KR960016235B1 - Semiconductor titanium-silicide forming method - Google Patents
Semiconductor titanium-silicide forming method Download PDFInfo
- Publication number
- KR960016235B1 KR960016235B1 KR93019243A KR930019243A KR960016235B1 KR 960016235 B1 KR960016235 B1 KR 960016235B1 KR 93019243 A KR93019243 A KR 93019243A KR 930019243 A KR930019243 A KR 930019243A KR 960016235 B1 KR960016235 B1 KR 960016235B1
- Authority
- KR
- South Korea
- Prior art keywords
- forming method
- silicide forming
- silicide
- semiconductor titanium
- titanium
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 5
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 229910021341 titanium silicide Inorganic materials 0.000 title 1
- 229910021332 silicide Inorganic materials 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 238000005468 ion implantation Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR93019243A KR960016235B1 (en) | 1993-09-22 | 1993-09-22 | Semiconductor titanium-silicide forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR93019243A KR960016235B1 (en) | 1993-09-22 | 1993-09-22 | Semiconductor titanium-silicide forming method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR950009915A KR950009915A (ko) | 1995-04-26 |
| KR960016235B1 true KR960016235B1 (en) | 1996-12-07 |
Family
ID=19364205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR93019243A KR960016235B1 (en) | 1993-09-22 | 1993-09-22 | Semiconductor titanium-silicide forming method |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR960016235B1 (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100246332B1 (ko) * | 1997-03-13 | 2000-03-15 | 김영환 | 반도체소자의 살리사이드 제조방법 |
-
1993
- 1993-09-22 KR KR93019243A patent/KR960016235B1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR950009915A (ko) | 1995-04-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| G160 | Decision to publish patent application | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant | ||
| FPAY | Annual fee payment |
Payment date: 20041119 Year of fee payment: 9 |
|
| LAPS | Lapse due to unpaid annual fee |