KR970025781U - Liquid source thermostat of atmospheric pressure chemical vapor deposition equipment - Google Patents

Liquid source thermostat of atmospheric pressure chemical vapor deposition equipment

Info

Publication number
KR970025781U
KR970025781U KR2019950035262U KR19950035262U KR970025781U KR 970025781 U KR970025781 U KR 970025781U KR 2019950035262 U KR2019950035262 U KR 2019950035262U KR 19950035262 U KR19950035262 U KR 19950035262U KR 970025781 U KR970025781 U KR 970025781U
Authority
KR
South Korea
Prior art keywords
vapor deposition
atmospheric pressure
chemical vapor
pressure chemical
liquid source
Prior art date
Application number
KR2019950035262U
Other languages
Korean (ko)
Other versions
KR200211729Y1 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR2019950035262U priority Critical patent/KR200211729Y1/en
Publication of KR970025781U publication Critical patent/KR970025781U/en
Application granted granted Critical
Publication of KR200211729Y1 publication Critical patent/KR200211729Y1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
KR2019950035262U 1995-11-23 1995-11-23 Liquid source thermostat of atmospheric pressure chemical vapor deposition equipment KR200211729Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950035262U KR200211729Y1 (en) 1995-11-23 1995-11-23 Liquid source thermostat of atmospheric pressure chemical vapor deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950035262U KR200211729Y1 (en) 1995-11-23 1995-11-23 Liquid source thermostat of atmospheric pressure chemical vapor deposition equipment

Publications (2)

Publication Number Publication Date
KR970025781U true KR970025781U (en) 1997-06-20
KR200211729Y1 KR200211729Y1 (en) 2001-03-02

Family

ID=60906866

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950035262U KR200211729Y1 (en) 1995-11-23 1995-11-23 Liquid source thermostat of atmospheric pressure chemical vapor deposition equipment

Country Status (1)

Country Link
KR (1) KR200211729Y1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100856312B1 (en) * 2003-10-30 2008-09-03 동부일렉트로닉스 주식회사 Heater of low pressure chemical vapor deposition apparatus

Also Published As

Publication number Publication date
KR200211729Y1 (en) 2001-03-02

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20091028

Year of fee payment: 10

EXPY Expiration of term