KR960017905A - 균일한 두께의 동도금층을 갖는 동도금 강판의 연속 제조방법 - Google Patents

균일한 두께의 동도금층을 갖는 동도금 강판의 연속 제조방법 Download PDF

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KR960017905A
KR960017905A KR1019940029276A KR19940029276A KR960017905A KR 960017905 A KR960017905 A KR 960017905A KR 1019940029276 A KR1019940029276 A KR 1019940029276A KR 19940029276 A KR19940029276 A KR 19940029276A KR 960017905 A KR960017905 A KR 960017905A
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South Korea
Prior art keywords
copper
steel sheet
plated steel
copper plated
degassing
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KR1019940029276A
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English (en)
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KR0125320B1 (ko
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최병대
전중환
최기덕
정진호
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신창식
한국신철강기술연구조합
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Priority to KR1019940029276A priority Critical patent/KR0125320B1/ko
Publication of KR960017905A publication Critical patent/KR960017905A/ko
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Publication of KR0125320B1 publication Critical patent/KR0125320B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

본 발명은 전자빔 가열 방식으로 동을 강대에 증착시키는 동도금 강판의 연속 제조방법에 있어서, 예열-용융-스래그제거 및 탈가스-진공배기-재용융-2차 스래그제거 및 탈가스-안정화 공정별로 전자빔의 출력을 조정하고, 상기 공정을 거쳐 동을 안정화 시킨 후 안정화된 동을 강대에 증착시키는 동도금 강판외 연속 제조방법에 관한 것이다.
이와 같온 건식도금방법은 종래의 전기도금방법에 비하여 환경오염의 요인이 되고 있는 폐수를 발생시키지않을 뿐 아니라 공정의 단순화, 빠른 도금속도, 도금물질이 제한받지 않는다는 이점이 있다.
본 발명의 목적은 진공 증착법으로 대량의 동도금 강판을 연속적으로 제조시 증발물 및 도가니를 충분히 예열하는 방법을 통하여 탈가스 및 표면 산화물을 제거하여 동피막의 두께 분포가 불균일하게 되는 요인을 제거시키 는데 있다.

Description

균일한 두께의 동도금층을 갖는 동도금 강판의 연속 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 의한 연속적 진공증착 방법으로 동도금 강판을 제조하는 경우의 증착 작업전 공정조건을 나타낸 도면이다.

Claims (2)

  1. 전자빔 가열방식으로 동을 강대에 증착시키는 동도금 강판의 연속제조방법에 있어서, 예열-용융-스래그제거 및 탈가스-진공배기-재용융-2차 스래그제거 및 탈가스-안정화 공정별로 전자빔의 출력을 조정하고, 상기 공정을 거쳐 동을 안정화 시킨 후 안정화된 동을 강대에 증착시켜 균일한 두께의 동도금층을 갖는 동도금 강판의 연속 제조방법.
  2. 제1항에 있어서, 전자빔의 출력을 예열 및 용융공정에서는 35KW 이하로, 스래그제거 및 탈가스공정에서는 40KW 이하고, 진공배기공정에서는 0KW로, 재용융공정에서는 35KW 이하로, 2차 스래그제거 및 탈가스공정에서는 40KW 이하로, 안정화공정에서는 32KW 이하로 조정하여 안정화된 동을 강대에 증착시켜 균일한 두께의 동도금층을 갖는 동도금 강판의 연속 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940029276A 1994-11-09 1994-11-09 균일한 두께의 동도금층을 갖는 동도금 강판의 연속 제조방법 KR0125320B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940029276A KR0125320B1 (ko) 1994-11-09 1994-11-09 균일한 두께의 동도금층을 갖는 동도금 강판의 연속 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940029276A KR0125320B1 (ko) 1994-11-09 1994-11-09 균일한 두께의 동도금층을 갖는 동도금 강판의 연속 제조방법

Publications (2)

Publication Number Publication Date
KR960017905A true KR960017905A (ko) 1996-06-17
KR0125320B1 KR0125320B1 (ko) 1997-12-26

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KR1019940029276A KR0125320B1 (ko) 1994-11-09 1994-11-09 균일한 두께의 동도금층을 갖는 동도금 강판의 연속 제조방법

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KR0125320B1 (ko) 1997-12-26

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