KR960022673U - Low pressure chemical vapor deposition device - Google Patents

Low pressure chemical vapor deposition device

Info

Publication number
KR960022673U
KR960022673U KR2019940036812U KR19940036812U KR960022673U KR 960022673 U KR960022673 U KR 960022673U KR 2019940036812 U KR2019940036812 U KR 2019940036812U KR 19940036812 U KR19940036812 U KR 19940036812U KR 960022673 U KR960022673 U KR 960022673U
Authority
KR
South Korea
Prior art keywords
vapor deposition
low pressure
chemical vapor
pressure chemical
deposition device
Prior art date
Application number
KR2019940036812U
Other languages
Korean (ko)
Other versions
KR0117107Y1 (en
Inventor
이승희
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019940036812U priority Critical patent/KR0117107Y1/en
Publication of KR960022673U publication Critical patent/KR960022673U/en
Application granted granted Critical
Publication of KR0117107Y1 publication Critical patent/KR0117107Y1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019940036812U 1994-12-28 1994-12-28 Device for chemical vapor deposition under low pressure KR0117107Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940036812U KR0117107Y1 (en) 1994-12-28 1994-12-28 Device for chemical vapor deposition under low pressure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940036812U KR0117107Y1 (en) 1994-12-28 1994-12-28 Device for chemical vapor deposition under low pressure

Publications (2)

Publication Number Publication Date
KR960022673U true KR960022673U (en) 1996-07-20
KR0117107Y1 KR0117107Y1 (en) 1998-04-23

Family

ID=19403535

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940036812U KR0117107Y1 (en) 1994-12-28 1994-12-28 Device for chemical vapor deposition under low pressure

Country Status (1)

Country Link
KR (1) KR0117107Y1 (en)

Also Published As

Publication number Publication date
KR0117107Y1 (en) 1998-04-23

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Legal Events

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Year of fee payment: 12

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