KR970004786A - 광로 조절 장치의 에어갭 형성방법 - Google Patents
광로 조절 장치의 에어갭 형성방법 Download PDFInfo
- Publication number
- KR970004786A KR970004786A KR1019950018673A KR19950018673A KR970004786A KR 970004786 A KR970004786 A KR 970004786A KR 1019950018673 A KR1019950018673 A KR 1019950018673A KR 19950018673 A KR19950018673 A KR 19950018673A KR 970004786 A KR970004786 A KR 970004786A
- Authority
- KR
- South Korea
- Prior art keywords
- control device
- optical path
- air gap
- formation method
- path control
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N9/00—Details of colour television systems
- H04N9/12—Picture reproducers
- H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
- H04N9/3141—Constructional details thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/764—Air gaps
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950018673A KR0159369B1 (ko) | 1995-06-30 | 1995-06-30 | 광로 조절 장치의 에어갭 형성방법 |
US08/598,478 US5677785A (en) | 1995-04-21 | 1996-02-08 | Method for forming an array of thin film actuated mirrors |
IN246CA1996 IN187493B (ko) | 1995-04-21 | 1996-02-12 | |
JP8084620A JPH08292382A (ja) | 1995-04-21 | 1996-03-13 | 薄膜アクチュエーテッドミラーアレイの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950018673A KR0159369B1 (ko) | 1995-06-30 | 1995-06-30 | 광로 조절 장치의 에어갭 형성방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970004786A true KR970004786A (ko) | 1997-01-29 |
KR0159369B1 KR0159369B1 (ko) | 1999-01-15 |
Family
ID=19419120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950018673A KR0159369B1 (ko) | 1995-04-21 | 1995-06-30 | 광로 조절 장치의 에어갭 형성방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0159369B1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19980702286A (ko) * | 1995-02-17 | 1998-07-15 | ||
KR100490786B1 (ko) * | 1997-12-27 | 2005-08-31 | 주식회사 현대오토넷 | 에어백 제어장치의 자동시간 측정장치 및 방법 |
-
1995
- 1995-06-30 KR KR1019950018673A patent/KR0159369B1/ko not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19980702286A (ko) * | 1995-02-17 | 1998-07-15 | ||
KR100490786B1 (ko) * | 1997-12-27 | 2005-08-31 | 주식회사 현대오토넷 | 에어백 제어장치의 자동시간 측정장치 및 방법 |
Also Published As
Publication number | Publication date |
---|---|
KR0159369B1 (ko) | 1999-01-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20020729 Year of fee payment: 5 |
|
LAPS | Lapse due to unpaid annual fee |