KR970016780A - Manufacturing method of halftone phase shift mask - Google Patents
Manufacturing method of halftone phase shift mask Download PDFInfo
- Publication number
- KR970016780A KR970016780A KR1019950029302A KR19950029302A KR970016780A KR 970016780 A KR970016780 A KR 970016780A KR 1019950029302 A KR1019950029302 A KR 1019950029302A KR 19950029302 A KR19950029302 A KR 19950029302A KR 970016780 A KR970016780 A KR 970016780A
- Authority
- KR
- South Korea
- Prior art keywords
- shielding film
- light shielding
- film pattern
- manufacturing
- phase shift
- Prior art date
Links
Abstract
위상 시프터의 하부에 투과율을 조절을 위한 차광막 패턴을 구비한 위상반전 마스크(Phase Shift Mask)의 제조 방법을 개시한다.A method of manufacturing a phase shift mask having a light shielding film pattern for controlling transmittance under the phase shifter is disclosed.
본 발명은 소정 량의 빛을 투과하는 위상 시프터의 투과 영역을 축소하여 사이드-롭(side-lobe)을 방지하기 위하여, 투명한 마스크 기판 상에 먼저 차광막 패턴을 형성한 후, 이 차광막 패턴을 둘러싸는 하프톤 패턴을 형성하는 것을 특징으로 한다.In order to prevent side-lobe by reducing the transmission area of the phase shifter that transmits a predetermined amount of light, the present invention first forms a light shielding film pattern on a transparent mask substrate, and then surrounds the light shielding film pattern. A halftone pattern is formed.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제 5도는 제 4도의 B-B'선 단면도.5 is a cross-sectional view taken along the line B-B 'of FIG.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950029302A KR970016780A (en) | 1995-09-07 | 1995-09-07 | Manufacturing method of halftone phase shift mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950029302A KR970016780A (en) | 1995-09-07 | 1995-09-07 | Manufacturing method of halftone phase shift mask |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970016780A true KR970016780A (en) | 1997-04-28 |
Family
ID=66596466
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950029302A KR970016780A (en) | 1995-09-07 | 1995-09-07 | Manufacturing method of halftone phase shift mask |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970016780A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030023453A (en) * | 2001-06-20 | 2003-03-19 | 엔이씨 일렉트로닉스 코포레이션 | Halftone phase shift mask and its manufacturing method |
-
1995
- 1995-09-07 KR KR1019950029302A patent/KR970016780A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030023453A (en) * | 2001-06-20 | 2003-03-19 | 엔이씨 일렉트로닉스 코포레이션 | Halftone phase shift mask and its manufacturing method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR960018758A (en) | Combined Attenuation Phase Shift Mask Structure and Fabrication Method Therefor | |
EP1542072A3 (en) | Method to produce a pattern layout of a photomask | |
KR950012571A (en) | Phase shift mask, manufacturing method thereof, and exposure method using such phase shift mask | |
KR970077704A (en) | Mask for microlens pattern | |
KR930003264A (en) | Pattern Forming Method Using Phase Shift Mask | |
KR950025855A (en) | Method of manufacturing a mask for forming an overlap pattern | |
KR970016780A (en) | Manufacturing method of halftone phase shift mask | |
TW324073B (en) | Half-tone phase shift mask | |
KR937000886A (en) | Formation method of fine resist pattern | |
KR980005324A (en) | Phase Inversion Mask and Manufacturing Method Thereof | |
KR970016789A (en) | Phase inversion mask and manufacturing method thereof | |
KR970016757A (en) | Manufacturing method of halftone phase shift mask | |
KR940004724A (en) | Phase shift mask and its manufacturing method | |
KR930017113A (en) | Phase shift mask manufacturing method | |
KR970048956A (en) | Mask having phase inversion pattern and manufacturing method thereof | |
KR970022521A (en) | Phase inversion mask and manufacturing method thereof | |
KR960024646A (en) | Phase inversion mask | |
KR970022514A (en) | Structure of PSM | |
KR970022529A (en) | Transmittance control mask | |
KR970048963A (en) | Phase Shift Photomask | |
KR950021026A (en) | Phase change mask | |
KR960035144A (en) | Partially Transmissive Phase Reverse Mask | |
KR970048926A (en) | Mask and manufacturing method thereof | |
KR970016784A (en) | Negative Transmittance Control Mask | |
KR970022516A (en) | Manufacturing method of halftone phase inversion mask |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Withdrawal due to no request for examination |