KR960700819A - ZIRCONIUM SILICATE GRINDING MEDIUM AND METHOD OF MILLING - Google Patents

ZIRCONIUM SILICATE GRINDING MEDIUM AND METHOD OF MILLING Download PDF

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KR960700819A
KR960700819A KR1019950704087A KR19950704087A KR960700819A KR 960700819 A KR960700819 A KR 960700819A KR 1019950704087 A KR1019950704087 A KR 1019950704087A KR 19950704087 A KR19950704087 A KR 19950704087A KR 960700819 A KR960700819 A KR 960700819A
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powder
range
microns
medium
slurry
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KR1019950704087A
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Korean (ko)
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KR0164652B1 (en
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토마스 이언 브라운브릿지
필립 엠. 스토리
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제임스 비. 워딩턴
케르-맥기 케미칼 코오포레이숀
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B02CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02CCRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C17/00Disintegrating by tumbling mills, i.e. mills having a container charged with the material to be disintegrated with or without special disintegrating members such as pebbles or balls
    • B02C17/18Details
    • B02C17/20Disintegrating members
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B02CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02CCRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C23/00Auxiliary methods or auxiliary devices or accessories specially adapted for crushing or disintegrating not provided for in preceding groups or not specially adapted to apparatus covered by a single preceding group
    • B02C23/18Adding fluid, other than for crushing or disintegrating by fluid energy

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  • Engineering & Computer Science (AREA)
  • Food Science & Technology (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Crushing And Grinding (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Disintegrating Or Milling (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Silicon Compounds (AREA)

Abstract

A grinding medium including naturally occurring zirconium silicate sand characterized by a density in the range of from about 4g/cc absolute to about 6g/cc absolute is provided. Also provided is a method for milling a powder which includes steps of forming a milling slurry including a naturally occurring zirconium silicate sand grinding medium having a density in the range of from about 4g/cc absolute to about 6g/cc absolute.

Description

지르코늄 실리케이트 연마 매체 및 분쇄 방법(ZIRCONIUM SILICATE GRINDING MEDIUM AND METHOD OF MILLING)ZIRCONIUM SILICATE GRINDING MEDIUM AND METHOD OF MILLING

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (26)

절대 밀도가 약 4g/cc의 범위, 보다 바람직하게는 약 4.6g/cc 내지 약 4.9g/cc의 범위,그리고 가장 바람직하게는 약 4.75g/cc의 범위인 것이 특징인 천연 존재형 지르코늄 실리게이트 샌드를 함유하는 연마 매체.Naturally present zirconium silicides characterized by an absolute density in the range of about 4 g / cc, more preferably in the range of about 4.6 g / cc to about 4.9 g / cc, and most preferably in the range of about 4.75 g / cc. Abrasive media containing sand. 제1항에 있어서, 상기 천연 존재형 지르코늄 실리케이트 샌드가 분쇄된 생성물 분말로부터 분리될 수 있는 분쇄된 생성물 분말 입자 크기의 최소 배수의 지르코늄 실리케이트 샌드 입자 크기를 특징으로 하는 연마매체.2. The abrasive medium of claim 1, wherein the naturally occurring zirconium silicate sand is characterized by a minimum multiple of the zirconium silicate sand particle size of the milled product powder particle size that can be separated from the milled product powder. 제2항에 있어서, 상기 지르코늄 실리베이트 샌드 입자 크기가 약 100미크론보다 큰 연마 매체.3. The polishing medium of claim 2, wherein the zirconium silicate sand particle size is greater than about 100 microns. 제3항에 있어서, 상기 지르코늄 실리케이트 샌드의 입자 크기가 약 100미크론 내지 약 1500미크론의 범위, 보다 바람직하게는 약 100미크론 내지 약 500미크론의 범위, 그리고 가장 바람직하게는 약 150미크론 내지 약 250미크론의 범위인 연마 매체.4. The particle size of claim 3 wherein the zirconium silicate sand has a particle size in a range from about 100 microns to about 1500 microns, more preferably in a range from about 100 microns to about 500 microns, and most preferably from about 150 microns to about 250 microns. Abrasive media in the range of. 제1항에 있어서, 액체 매체를 추가로 함유하는 연마 매체.The polishing medium of claim 1 further comprising a liquid medium. 제5항에 있어서,상기 액체 매체가 물, 오일, 유기 화합물 및 이들의 혼합물로 구성된 군에서 선택된 액체 매체인 연마 매체.The polishing medium of claim 5, wherein the liquid medium is a liquid medium selected from the group consisting of water, oils, organic compounds, and mixtures thereof. 제5항에 있어서, 상기 천연 존재형 지르코늄 실리케이트 샌드 및 상기 액체 매체는 배합되어 연마 슬러리를 형성하는 연마 매체.6. The polishing medium of claim 5, wherein said naturally occurring zirconium silicate sand and said liquid medium are combined to form an abrasive slurry. 제7항에 있어서 상기 연마 슬러리가 약 1.0cps 내지 약 10,000cps 범위, 보다 바람직하게는 약 1.0cps 내지 약 500cps의 범위, 그리고 가장 바람직하게는 약 1.0cps 내지 약 100cps의 범위의 점도를 갖는 것이 특징인 연마 매체.8. The polishing pad of claim 7, wherein the polishing slurry has a viscosity in the range of about 1.0 cps to about 10,000 cps, more preferably in the range of about 1.0 cps to about 500 cps, and most preferably in the range of about 1.0 cps to about 100 cps. Abrasive media. (1)입자 크기가 특징인 출발 분말을 베공하는 단계; (2)연마 매체의 절대 밀도가 약 4.0g/cc 내지 약 6.0g/cc의 범위인 것이 특징인, 천연 존재형 지르코늄 실리케이트 샌드를 함유하는 연마 매체를 제공하는 단계; (3)액체 매체를 제공하는 단계; (4)상기 출발 분말, 상기 연마 매체 및 상기 액체 매체를 혼합하여 분쇄 슬러리를 형성하는 단계; (5)상기 분쇄 슬러리를 충분한 시간 동안 분쇄시켜, 목적하는 입자 크기가 특징인 생성물 분말을 함유하고 상기 출발 분말과 거의 동일한 조성을 갖는 생성물 슬러리를 생성시키는 단계; 및 (6)상기 분쇄 슬러리로부터 상기 생성물 분말을 함유하는 상기 생성물 슬러리를 분리하여 상기 연마 매체가 상기 분쇄 슬러리에 잔존하게 하는 단계들을 포함하는 분마의 분쇄 방법.(1) perforating the starting powder characterized by the particle size; (2) providing an abrasive medium containing naturally occurring zirconium silicate sand, characterized in that the absolute density of the abrasive medium is in the range of about 4.0 g / cc to about 6.0 g / cc; (3) providing a liquid medium; (4) mixing the starting powder, the polishing medium and the liquid medium to form a ground slurry; (5) grinding the ground slurry for a sufficient time to produce a product slurry containing a product powder characterized by the desired particle size and having a composition substantially the same as the starting powder; And (6) separating the product slurry containing the product powder from the ground slurry to allow the polishing medium to remain in the ground slurry. 제9항에 있어서, 상기 출발 분말이 응괴된(agglomerated)분말인 방법.10. The method of claim 9, wherein the starting powder is an agglomerated powder. 제10항에 있어서, 상기 응괴된 분말이 약 0.01 미크론 내지 약 500미크론의 범위이고, 보다 바람직하게는 약 0.01 미크론 내지 약 200 미크론의 범위인 입자 크기를 갖는 것이 특징이 방법.The method of claim 10, wherein the agglomerated powder has a particle size in the range of about 0.01 micron to about 500 microns, more preferably in the range of about 0.01 microns to about 200 microns. 제9항에 있어서, 상기 출발 분말이 응괴된 분말인 방법.10. The method of claim 9, wherein the starting powder is a coagulated powder. 제9항에 있어서, 상기 출발 분말 및 상기 생성물 분말이 약 0.8g/cc내지 약 5g/cc 범위의 분말 밀도를 갖는 것이 특징인 방법.The method of claim 9, wherein the starting powder and the product powder have a powder density in the range of about 0.8 g / cc to about 5 g / cc. 제9항에 있어서, 상기 출발 분말이 유기 분말인 방법.The method of claim 9, wherein the starting powder is an organic powder. 제9항에 있어서, 상기 출발 분말이 무기 분말인 방법.The method of claim 9, wherein the starting powder is an inorganic powder. 제9항에 있어서, 상기 출발 분말이 응괴된 이산화티타늄 안료인 방법.10. The method of claim 9, wherein said starting powder is a coagulated titanium dioxide pigment. 제9항에 있어서, 상기 천연 존재형 지르코늄 실리케이트 샌드가 약 100미크론 내지 약 1500미크론의 범위, 보다 바람직하게는 약 100미크론 내지 약 500미크론의 범위, 그리고 가장 바람직하게는 약 150 미크론 내지 약 250 미크론의 범위인 입자크기를 갖는 것이 특징인 방법.10. The method of claim 9, wherein the naturally occurring zirconium silicate sand is in the range of about 100 microns to about 1500 microns, more preferably in the range of about 100 microns to about 500 microns, and most preferably in the range of about 150 microns to about 250 microns. Characterized by having a particle size in the range of. 제9항에 있어서, 상기 액체 매체가 상기 방법 및 상기 분말과 상용성(相用性)이 있는 방법.The method of claim 9, wherein the liquid medium is compatible with the method and the powder. 제9항에 있어서, 상기 분쇄 단계(5)를 비드 분쇄기, 디스크 분쇄기, 케이지 분쇄기 및 핀 분쇄기로 구성된 군에서 선택되는 분쇄 장치에서 수행되는 방법.10. The method according to claim 9, wherein said grinding step (5) is performed in a grinding apparatus selected from the group consisting of bead mills, disc mills, cage mills and pin mills. 제19항에 있어서, 상기 분쇄 장치가 수직 유동형인 방법.20. The method of claim 19, wherein the grinding device is a vertical flow type. 제19항에 있어서, 상기 분쇄 장치가 수평 유동형인 방법.20. The method of claim 19, wherein the grinding device is a horizontal flow. 제9항에 있어서, 상기 분쇄 슬러리로부터의 상기 생성물 슬러리의 분리 단계(6)가 출발 분말, 연마 매체 및 생성물 분말의 물리적 성질들 사이의 차이에 근거하여 상기 분쇄 슬러리와 상기 생성물 슬러리를 구분하며, 여기서, 상기 물리적 성질은 입자 크기, 입자 밀도 및 입자 침전 속도로 구성된 군에서 선택되는 방법.10. The method according to claim 9, wherein the separating step (6) of the product slurry from the grinding slurry distinguishes the grinding slurry from the product slurry based on the difference between the physical properties of the starting powder, the polishing medium and the product powder, Wherein said physical property is selected from the group consisting of particle size, particle density and particle precipitation rate. 제9항에 있어서, 상기 단계들을 연속적으로 수행하는 방법.10. The method of claim 9, wherein the steps are performed sequentially. 제9항에 있어서, 상기 단계들을 회분식 공정에 따라 수행하는 방법.The method of claim 9, wherein said steps are performed according to a batch process. 제9항에 있어서, 상기 생성물 분말을 상기 생성물 슬러리로부터 분리하는 단계 및 분산 매체에 상기 생성물 분말을 분산시켜 분사액을 형성하는 단계를 추가로 포함하는 방법.10. The method of claim 9, further comprising separating the product powder from the product slurry and dispersing the product powder in a dispersion medium to form a spray. 제25항에 있어서, 상기 분산 매체가 상기 분말 및 상기 방법과 상용성이 있는 액체 매체인 방법.The method of claim 25, wherein the dispersion medium is a liquid medium compatible with the powder and the method. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950704087A 1994-01-25 1995-01-24 Zirconium silicate grinding medium and method of milling KR0164652B1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US18608594A 1994-01-25 1994-01-25
US8/186,085 1994-01-25
US08/186,085 1994-01-25
PCT/US1995/000963 WO1995019846A1 (en) 1994-01-25 1995-01-24 Zirconium silicate grinding medium and method of milling

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US20080022900A1 (en) * 2006-07-25 2008-01-31 Venkata Rama Rao Goparaju Process for manufacturing titanium dioxide pigment
CN101722085B (en) * 2008-10-15 2012-06-13 许兴康 Grinding technology of high purity sub-nano level superfine zirconium silicate powder
CN102795848B (en) * 2012-08-02 2013-10-23 江苏锡阳研磨科技有限公司 Low-temperature sintered zirconium silicate grinding ball and preparation method thereof
CN111180719A (en) * 2020-01-07 2020-05-19 马鞍山科达普锐能源科技有限公司 Method for preparing nano silicon by three-stage grinding
CN115043620B (en) * 2022-03-09 2023-03-10 湖北工业大学 Method for preparing early-strength precast concrete by taking sand as grinding medium

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MX9504066A (en) 1997-05-31
DE69515935D1 (en) 2000-05-04
CA2158969A1 (en) 1995-07-27
DE69530132D1 (en) 2003-04-30
ATE191160T1 (en) 2000-04-15
DE69515935T2 (en) 2000-08-17
EP0930098A1 (en) 1999-07-21
DE69530132T2 (en) 2004-01-08
CN1042104C (en) 1999-02-17
ZA95590B (en) 1996-07-25
AU1690095A (en) 1995-08-08
FI954466A (en) 1995-09-21
SK117895A3 (en) 1996-01-10
FI954466A0 (en) 1995-09-21
ES2143616T3 (en) 2000-05-16
CZ284563B6 (en) 1999-01-13
PL176837B1 (en) 1999-08-31
WO1995019846A1 (en) 1995-07-27
BR9506238A (en) 1997-09-30
ES2190624T3 (en) 2003-08-01
EP0690749A1 (en) 1996-01-10
PL310446A1 (en) 1995-12-11
EP0690749B1 (en) 2000-03-29
JPH08506527A (en) 1996-07-16
KR0164652B1 (en) 1998-12-15
AU671248B2 (en) 1996-08-15
EP0690749A4 (en) 1996-10-30
ATE235318T1 (en) 2003-04-15
EP0930098B1 (en) 2003-03-26
CZ235795A3 (en) 1996-02-14
CN1122112A (en) 1996-05-08
TW276208B (en) 1996-05-21
CA2158969C (en) 2000-06-27
JP2693039B2 (en) 1997-12-17

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