KR960025314U - 웨트스테이션 장치 - Google Patents

웨트스테이션 장치

Info

Publication number
KR960025314U
KR960025314U KR2019940033504U KR19940033504U KR960025314U KR 960025314 U KR960025314 U KR 960025314U KR 2019940033504 U KR2019940033504 U KR 2019940033504U KR 19940033504 U KR19940033504 U KR 19940033504U KR 960025314 U KR960025314 U KR 960025314U
Authority
KR
South Korea
Prior art keywords
station device
wet station
wet
station
Prior art date
Application number
KR2019940033504U
Other languages
English (en)
Other versions
KR200163015Y1 (ko
Inventor
이재홍
인정환
김광철
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940033504U priority Critical patent/KR200163015Y1/ko
Publication of KR960025314U publication Critical patent/KR960025314U/ko
Application granted granted Critical
Publication of KR200163015Y1 publication Critical patent/KR200163015Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019940033504U 1994-12-09 1994-12-09 웨트스테이션 장치 KR200163015Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940033504U KR200163015Y1 (ko) 1994-12-09 1994-12-09 웨트스테이션 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940033504U KR200163015Y1 (ko) 1994-12-09 1994-12-09 웨트스테이션 장치

Publications (2)

Publication Number Publication Date
KR960025314U true KR960025314U (ko) 1996-07-22
KR200163015Y1 KR200163015Y1 (ko) 1999-12-15

Family

ID=19400889

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940033504U KR200163015Y1 (ko) 1994-12-09 1994-12-09 웨트스테이션 장치

Country Status (1)

Country Link
KR (1) KR200163015Y1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102503856B1 (ko) 2022-05-11 2023-02-24 김호종 위생장갑 착용장치

Also Published As

Publication number Publication date
KR200163015Y1 (ko) 1999-12-15

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20090828

Year of fee payment: 11

EXPY Expiration of term