KR970000893Y1 - Water nozzle of gas discharging device - Google Patents
Water nozzle of gas discharging device Download PDFInfo
- Publication number
- KR970000893Y1 KR970000893Y1 KR2019930012486U KR930012486U KR970000893Y1 KR 970000893 Y1 KR970000893 Y1 KR 970000893Y1 KR 2019930012486 U KR2019930012486 U KR 2019930012486U KR 930012486 U KR930012486 U KR 930012486U KR 970000893 Y1 KR970000893 Y1 KR 970000893Y1
- Authority
- KR
- South Korea
- Prior art keywords
- injection hole
- water
- annular
- nozzle
- discharging device
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/06—Spray cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/04—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
- B05B7/0416—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
- B05B7/0433—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of gas surrounded by an external conduit of liquid upstream the mixing chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/06—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane
- B05B7/062—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane with only one liquid outlet and at least one gas outlet
Abstract
내용없음.None.
Description
제1도는 본 고안의 종단면도.1 is a longitudinal sectional view of the present invention.
＊ 도면의 주요부분에 대한 부호의 설명＊ Explanation of symbols on main parts of drawing
1 : 본체 2 : 분사공1 body 2 injection hole
3 : 환상분사공 4 : 공급관3: annular sprayer 4: supply pipe
5 : 공극5: void
본 고안은 배출가스정화장치의 물분사 노즐에 관한 것이다.The present invention relates to a water spray nozzle of the exhaust gas purifying apparatus.
반도체 제조공장이나 고무를 가류하는 공장등에서는 공정중에 발생하는 분진을 정화시켜 배출하지 않으면 안되는바, 이러한 배출가스의 정화를 위하여는 정화조내에 분진을 가진 가스를 주입시킴과 동시에 물을 분사하여 배출가스에 포함된 분진이 물에 용해되게 하여 배출가스를 정화하고 있다. 본 고안은 이와 같은 정화장치에 있어서의 물분사 노즐에 관한 것이다.In semiconductor manufacturing plants and rubber vulcanization factories, the dust generated during the process must be purified and discharged. To purify the exhaust gas, the gas with dust is injected into the septic tank and water is injected to discharge the exhaust gas. The dust contained in is dissolved in water to purify the exhaust gas. The present invention relates to a water spray nozzle in such a purification device.
위와 같은 정화장치에 있어서의 물분사 노즐은 일반적으로 직경이 작은 노즐을 통하여 정화용수를 분사하므로서 노즐 밖으로 분사되는 정화수가 변하는 압력에 따라 분산되도록 구성되어 있다.The water spray nozzle in the above purification apparatus is generally configured to be dispersed in accordance with a varying pressure by purifying water sprayed out of the nozzle by spraying the purification water through a nozzle having a small diameter.
그러나 이와 같은 종래의 물분사 장치는 물의 입자 크기를 감소시킴에 있어 한계가 있기 마련이면 따라서 분사되는 물의 양에 비하여 배출가스의 정화효과가 만족스럽지 못한 결점이 있었다. 물분사에 의한 배출가스 정화장치는 분사되는 물의 입자를 가능한 한 작게 하여 단위 물의 양이 갖는 표면적을 확대하므로서 분진을 효과적으로 용해시킬 수 있다. 그리하여 본 고안은 물 분사노즐의 선단에 고압의 압축공기를 분사시키므로서 노즐 선단부의 압력을 급격히 감소시켜 압출되어 나오는 정화용수를 압력과 노즐선단 외방의 압력 차이를 확대시켜 노즐을 통하여 분사되어 나오는 물이 무화(霧化)되도록 하였으며, 나아가 노즐선단 주위에 공극(Cavity)을 형성시키므로서 이 공극이 저압대를 형성케하여 저압부위를 확장하므로서 노즐로 분사되는 물이 미쳐 무화되지 아니한 채 방출되는 량을 감소시켰는 바 이와 같은 본 고안을 첨부된 도면에 의하여 설명하면 다음과 같다.However, such a conventional water spraying device has a drawback in reducing the particle size of water, and thus there is a drawback that the purification effect of the exhaust gas is not satisfactory compared to the amount of water injected. The exhaust gas purifying apparatus by water injection can effectively dissolve dust by increasing the surface area of the quantity of water by making the particles of water sprayed as small as possible. Thus, the present invention drastically reduces the pressure at the tip of the nozzle by injecting high pressure compressed air to the tip of the water jet nozzle, and expands the pressure of the purified water extruded through the nozzle by expanding the pressure difference outside the nozzle tip. The voids are formed around the tip of the nozzle, and the voids form a low pressure zone, thereby expanding the low pressure area, so that the water injected into the nozzle is discharged without being atomized. When the present invention is described by the accompanying drawings reduced as follows.
노즐본체(1)의 선단에 미세한 직경을 갖는 분사공(2)을 형성시킨것에 있어서 분사공(2)의 선단 개구부를 향하여 주연부로부터 고압의 압축공기가 분사되도록 분사공(2)의 주연에 환상분사공(3)을 설치한다. 환상분사공(3)은 압축공기 공급관(4)에 연통되었으며, 분사공(2)의 선단 개구부를 향하여 사방에서 압축공기가 집중적으로 분사되도록 환상(還狀)으로 형성시키는 것이 바람직하다.In the formation of the injection hole 2 having a fine diameter at the tip of the nozzle body 1, the injection hole 2 is annular at the periphery of the injection hole 2 so as to inject high pressure compressed air from the periphery toward the tip opening of the injection hole 2. Install the injection hole (3). The annular injection hole (3) is in communication with the compressed air supply pipe (4), it is preferable to form an annular so that compressed air is concentrated in all directions toward the front end opening of the injection hole (2).
그리고 환상분사공(3)과 분사공(2) 선단사이에 환상의 요함부로 된 공극(5)을 형성시키는 것이 바람직하다.And it is preferable to form the space | gap 5 of an annular recessed part between the annular injection hole 3 and the tip of the injection hole 2.
이와 같이 구성된 본 고안은 분사공(2)을 통하여 정화용수를 분사시킴과 동시에 압축공기 공급관(4)을 통하여 고압의 압축공기를 공급하여 환상분사공(3)을 통하여 고압의 압축공기가 분사되게 한다. 그리하면 분사공(2)의 선단부는 공기의 흐름이 급격히 빨라져 압력이 저하되면 따라서 분사공(2)를 통하여 분사되는 정화용수는 급격한 압력변화로 인하여 분사공(2)에서 분사되는 순간 물이 무화 상태로 변하게 된다.The present invention configured as described above is spraying the purification water through the injection hole (2) and at the same time to supply the high pressure compressed air through the compressed air supply pipe (4) so that the high pressure compressed air is injected through the annular injection hole (3) do. Then, the tip of the injection hole (2) is a rapid flow of air and the pressure is lowered, thus the purifying water sprayed through the injection hole (2) the water is atomized at the moment of being injected from the injection hole (2) due to the rapid pressure change It turns into a state.
그리고 본 고안은 분사공(2)의 주연에 공극(5)을 형성시켰으므로 공극(5)은 저압대를 형성하여 분사공(2)으로는 분사되는 정화용수가 저압대에서 더욱 확산 무화되도록 한다. 이와 같이 하여 분사 무화된 정화용수는 압축공기와 함께 정화조(도면에 도시하지 아니함)내로 분사되는 바 부화된 정화용수는 입자의 크기가 미세하여 표면적이 크게 확대되어 정화조내의 분진을 효과적으로 용해시킬 수 있게 된다. 따라서 본 고안은 정화용수의 사용량을 감소시킬 수 있으며 정화조 크기를 축소시킬 수 있어 설비비를 절감할 수 있을 뿐 아니라 운전경비를 크게 절감할 수 있는 효과가 있다.And since the present invention has formed a void 5 on the periphery of the injection hole (2), the air gap (5) forms a low pressure zone so that the purification water injected into the injection hole (2) is further diffused in the low pressure zone. In this way, the atomized purifying water is injected into the septic tank (not shown in the drawing) together with the compressed air, and the enriched clarified water has a small particle size, so that the surface area is greatly expanded so that the dust in the septic tank can be effectively dissolved. do. Therefore, the present invention can reduce the amount of water used for purification and can reduce the size of the septic tank, which can reduce the cost of equipment and greatly reduce the operating cost.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019930012486U KR970000893Y1 (en) | 1993-07-07 | 1993-07-07 | Water nozzle of gas discharging device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019930012486U KR970000893Y1 (en) | 1993-07-07 | 1993-07-07 | Water nozzle of gas discharging device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR950003165U KR950003165U (en) | 1995-02-16 |
| KR970000893Y1 true KR970000893Y1 (en) | 1997-02-13 |
Family
ID=19358688
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR2019930012486U KR970000893Y1 (en) | 1993-07-07 | 1993-07-07 | Water nozzle of gas discharging device |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR970000893Y1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019241488A1 (en) | 2018-06-14 | 2019-12-19 | Regents Of The University Of Minnesota | Counterflow mixer and atomizer |
-
1993
- 1993-07-07 KR KR2019930012486U patent/KR970000893Y1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR950003165U (en) | 1995-02-16 |
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| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E701 | Decision to grant or registration of patent right | ||
| REGI | Registration of establishment | ||
| LAPS | Lapse due to unpaid annual fee |