KR970008339A - UV irradiation device - Google Patents
UV irradiation device Download PDFInfo
- Publication number
- KR970008339A KR970008339A KR1019950022943A KR19950022943A KR970008339A KR 970008339 A KR970008339 A KR 970008339A KR 1019950022943 A KR1019950022943 A KR 1019950022943A KR 19950022943 A KR19950022943 A KR 19950022943A KR 970008339 A KR970008339 A KR 970008339A
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- power source
- ultraviolet
- vacuum chuck
- light source
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
자외선 조사장치가 개시되어 있다. 본 발명은 웨이퍼를 자외선 조사장치에 로딩(loading)시키거나 자외선 조사장치로부터 언로딩(unloading)시키기 위하여 수평이동시킬 수 있음은 물론, 웨이퍼의 중심과 웨이퍼를 회전시키기 위한 동력원의 중심축을 일치시키지 않음으로써 동력원을 동작시킬 때 웨이퍼의 중심이 원을 그리면서 선회시킬 수 있는 웨이퍼 전송수단을 제공한다.An ultraviolet irradiation device is disclosed. The present invention can move the wafer horizontally for loading or unloading the ultraviolet irradiation device, and does not coincide with the center axis of the wafer and the central axis of the power source for rotating the wafer. This provides a wafer transfer means capable of turning the center of the wafer in a circle when operating the power source.
본 발명에 의하면, 웨이퍼에 자외선 조사시 웨이퍼를 선회시킴과 동시에 직진시킬 수 있어 자외선이 웨이퍼 표면 전체에 균일하게 조사된다. 이는, 접착제에 의해 보호용테이프가 앞면에 부착된 웨이퍼를 백그라인딩(back grinding)한 후, 보호용테이프를 제거하기 위한 자외선 조사시 접착제 전체가 균일한 화학반응을 일으키도록 한다. 따라서, 보호용테이프를 용이하게 제거할 수 있다.According to the present invention, the wafer can be rotated and go straight at the same time as the wafer is irradiated with ultraviolet rays, and the ultraviolet rays are uniformly irradiated on the entire surface of the wafer. This causes the entire adhesive to cause a uniform chemical reaction upon UV irradiation to remove the protective tape after back grinding the wafer having the protective tape attached to the front surface by the adhesive. Therefore, the protective tape can be easily removed.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제1도는 본 발명에 의한 웨이퍼 전송수단의 정면도이다. 제2도는 제1도의 평면도이다. 제3도는 본 발명에 의한 자외선 조사장치의 사시도이다.1 is a front view of a wafer transfer means according to the present invention. 2 is a plan view of FIG. 3 is a perspective view of the ultraviolet irradiation device according to the present invention.
Claims (5)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950022943A KR0144877B1 (en) | 1995-07-28 | 1995-07-28 | Uv irradiation apparatus |
JP09703096A JP3859259B2 (en) | 1995-07-13 | 1996-04-18 | UV irradiation equipment |
US08/679,084 US5872365A (en) | 1995-07-13 | 1996-07-12 | UV irradiation apparatus |
JP2006222028A JP2006352155A (en) | 1995-07-13 | 2006-08-16 | Ultra-violet ray irradiation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950022943A KR0144877B1 (en) | 1995-07-28 | 1995-07-28 | Uv irradiation apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970008339A true KR970008339A (en) | 1997-02-24 |
KR0144877B1 KR0144877B1 (en) | 1998-08-17 |
Family
ID=19422090
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950022943A KR0144877B1 (en) | 1995-07-13 | 1995-07-28 | Uv irradiation apparatus |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0144877B1 (en) |
-
1995
- 1995-07-28 KR KR1019950022943A patent/KR0144877B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0144877B1 (en) | 1998-08-17 |
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