약액토출구멍까지 인도하는 약액토출관을 더 구비하고, 상기 약액토출관은 상기 약액유로를 구성하는 통체의 측면에서 바같을 향해 돌출하여 있고, 상기 약액토출구멍을 향해서 하방향으로 경사져 있는 것을 특징으로 하는 약액토출노즐.4. The chemical liquid discharge tube according to claim 3, further comprising a chemical liquid discharge tube for guiding the chemical liquid guided by the chemical liquid channel to the chemical liquid discharge hole, wherein the chemical liquid discharge tube protrudes toward the straight from the side of the cylinder constituting the chemical liquid channel. And inclined downward toward the chemical liquid ejection hole. 제4항에 있어서, 상기 약액토출구멍의 최하단은 상기 약액제거수단의 가장 바깥둘레부와 접하고 있는 것을 특징으로 하는 약액토출노즐.The chemical liquid discharge nozzle according to claim 4, wherein the lowermost end of the chemical liquid discharge hole is in contact with the outermost peripheral portion of the chemical liquid removing means. 제4항에 있어서, 상기 약액유로에 의해 인도된 약액을 상기 약액토출구멍까지 인도하는 약액토출관을 더 구비하고, 상기 약액토출관은 상기 약액유로를 구성하는 통체의 측면에서 바깥을 향해 돌출하여 있고, 상기 약액토출구멍을 향해서 하방향으로 경사져 있는 것을 특징으로 하는 약액토출노즐.5. The chemical liquid discharge tube according to claim 4, further comprising a chemical liquid discharge tube for guiding the chemical liquid guided by the chemical liquid channel to the chemical liquid discharge hole, wherein the chemical liquid discharge tube protrudes outward from the side of the cylinder constituting the chemical liquid channel. And inclined downward toward the chemical liquid ejection hole. 외부에서 공급된 약액이 약액유로에 의해 소정의 위치로 인도되고, 상기 소정의 위치로 인도된 약액이 약액토출구멍에서 기판의 표면을 향해 토출되도록 한 약액토출노즐에 있어서, 상기 기판의 표면에서 튀어 되돌아와 외면상에 약액이 부착되었을 때 및/또는, 상기 약액토출구멍에서 외면상에 약액이 누출되었을때, 상기 외면상의 약액은 당해 외면상을 타고 흘러 최하부에 도달하고, 상기 최하부에 도달된 약액은 당해 최하부와의 접촉면적이 작아짐으로써, 상기 기판의 표면상으로 이탈하는 약액토출노즐.In the chemical liquid discharge nozzle which is supplied from the outside to the predetermined position by the chemical liquid flow path and the chemical liquid guided to the predetermined position is discharged toward the surface of the substrate, it splashes on the surface of the substrate. When the chemical liquid is returned to the outer surface and / or when the chemical liquid leaks from the chemical discharge hole to the outer surface, the chemical liquid on the outer surface flows on the outer surface to reach the bottom and reaches the lowermost portion. The chemical liquid ejecting nozzle which leaves the surface of the substrate by decreasing the contact area with the lowermost portion.
KR1019960055322A 1995-11-28 1996-11-19 Chemical discharge nozzle KR100221700B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP30949295A JP3669601B2 (en) 1995-11-28 1995-11-28 Chemical discharge nozzle
JP95-309492 1995-11-28

Publications (2)

Publication Number Publication Date
KR970030239A true KR970030239A (en) 1997-06-26
KR100221700B1 KR100221700B1 (en) 1999-09-15

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Application Number Title Priority Date Filing Date
KR1019960055322A KR100221700B1 (en) 1995-11-28 1996-11-19 Chemical discharge nozzle

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KR (1) KR100221700B1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4786806B2 (en) * 2001-02-19 2011-10-05 本田技研工業株式会社 Sealer application nozzle
JP4496202B2 (en) * 2006-11-27 2010-07-07 株式会社 イアス Nozzle and liquid recovery method
KR20220107911A (en) 2021-01-26 2022-08-02 편민현 A drug sprayer

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JP3669601B2 (en) 2005-07-13
KR100221700B1 (en) 1999-09-15
JPH09148212A (en) 1997-06-06

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