KR960025487U - Semiconductor wafer cooling device - Google Patents

Semiconductor wafer cooling device

Info

Publication number
KR960025487U
KR960025487U KR2019940037517U KR19940037517U KR960025487U KR 960025487 U KR960025487 U KR 960025487U KR 2019940037517 U KR2019940037517 U KR 2019940037517U KR 19940037517 U KR19940037517 U KR 19940037517U KR 960025487 U KR960025487 U KR 960025487U
Authority
KR
South Korea
Prior art keywords
semiconductor wafer
cooling device
wafer cooling
semiconductor
wafer
Prior art date
Application number
KR2019940037517U
Other languages
Korean (ko)
Other versions
KR200170478Y1 (en
Inventor
정만영
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019940037517U priority Critical patent/KR200170478Y1/en
Publication of KR960025487U publication Critical patent/KR960025487U/en
Application granted granted Critical
Publication of KR200170478Y1 publication Critical patent/KR200170478Y1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR2019940037517U 1994-12-29 1994-12-29 Cooling apparatus of semiconductor wafer KR200170478Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940037517U KR200170478Y1 (en) 1994-12-29 1994-12-29 Cooling apparatus of semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940037517U KR200170478Y1 (en) 1994-12-29 1994-12-29 Cooling apparatus of semiconductor wafer

Publications (2)

Publication Number Publication Date
KR960025487U true KR960025487U (en) 1996-07-22
KR200170478Y1 KR200170478Y1 (en) 2000-02-01

Family

ID=19404008

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940037517U KR200170478Y1 (en) 1994-12-29 1994-12-29 Cooling apparatus of semiconductor wafer

Country Status (1)

Country Link
KR (1) KR200170478Y1 (en)

Also Published As

Publication number Publication date
KR200170478Y1 (en) 2000-02-01

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
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FPAY Annual fee payment

Payment date: 20051021

Year of fee payment: 7

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