KR960041427A - Electroplating solution of zinc-nickel alloy to improve the nickel deposition ratio and adhesion - Google Patents
Electroplating solution of zinc-nickel alloy to improve the nickel deposition ratio and adhesion Download PDFInfo
- Publication number
- KR960041427A KR960041427A KR1019950011497A KR19950011497A KR960041427A KR 960041427 A KR960041427 A KR 960041427A KR 1019950011497 A KR1019950011497 A KR 1019950011497A KR 19950011497 A KR19950011497 A KR 19950011497A KR 960041427 A KR960041427 A KR 960041427A
- Authority
- KR
- South Korea
- Prior art keywords
- nickel
- zinc
- alcohol
- electroplating solution
- adhesion
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
본 발명은 아연-니켈 합금 전기도금용액에 관한 것으로, 염화아연과 염화니켈을 주성분으로 하고, 여기에 염화칼륨, 염화나트륨, 염화바륨 및 염화암모늄등을 전도보조제로 사용한 도금욕에, 첨가제로 아릴알콜계 알콜을 적정범위로 첨가하므로서, 도금시 도금충의 니켈석출비 및 밀착성을 향상시킬 수 있는 아연-니켈 합금 전기도금용액을 제공하고자 하는데, 그목적이 있다.The present invention relates to a zinc-nickel alloy electroplating solution, which comprises zinc chloride and nickel chloride as main components, and is added to an aryl alcohol-based plating bath using potassium chloride, sodium chloride, barium chloride and ammonium chloride as conduction aids. By adding an alcohol in an appropriate range, it is to provide a zinc-nickel alloy electroplating solution that can improve the nickel deposition ratio and adhesion of the plated during the plating, the purpose is.
상기한 목적을 달성하기 위한 본 발명은 아연이온 농도 : 1.0-2.0mol/l, 니켈이온 농도 : 0.15-0.5mol/l, 염소이온농도 :5.0-9.0mol/1, 나머지 물로 조성되는 도금액에 아릴알콜계 알콜을 첨가하여 상기 염소이온과 아릴알콜계 알콜과의 몰농도비가 1:0.0005-0.05 범위가 되도록 조정한 것을 특징으로 하는 도금층 니켈 석출비 및 밀착성을 향상시키는 아연-니켈 합금 전기도금용액을 제공함을 그 요지로 한다.The present invention for achieving the above object is zinc ion concentration: 1.0-2.0mol / l, nickel ion concentration: 0.15-0.5mol / l, chlorine ion concentration: 5.0-9.0mol / 1, the aryl in the plating solution composed of the remaining water The zinc-nickel alloy electroplating solution for improving the nickel deposition ratio and adhesion of the plating layer, characterized in that the molar concentration ratio between the chlorine ion and the aryl alcohol alcohol is adjusted to be in the range of 1: 0.0005-0.05 by adding alcohol alcohol. The main point is to provide.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950011497A KR0143483B1 (en) | 1995-05-10 | 1995-05-10 | Electroplating solution of zn-ni alloy for improvement of bonding property and ni precipate rate of plating layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950011497A KR0143483B1 (en) | 1995-05-10 | 1995-05-10 | Electroplating solution of zn-ni alloy for improvement of bonding property and ni precipate rate of plating layer |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960041427A true KR960041427A (en) | 1996-12-19 |
KR0143483B1 KR0143483B1 (en) | 1998-08-17 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950011497A KR0143483B1 (en) | 1995-05-10 | 1995-05-10 | Electroplating solution of zn-ni alloy for improvement of bonding property and ni precipate rate of plating layer |
Country Status (1)
Country | Link |
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KR (1) | KR0143483B1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100417930B1 (en) * | 1996-12-26 | 2004-03-31 | 주식회사 포스코 | Zn-Ni ALLOY ELECTROPLATING SOLUTION |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101464860B1 (en) * | 2013-02-06 | 2014-11-24 | 인천대학교 산학협력단 | Metal seed layer leveler comprising allyl alcohol and method for constructing metal seed layer using the same |
-
1995
- 1995-05-10 KR KR1019950011497A patent/KR0143483B1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100417930B1 (en) * | 1996-12-26 | 2004-03-31 | 주식회사 포스코 | Zn-Ni ALLOY ELECTROPLATING SOLUTION |
Also Published As
Publication number | Publication date |
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KR0143483B1 (en) | 1998-08-17 |
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