KR970015291U - 현상액 분사노즐 - Google Patents

현상액 분사노즐

Info

Publication number
KR970015291U
KR970015291U KR2019950025787U KR19950025787U KR970015291U KR 970015291 U KR970015291 U KR 970015291U KR 2019950025787 U KR2019950025787 U KR 2019950025787U KR 19950025787 U KR19950025787 U KR 19950025787U KR 970015291 U KR970015291 U KR 970015291U
Authority
KR
South Korea
Prior art keywords
spray nozzle
developer spray
developer
nozzle
spray
Prior art date
Application number
KR2019950025787U
Other languages
English (en)
Other versions
KR0132408Y1 (ko
Inventor
김재룡
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950025787U priority Critical patent/KR0132408Y1/ko
Publication of KR970015291U publication Critical patent/KR970015291U/ko
Application granted granted Critical
Publication of KR0132408Y1 publication Critical patent/KR0132408Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR2019950025787U 1995-09-22 1995-09-22 현상액 분사노즐 KR0132408Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950025787U KR0132408Y1 (ko) 1995-09-22 1995-09-22 현상액 분사노즐

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950025787U KR0132408Y1 (ko) 1995-09-22 1995-09-22 현상액 분사노즐

Publications (2)

Publication Number Publication Date
KR970015291U true KR970015291U (ko) 1997-04-28
KR0132408Y1 KR0132408Y1 (ko) 1999-02-01

Family

ID=19423970

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950025787U KR0132408Y1 (ko) 1995-09-22 1995-09-22 현상액 분사노즐

Country Status (1)

Country Link
KR (1) KR0132408Y1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102650556B1 (ko) 2021-12-21 2024-03-22 주식회사 화신정공 세척기용 세척노즐

Also Published As

Publication number Publication date
KR0132408Y1 (ko) 1999-02-01

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