KR970024181A - Capacitor and resistor formation method of semiconductor device - Google Patents
Capacitor and resistor formation method of semiconductor device Download PDFInfo
- Publication number
- KR970024181A KR970024181A KR1019950034927A KR19950034927A KR970024181A KR 970024181 A KR970024181 A KR 970024181A KR 1019950034927 A KR1019950034927 A KR 1019950034927A KR 19950034927 A KR19950034927 A KR 19950034927A KR 970024181 A KR970024181 A KR 970024181A
- Authority
- KR
- South Korea
- Prior art keywords
- capacitor
- semiconductor device
- resistor
- formation method
- resistor formation
- Prior art date
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- Semiconductor Integrated Circuits (AREA)
Abstract
반도체소자의 캐패시터 및 레지스터 형성방법에 대해 기재되어 있다. 이는, 셀 어래이 내에 형성된 메모리 셀과 동일한 구조의 셀을 주변회로 영역에 형성하여, 시간 지연용 커패시터 및 레지스터로 이용하는 것을 특징으로 한다. 따라서, 종래의 캐패시터보다 약 3∼5배 이상의 면적을 줄일 수 있을 뿐만 아니라, 차세대 대응에도 매우 적합한 구조를 갖는다.A method of forming a capacitor and a resistor of a semiconductor device is described. This is characterized in that a cell having the same structure as the memory cell formed in the cell array is formed in the peripheral circuit area and used as a time delay capacitor and a resistor. Therefore, the area can be reduced by about 3 to 5 times or more than the conventional capacitor, and has a structure that is very suitable for the next generation.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2A도 내지 제2C도는 본 발명에 의한 커패시터 및 레지스터 형성방법을 설명하기 위해 도시한 레이아웃도들이다.2A to 2C are layout views illustrating a method of forming a capacitor and a resistor according to the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950034927A KR970024181A (en) | 1995-10-11 | 1995-10-11 | Capacitor and resistor formation method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950034927A KR970024181A (en) | 1995-10-11 | 1995-10-11 | Capacitor and resistor formation method of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970024181A true KR970024181A (en) | 1997-05-30 |
Family
ID=66582538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950034927A KR970024181A (en) | 1995-10-11 | 1995-10-11 | Capacitor and resistor formation method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970024181A (en) |
-
1995
- 1995-10-11 KR KR1019950034927A patent/KR970024181A/en not_active Application Discontinuation
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Legal Events
Date | Code | Title | Description |
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WITN | Withdrawal due to no request for examination |