KR970046657U - Reaction gas injection device of chemical vapor deposition equipment - Google Patents

Reaction gas injection device of chemical vapor deposition equipment

Info

Publication number
KR970046657U
KR970046657U KR2019950055203U KR19950055203U KR970046657U KR 970046657 U KR970046657 U KR 970046657U KR 2019950055203 U KR2019950055203 U KR 2019950055203U KR 19950055203 U KR19950055203 U KR 19950055203U KR 970046657 U KR970046657 U KR 970046657U
Authority
KR
South Korea
Prior art keywords
vapor deposition
chemical vapor
injection device
reaction gas
gas injection
Prior art date
Application number
KR2019950055203U
Other languages
Korean (ko)
Other versions
KR200154507Y1 (en
Inventor
김재홍
손달호
정진수
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019950055203U priority Critical patent/KR200154507Y1/en
Publication of KR970046657U publication Critical patent/KR970046657U/en
Application granted granted Critical
Publication of KR200154507Y1 publication Critical patent/KR200154507Y1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019950055203U 1995-12-30 1995-12-30 Apparatus for injecting reaction gas of chemical vapor deposition system KR200154507Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950055203U KR200154507Y1 (en) 1995-12-30 1995-12-30 Apparatus for injecting reaction gas of chemical vapor deposition system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950055203U KR200154507Y1 (en) 1995-12-30 1995-12-30 Apparatus for injecting reaction gas of chemical vapor deposition system

Publications (2)

Publication Number Publication Date
KR970046657U true KR970046657U (en) 1997-07-31
KR200154507Y1 KR200154507Y1 (en) 1999-08-16

Family

ID=19443632

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950055203U KR200154507Y1 (en) 1995-12-30 1995-12-30 Apparatus for injecting reaction gas of chemical vapor deposition system

Country Status (1)

Country Link
KR (1) KR200154507Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110400764A (en) * 2018-04-25 2019-11-01 三星电子株式会社 Gas syringe and Wafer processing apparatus with it

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101091086B1 (en) * 2009-07-16 2011-12-13 세메스 주식회사 A gas injector and an apparatus having it

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110400764A (en) * 2018-04-25 2019-11-01 三星电子株式会社 Gas syringe and Wafer processing apparatus with it

Also Published As

Publication number Publication date
KR200154507Y1 (en) 1999-08-16

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Legal Events

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E701 Decision to grant or registration of patent right
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FPAY Annual fee payment

Payment date: 20090427

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee