KR970023890A - - Google Patents
Info
- Publication number
- KR970023890A KR970023890A KR19960044069A KR19960044069A KR970023890A KR 970023890 A KR970023890 A KR 970023890A KR 19960044069 A KR19960044069 A KR 19960044069A KR 19960044069 A KR19960044069 A KR 19960044069A KR 970023890 A KR970023890 A KR 970023890A
- Authority
- KR
- South Korea
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P70/00—Cleaning of wafers, substrates or parts of devices
- H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/005—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being ozonated
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US481995P | 1995-10-05 | 1995-10-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970023890A true KR970023890A (enExample) | 1997-05-30 |
Family
ID=21712687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR19960044069A Ceased KR970023890A (enExample) | 1995-10-05 | 1996-10-05 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0767487A1 (enExample) |
| JP (1) | JPH09190994A (enExample) |
| KR (1) | KR970023890A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100526453B1 (ko) * | 1998-12-31 | 2005-12-21 | 주식회사 하이닉스반도체 | 반도체 플래쉬 이이피롬 소자 제조방법 |
| KR20240090292A (ko) * | 2021-11-23 | 2024-06-21 | 싱귤러스 테크놀러지스 악티엔게젤샤프트 | 태양전지 기판의 인라인 처리를 위한 방법 및 습식 벤치 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1107970C (zh) * | 1997-12-10 | 2003-05-07 | Cfmt公司 | 电子元件制造用的湿法处理方法 |
| KR100483037B1 (ko) * | 1997-12-27 | 2005-07-29 | 주식회사 하이닉스반도체 | 반도체웨이퍼세정방법 |
| US6848455B1 (en) | 2002-04-22 | 2005-02-01 | Novellus Systems, Inc. | Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4749640A (en) * | 1986-09-02 | 1988-06-07 | Monsanto Company | Integrated circuit manufacturing process |
| JP3261683B2 (ja) * | 1991-05-31 | 2002-03-04 | 忠弘 大見 | 半導体の洗浄方法及び洗浄装置 |
| US5516730A (en) * | 1994-08-26 | 1996-05-14 | Memc Electronic Materials, Inc. | Pre-thermal treatment cleaning process of wafers |
| DE4432738A1 (de) * | 1994-09-14 | 1996-03-21 | Siemens Ag | Verfahren zum naßchemischen Entfernen von Kontaminationen auf Halbleiterkristalloberflächen |
-
1996
- 1996-10-05 KR KR19960044069A patent/KR970023890A/ko not_active Ceased
- 1996-10-07 JP JP8300785A patent/JPH09190994A/ja active Pending
- 1996-10-07 EP EP96116032A patent/EP0767487A1/en not_active Ceased
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100526453B1 (ko) * | 1998-12-31 | 2005-12-21 | 주식회사 하이닉스반도체 | 반도체 플래쉬 이이피롬 소자 제조방법 |
| KR20240090292A (ko) * | 2021-11-23 | 2024-06-21 | 싱귤러스 테크놀러지스 악티엔게젤샤프트 | 태양전지 기판의 인라인 처리를 위한 방법 및 습식 벤치 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH09190994A (ja) | 1997-07-22 |
| EP0767487A1 (en) | 1997-04-09 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| A201 | Request for examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
St.27 status event code: N-2-6-B10-B15-exm-PE0601 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |