KR970023794A

KR970023794A - Exhaust gas scrubber of semiconductor device manufacturing equipment

Info

Publication number: KR970023794A
Application number: KR1019950037149A
Authority: KR
Inventors: 김역환; 최병오; 박경신
Original assignee: 김광호; 삼성전자 주식회사
Priority date: 1995-10-25
Filing date: 1995-10-25
Publication date: 1997-05-30

Abstract

본 발명은 반도체소자의 제조공정에 화학가스를 이용한 공정후 공정에서 발생한 가스를 배출하는데 사용되는 반도체소자 제조장치의 배기가스세정기에 대한 것이다.The present invention relates to an exhaust gas cleaner of a semiconductor device manufacturing apparatus used for discharging gas generated in a post-process process using chemical gas in a semiconductor device manufacturing process.

종래의 배기가스 세정기는 가스를 정화하고 발생한 고형 물질들은 용해된 가스와 함께 배출되면서 메인 배수라인에 조금씩 쌓여 일정기간 후에는 라인을 막아버리는 현상이 발생하여 주기적으로 배수라인을 해체하거나 라인의 끝단에서 이 고형물질을 분리 제거해 내야 하는 문제점들이 있었다.Conventional exhaust gas scrubber purifies the gas and the solid materials generated are discharged together with the dissolved gas, which gradually accumulate in the main drain line and block the line after a certain period of time. There were problems that had to be removed to remove this solid material.

본 발명은 상술한 문제점을 극복하기 위한 것으로, 배수라인과 과공급배출라인의 상호 연결부위와 메인배수라인 사이의 중간라인에 설치한 침적물 제거수단을 포함하여, 단순히 밸브의 조작만으로 고형물질을 제거하고 이 고형물질의 제거시기의 파악과 장비의 결함을 예방할 수 있도록 한 것이다.The present invention is to overcome the above-mentioned problems, including the sediment removal means installed in the intermediate line between the interconnection and the main drain line of the drain line and the oversupply discharge line, to remove the solid material by simply operating the valve The timing of removal of this solid material and the prevention of equipment defects are prevented.

Description

Exhaust gas scrubber of semiconductor device manufacturing equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명의 전체적인 구성도.1 is an overall configuration diagram of the present invention.

Claims

The exhaust gas of the equipment is a drain line for discharging purified water and an exhaust gas purifier used in a chemical process of a semiconductor device for discharging the oversupply drain line to the outside through the main drain line. An exhaust gas scrubber for semiconductor device manufacturing equipment comprising a deposit removal means installed in an intermediate line between an interconnection portion of a line and a main drain line.

2. The exhaust gas scrubber according to claim 1, wherein the removing means extends the intermediate line horizontally and installs a trap on the extension line.

The exhaust gas scrubber according to claim 2, wherein the trap has a foreign substance trap valve at a lower portion thereof.

The exhaust gas scrubber according to claim 2, wherein the trap uses any one of a U-shaped and an O-shaped trap.

The exhaust gas scrubber according to claim 2, wherein the trap is formed of a transparent material capable of grasping an internal state.

The exhaust gas scrubber according to claim 2, wherein a transparent window is formed on at least a portion of the trap.

※ Note: The disclosure is based on the initial application.