KR970018130A - Temperature control device and scanning exposure device - Google Patents

Temperature control device and scanning exposure device Download PDF

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Publication number
KR970018130A
KR970018130A KR1019960036645A KR19960036645A KR970018130A KR 970018130 A KR970018130 A KR 970018130A KR 1019960036645 A KR1019960036645 A KR 1019960036645A KR 19960036645 A KR19960036645 A KR 19960036645A KR 970018130 A KR970018130 A KR 970018130A
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South Korea
Prior art keywords
mask
temperature
exposure apparatus
radiation plate
temperature control
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KR1019960036645A
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Korean (ko)
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사부로 가미야
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오노 시게오
니콘 가부시기가이샤
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Publication of KR970018130A publication Critical patent/KR970018130A/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

본 발명은 노광용 광에 대해 마스크와 감광기판을 동기하여 주사함으로써 마스크에 형성된 패턴의 투영광학계에 의한 상을 감광기판상에 노광하는 주사형 노광장치에 관한 것이다. 이 장치는 마스크를 복사전열에 의해 온도를 제어하는 복사 플레이트와, 복사 플레이트의 온도를 조절하기 위한 온도 제어장치를 갖춘다. 복사냉각 플레이트의 온도를 제어함으로써, 복사전열에 의해 마스크를 냉각할 수 있다. 송풍하지 않기 때문에 마스크에 파티클이 부착되는 일이 없다. 온도제어장치는 마스크에 주어지는 열량을 예측하고, 이것에 의거하여 상기 마스크의 온도가 소정의 범위내의 온도가 되도록 마스크로부터 상기 복사냉각 플레이트에 전달되는 열유량 목표값을 정하고, 열유량이 목표값이 되도록 상기 복사냉각 플레이트의 온도를 제어할 수 있다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scanning exposure apparatus for exposing an image by a projection optical system of a pattern formed on a mask onto a photosensitive substrate by synchronously scanning a mask and a photosensitive substrate for exposure light. The apparatus is provided with a radiation plate for controlling the temperature of the mask by radiation heat transfer, and a temperature controller for adjusting the temperature of the radiation plate. By controlling the temperature of the radiation cooling plate, the mask can be cooled by radiation heat transfer. There is no particle adhering to the mask because it is not blown. The temperature controller predicts the amount of heat given to the mask, and determines a heat flow target value transmitted from the mask to the radiation cooling plate so that the temperature of the mask is within a predetermined range based on the heat flow rate. The temperature of the radiation cooling plate can be controlled so as to.

Description

온도제어장치 및 주사형 노광장치Temperature control device and scanning exposure device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명의 일실시예에 관련된 주사형 노광장치의 개략 구성은 나타내는 도면.1 is a diagram showing a schematic configuration of a scanning exposure apparatus according to an embodiment of the present invention.

Claims (19)

판형상의 물체의 온도를 제어하는 온도제어장치에 있어서, 상기 물체와의 사이에서 복사전열을 행하는 복사 플레이트와, 상기 복사 플레이트의 온도를 제어하기 위한 온도 제어장치와; 상기 물체와 상기 복수 플레이트 사이로서, 또한 복사 플레이트에 대향하여 배치된 적외선 투과창과 및; 상기 적외선 투과창을 상기 복사 플레이트에 대해 지지하고, 또한 단열재료로 구성된 단열지지체를 포함하는 것을 특징으로 하는 온도제어장치.A temperature control device for controlling a temperature of a plate-shaped object, comprising: a radiation plate for radiating heat transfer between the object and a temperature control device for controlling a temperature of the radiation plate; An infrared transmission window disposed between the object and the plurality of plates and also opposed to the radiation plate; And a heat insulating support supporting said infrared transmission window relative to said radiation plate, and further comprising a heat insulating material. 제1항에 있어서, 상기 단열지지체는 상기적외선 투과창과 복사 플레이트 사이의 공간을 밀폐하고, 상기 공간은 진공으로 되어 있는 것을 특징으로 하는 온도제어장치.The temperature control device according to claim 1, wherein the heat insulating support body seals a space between the infrared transmission window and the radiation plate, and the space is a vacuum. 제1항에 있어서 상기 판형상의 물체의 온도를, 비접촉으로 제어하는 것을 특징으로 하는 온도제어장치.The temperature control device according to claim 1, wherein the temperature of the plate-shaped object is controlled by non-contact. 제1항에 있어서, 상기 복사 플레이트를 온도제어하기 위한 반도체 펠티에 소자를 부가로 포함한 것을 특징으로 하는 온도제어장치.The temperature control device according to claim 1, further comprising a semiconductor Peltier element for temperature controlling the radiation plate. 제1항에 있어서, 상기 적외선 투과창은 온도제어기구를 구비하는 것을 특징으로 하는 온도제어장치.The apparatus of claim 1, wherein the infrared transmission window comprises a temperature control mechanism. 제1항에 있어서, 상기 판형상의 물체는 노광장치에 사용되는 마스크인 것을 특징으로 하는 온도제어장치.The temperature control device according to claim 1, wherein the plate-shaped object is a mask used in an exposure apparatus. 제1항에 있어서, 상기 판형상의 물체는 노광장치에 의해 노광되는 기판인 것을 특징으로 하는 온도제어장치.The temperature control device according to claim 1, wherein the plate-shaped object is a substrate exposed by an exposure apparatus. 마스크에 형성된 패턴을 노광용 광에 의해 감광 기판상에 노광하는 투영노광장치에 있어서, 상기 마스크에 노광용 광을 조명하기 위한 조명계와, 상기 마스크를 복사전열에 의해 온도제어하는 복사 플레이트와; 상기 복사 플레이트의 온도를 조절하기 위한 온도 제어장치와; 상기 패턴을 상기 감광기판상에 투영하기 위한 투영광학계 및; 상기 감광기판을 상기 투영광학계의 광축과 수직인 방향으로 이동하기 위한 기판 스테이지를 포함하는 것을 특징으로 하는 투영노광장치.A projection exposure apparatus for exposing a pattern formed on a mask to a photosensitive substrate with exposure light, comprising: an illumination system for illuminating the exposure light to the mask, and a radiation plate for temperature control of the mask by radiation heat transfer; A temperature control device for adjusting the temperature of the radiation plate; A projection optical system for projecting the pattern onto the photosensitive substrate; And a substrate stage for moving the photosensitive substrate in a direction perpendicular to the optical axis of the projection optical system. 제8항에 있어서, 상기 투영노광장치는 상기 노광용 광에 대해 마스크와 감광기판을 동기하여 주사하는 주사형 노광장치인 것을 특징으로 하는 투영노광장치.The projection exposure apparatus according to claim 8, wherein the projection exposure apparatus is a scanning exposure apparatus which scans a mask and a photosensitive substrate in synchronization with the exposure light. 제8항에 있어서, 상기 복사 플레이트는 상기 마스크와 상기 투영광학계 사이 또는 상기 조명계와 상기 마스크 사이의 노광광을 차단하지 않는 영역에 상기 마스크에 대향하여 배치되어 있는 것을 특징으로 하는 투영노광장치.The projection exposure apparatus according to claim 8, wherein the radiation plate is disposed opposite to the mask in an area which does not block exposure light between the mask and the projection optical system or between the illumination system and the mask. 제9항에 있어서, 상기 온도제어장치는 노광중에 상기 마스크에 부여되는 열량을 예측하고, 이것에 의거하여 상기 마스크의 온도가 소정의 허용범위내의 온도가 되도록 마스크로부터 상기 복사 플레이트에 전달되는 열유량 목표값을 정하고, 열유량이 이 목표값이 되도록 상기 복사 플레이트의 온도를 제어하는 것을 특징으로 하는 투영노광장치.10. The heat flux according to claim 9, wherein the temperature control device predicts the amount of heat applied to the mask during exposure, and the heat flux delivered from the mask to the radiation plate so that the temperature of the mask becomes a temperature within a predetermined allowable range based on this. A target exposure value is set, and the projection exposure apparatus characterized by controlling the temperature of the radiation plate so that the heat flow rate becomes this target value. 제11항에 있어서, 상기 온도제어장치는 적어도 상기 마스크상의 노광광의 조도, 마스크의 개구율, 마스크의 반사율 및 노광시간 비율 등의 정보에 의거하여 노광 에너지를 산출함으로써, 상기 마스크에 주어지는 열량을 예측하는 것을 특징으로 하는 투영노광장치.12. The apparatus of claim 11, wherein the temperature controller calculates exposure energy based on at least information such as illuminance of exposure light on the mask, aperture ratio of the mask, reflectance of the mask, and exposure time ratio, thereby predicting the amount of heat given to the mask. Projection exposure apparatus, characterized in that. 제11항에 있어서, 상기 온도제어장치는 측정된 마스크 온도의 정보에 의거하여 상기 마스크에 주어지는 열량을 예측하는 것을 특징으로 하는 투영노광장치.12. The projection exposure apparatus according to claim 11, wherein the temperature control device estimates the amount of heat given to the mask based on the measured information of the mask temperature. 제9항에 있어서, 상기 투영노광장치는 상기 마스크와 상기 복사 플레이트 사이에서, 또한 복사 플레이트에 대향해서 배치된 적외선 투과창을 부가로 포함하는 것을 특징으로 하는 투영노광장치.10. The projection exposure apparatus according to claim 9, wherein the projection exposure apparatus further comprises an infrared transmission window disposed between the mask and the radiation plate and opposite the radiation plate. 제14항에 있어서, 상기 적외선 투과창은 온도제어기구를 갖추는 것을 특징으로 하는 투영노광장치.The projection exposure apparatus according to claim 14, wherein the infrared transmission window is provided with a temperature control mechanism. 제14항에 있어서, 상기 적외선 투과창은 단열재료로 구성된 단열지지체에 의해 상기 복사 플레이트에 지지되어 있는 것을 특징으로 하는 투영노광장치.15. The projection exposure apparatus according to claim 14, wherein said infrared transmission window is supported by said radiation plate by a heat insulating support made of a heat insulating material. 제16항에 있어서, 상기 단열지지체는 적외선 투과창과 복사 플레이트 사이의 공간을 밀폐하고, 그 공간이 진공으로 되어 있는 것을 특징으로 하는 투영노장장치.17. The projection exposure apparatus according to claim 16, wherein the heat insulation support seals a space between the infrared transmission window and the radiation plate, and the space is a vacuum. 제9항에 있어서, 상기 복사 플레이트를 온도 제어하기 위한 반도체 펠티에 소자를 부가로 포함하는 것은 특징으로 하는 투영노광장치.10. A projection exposure apparatus according to claim 9, further comprising a semiconductor Peltier element for temperature controlling the radiation plate. 제9항에 있어서, 상기 복사냉각 플레이트에 대향하는 투영노광장치의 구성부분의 표면은 적외선을 반사하는 재료로 구성되어 있는 것을 특징으로 하는 투영노광장치.10. The projection exposure apparatus according to claim 9, wherein the surface of the component part of the projection exposure apparatus opposite the radiation cooling plate is made of a material that reflects infrared rays. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019960036645A 1995-09-21 1996-08-30 Temperature control device and scanning exposure device KR970018130A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7267824A JPH0992613A (en) 1995-09-21 1995-09-21 Temperature conditioner and scanning aligner
JP95-267824 1995-09-21

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KR970018130A true KR970018130A (en) 1997-04-30

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