KR960025346U - 포토리소그라피 공정용 인 라인형 현상장치 - Google Patents

포토리소그라피 공정용 인 라인형 현상장치

Info

Publication number
KR960025346U
KR960025346U KR2019940032995U KR19940032995U KR960025346U KR 960025346 U KR960025346 U KR 960025346U KR 2019940032995 U KR2019940032995 U KR 2019940032995U KR 19940032995 U KR19940032995 U KR 19940032995U KR 960025346 U KR960025346 U KR 960025346U
Authority
KR
South Korea
Prior art keywords
photolithography process
development device
line development
line
photolithography
Prior art date
Application number
KR2019940032995U
Other languages
English (en)
Other versions
KR200173811Y1 (ko
Inventor
류제춘
Original Assignee
삼성코닝주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성코닝주식회사 filed Critical 삼성코닝주식회사
Priority to KR2019940032995U priority Critical patent/KR200173811Y1/ko
Publication of KR960025346U publication Critical patent/KR960025346U/ko
Application granted granted Critical
Publication of KR200173811Y1 publication Critical patent/KR200173811Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
KR2019940032995U 1994-12-06 1994-12-06 포토리소그라피 공정용 인 라인형 현상장치 KR200173811Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940032995U KR200173811Y1 (ko) 1994-12-06 1994-12-06 포토리소그라피 공정용 인 라인형 현상장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940032995U KR200173811Y1 (ko) 1994-12-06 1994-12-06 포토리소그라피 공정용 인 라인형 현상장치

Publications (2)

Publication Number Publication Date
KR960025346U true KR960025346U (ko) 1996-07-22
KR200173811Y1 KR200173811Y1 (ko) 2000-03-02

Family

ID=19400495

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940032995U KR200173811Y1 (ko) 1994-12-06 1994-12-06 포토리소그라피 공정용 인 라인형 현상장치

Country Status (1)

Country Link
KR (1) KR200173811Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100552595B1 (ko) * 2000-11-22 2006-02-20 마테 쿠오 직립형 ｐｃ보드 에칭 머신용 보드 전달 장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100552595B1 (ko) * 2000-11-22 2006-02-20 마테 쿠오 직립형 ｐｃ보드 에칭 머신용 보드 전달 장치

Also Published As

Publication number Publication date
KR200173811Y1 (ko) 2000-03-02

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