KR970072068A - Exhaust system of semiconductor manufacturing equipment - Google Patents

Exhaust system of semiconductor manufacturing equipment Download PDF

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Publication number
KR970072068A
KR970072068A KR1019960011616A KR19960011616A KR970072068A KR 970072068 A KR970072068 A KR 970072068A KR 1019960011616 A KR1019960011616 A KR 1019960011616A KR 19960011616 A KR19960011616 A KR 19960011616A KR 970072068 A KR970072068 A KR 970072068A
Authority
KR
South Korea
Prior art keywords
buffer
exhaust
pipe
exhaust pipe
gas
Prior art date
Application number
KR1019960011616A
Other languages
Korean (ko)
Other versions
KR0183838B1 (en
Inventor
송경수
박태신
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019960011616A priority Critical patent/KR0183838B1/en
Publication of KR970072068A publication Critical patent/KR970072068A/en
Application granted granted Critical
Publication of KR0183838B1 publication Critical patent/KR0183838B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

버퍼 내에서 배출 가스가 액화되어 고이는 것을 방지하는 배기 장치를 제공한다. 본 발명은 반도체 장치내에서 유해 가스를 배출하기 위한 배기관과, 상기 배기관에 연결되어 상기 유해 가스를 모으는 버퍼와, 상기 버퍼내에 모인 가스를 외부의 주배기관으로 배출하기 위하여 상기 버퍼와 상기 주배기관 사이를 연결하는 연결 배기관과, 상기 버퍼 내에서 발생하는 액체를 배수하기 위하여 상기 버퍼에 부착된 배수관을 포함하는 배기 장치이다. 따라서, 본 발명의 배기 장치에서는 종래의 경우에 상기 버퍼에서 상기 연결 배수관이 액체에 의해서 막히는 문제를 방지할 수 있고, 이로 인하여 현상 공정의 불량이 발생하지 않게 된다. 또한 현상 장치에서 발생하는 유해 가스를 원활히 배출할 수 있기 때문에, 환경 오염을 방지하고 안전도를 높일 수 있다.And an exhaust device for preventing the exhaust gas from liquefying and accumulating in the buffer. The present invention relates to a semiconductor device having an exhaust pipe for discharging noxious gas, a buffer connected to the exhaust pipe to collect the noxious gas, and a gas supply pipe connected to the buffer and the main exhaust pipe to discharge gas collected in the buffer to an external main exhaust pipe. And a drain pipe attached to the buffer for draining the liquid generated in the buffer. Therefore, in the exhaust system of the present invention, it is possible to prevent the connection pipe from being clogged by the liquid in the buffer in the conventional case, thereby preventing defects in the developing process. In addition, since harmful gas generated in the developing apparatus can be discharged smoothly, environmental pollution can be prevented and safety can be enhanced.

Description

반도체 제조 장비의 배기 장치Exhaust system of semiconductor manufacturing equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제2도는 감광막 현상 장치에서 현상시에 발생하는 가스를 배출하기 위한 본 발명의 배기 장치를 보여주기 위한 도면이다.FIG. 2 is a view for showing an exhausting apparatus of the present invention for discharging a gas generated during development in a photosensitive film developing apparatus.

Claims (5)

반도체 장치 내에서 유해 가스를 배출하기 위한 배기관; 상기 배기관에 연결되어 상기 유해 가스를 모으는 버퍼; 상기 버퍼내에 모인 가스를 외부의 주배기관으로 배출하기 위하여 상기 버퍼와 상기 주배기관 사이를 연결하는 연결 배기관; 및 상기 버퍼내에서 발생하는 액체를 배수하기 위하여 상기 버퍼에 부착된 배수관을 포함하는 것을 특징으로 하는 배기 장치.An exhaust pipe for exhausting noxious gas in the semiconductor device; A buffer connected to the exhaust pipe to collect the noxious gas; A connection exhaust pipe connecting between the buffer and the main exhaust pipe to exhaust gas collected in the buffer to an external main exhaust pipe; And a drain pipe attached to the buffer for draining the liquid generated in the buffer. 제1항에 있어서, 상기 배수관에 밸브가 설치된 것을 특징으로 하는 배기 장치.The exhaust device according to claim 1, wherein a valve is provided in the drain pipe. 제1항에 있어서, 상기 버퍼의 내부를 볼 수 있는 투명창을 상기 버퍼에 포함하는 것을 특징으로 하는 배기 장치.The exhaust system according to claim 1, wherein a transparent window for viewing the inside of the buffer is included in the buffer. 제1항에 있어서, 상기 버퍼 내부에서 상기 배수관과 상기 연결 배기관 사이에 칸막이를 가지는 것을 특징으로 하는 배기 장치.The exhaust device according to claim 1, further comprising a partition between the drain pipe and the connection exhaust pipe inside the buffer. 제4항에 있어서, 상기 칸막이는 상기 배수관과 상기 연결 배기관 사이에 경사지게 설치된 것을 특징으로 하는 배기 장치.The exhaust device according to claim 4, wherein the partition is installed between the drain pipe and the connection exhaust pipe in an inclined manner. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960011616A 1996-04-17 1996-04-17 Exhauster of semiconductor equipment KR0183838B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960011616A KR0183838B1 (en) 1996-04-17 1996-04-17 Exhauster of semiconductor equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960011616A KR0183838B1 (en) 1996-04-17 1996-04-17 Exhauster of semiconductor equipment

Publications (2)

Publication Number Publication Date
KR970072068A true KR970072068A (en) 1997-11-07
KR0183838B1 KR0183838B1 (en) 1999-04-15

Family

ID=19455939

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960011616A KR0183838B1 (en) 1996-04-17 1996-04-17 Exhauster of semiconductor equipment

Country Status (1)

Country Link
KR (1) KR0183838B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100816257B1 (en) * 2003-12-23 2008-03-24 동부일렉트로닉스 주식회사 Exhaust system of furnace

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100816257B1 (en) * 2003-12-23 2008-03-24 동부일렉트로닉스 주식회사 Exhaust system of furnace

Also Published As

Publication number Publication date
KR0183838B1 (en) 1999-04-15

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