KR970022516A - Manufacturing method of halftone phase inversion mask - Google Patents

Manufacturing method of halftone phase inversion mask Download PDF

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Publication number
KR970022516A
KR970022516A KR1019950034913A KR19950034913A KR970022516A KR 970022516 A KR970022516 A KR 970022516A KR 1019950034913 A KR1019950034913 A KR 1019950034913A KR 19950034913 A KR19950034913 A KR 19950034913A KR 970022516 A KR970022516 A KR 970022516A
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KR
South Korea
Prior art keywords
aperture
manufacturing
photoresist film
mask
halftone phase
Prior art date
Application number
KR1019950034913A
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Korean (ko)
Inventor
우상균
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950034913A priority Critical patent/KR970022516A/en
Publication of KR970022516A publication Critical patent/KR970022516A/en

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Abstract

어퍼쳐를 이용한 하프톤 위상반전 마스크의 제조방법에 대해 개시한다.A method of manufacturing a halftone phase shift mask using an aperture is disclosed.

이는, 기판 상에 형성된 위상 쉬프터 및 차광패턴이 형성된 결과물상에 감광막을 도포하는 단계, 감광막상에 어퍼쳐를 얹고, 어퍼쳐를 마스크로하여 소정 부위의 감광막을 노광하는 단계 및 감광막을 현상하는 단계를 포함하여 이루어진다.This method includes applying a photoresist film to a phase shifter and a light shielding pattern formed on a substrate, placing an aperture on the photoresist film, exposing the photoresist film at a predetermined site using the aperture as a mask, and developing the photoresist film. It is made, including.

따라서, 원하는 모양과 사이즈를 조절하여 사용할 수 있는 가변 어퍼쳐를 사용하여 노광함으로써, 공정이 단순하며, 공정시간 및 제조단가를 절감할 수 있다.Therefore, by using a variable aperture that can be used to adjust the desired shape and size, the process is simple, it is possible to reduce the process time and manufacturing cost.

Description

하프톤 위상반전 마스크의 제조방법Manufacturing method of halftone phase inversion mask

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1B도는 본 발명에 의한 하프톤 위상반전 마스크의 제조방법을 설명하기 위하여 공정 순서에 따라 도시한 단면도들,Figure 1B is a cross-sectional view shown in order of the process to explain a method for manufacturing a halftone phase inversion mask according to the present invention,

제2도는 개별 어퍼쳐 및 상기 개별 어퍼쳐들이 조합된 것을 도시한 도면.2 shows an individual aperture and the combination of the individual apertures.

Claims (3)

기판 상에 형성된 위상 쉬프터 및 차광패턴이 형성된 결과물상에 감광막을 도포하는 단계; 상기 감광막상에 어퍼쳐를 얹고, 상기 어퍼쳐를 마스크로하여 소정 부위의 감광막을 노광하는 단계; 상기 감광막을 현상하여 감광막패턴을 형성하는 단계; 및 상기 감광막패턴을 마스크로하여 노출된 부분의 차광패턴을 제거하는 단계를 포함하는 것을 특징으로 하는 위상반전 마스크의 제조방법.Coating a photosensitive film on a resultant on which a phase shifter and a light shielding pattern are formed on a substrate; Placing an aperture on the photosensitive film and exposing the photosensitive film of a predetermined portion using the aperture as a mask; Developing the photoresist to form a photoresist pattern; And removing the light shielding pattern of the exposed portion using the photoresist pattern as a mask. 제1항에 있어서, 상기 노광되는 소정 부위는 블라인드 영역의 내부 또는 스테퍼의 얼라인 키 (align key)가 형성되는 영역인 것을 특징으로 하는 위상반전 마스크의 제조방법.The method of claim 1, wherein the predetermined portion to be exposed is a region where an alignment key of a stepper or an inside of a blind region is formed. 제1항에 있어서, 상기 어퍼쳐는 스테인레스를 기본으로 하여, 그 사이즈를 가변할 수 있는 것을 특징으로 하는 위상반전 마스크의 제조방법.The method of claim 1, wherein the aperture is made of stainless steel, and the size of the aperture is variable. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950034913A 1995-10-11 1995-10-11 Manufacturing method of halftone phase inversion mask KR970022516A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950034913A KR970022516A (en) 1995-10-11 1995-10-11 Manufacturing method of halftone phase inversion mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950034913A KR970022516A (en) 1995-10-11 1995-10-11 Manufacturing method of halftone phase inversion mask

Publications (1)

Publication Number Publication Date
KR970022516A true KR970022516A (en) 1997-05-28

Family

ID=66582499

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950034913A KR970022516A (en) 1995-10-11 1995-10-11 Manufacturing method of halftone phase inversion mask

Country Status (1)

Country Link
KR (1) KR970022516A (en)

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