KR960008998A - 스테이지 장치 및 구동방법 - Google Patents

스테이지 장치 및 구동방법

Info

Publication number
KR960008998A
KR960008998A KR1019950027369A KR19950027369A KR960008998A KR 960008998 A KR960008998 A KR 960008998A KR 1019950027369 A KR1019950027369 A KR 1019950027369A KR 19950027369 A KR19950027369 A KR 19950027369A KR 960008998 A KR960008998 A KR 960008998A
Authority
KR
South Korea
Prior art keywords
driving method
stage device
stage
driving
Prior art date
Application number
KR1019950027369A
Other languages
English (en)
Other versions
KR100392442B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR960008998A publication Critical patent/KR960008998A/ko
Application granted granted Critical
Publication of KR100392442B1 publication Critical patent/KR100392442B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
KR1019950027369A 1994-08-26 1995-08-26 스테이지장치및구동방법 KR100392442B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1994-201945 1994-08-26
JP6201945A JPH0864504A (ja) 1994-08-26 1994-08-26 ステージ装置

Publications (2)

Publication Number Publication Date
KR960008998A true KR960008998A (ko) 1996-03-22
KR100392442B1 KR100392442B1 (ko) 2003-10-11

Family

ID=16449384

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950027369A KR100392442B1 (ko) 1994-08-26 1995-08-26 스테이지장치및구동방법

Country Status (3)

Country Link
US (1) US6166812A (ko)
JP (1) JPH0864504A (ko)
KR (1) KR100392442B1 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11354417A (ja) * 1998-06-11 1999-12-24 Canon Inc 走査型露光装置およびこれを用いたデバイス製造方法ならびにステージ制御装置
US7283200B2 (en) * 2003-07-17 2007-10-16 Nikon Corporation System and method for measuring displacement of a stage
JP2005078327A (ja) * 2003-08-29 2005-03-24 Seiko Epson Corp 状態フィードバック制御装置
US7589911B2 (en) * 2003-09-18 2009-09-15 Canon Kabushiki Kaisha Technique for positioning optical system element
JP5151989B2 (ja) * 2006-11-09 2013-02-27 株式会社ニコン 保持装置、位置検出装置及び露光装置、並びにデバイス製造方法
CN110530257A (zh) * 2019-09-26 2019-12-03 深圳市威富视界有限公司 飞秒激光器分布式干涉仪系统

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60119721A (ja) * 1983-12-02 1985-06-27 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ム露光装置における照射位置補正方法
JPH01191420A (ja) * 1988-01-27 1989-08-01 Canon Inc 半導体焼付装置
JP2704734B2 (ja) * 1988-09-05 1998-01-26 キヤノン株式会社 ステージ位置決め補正方法及び装置
JP2852078B2 (ja) * 1989-09-01 1999-01-27 株式会社日立製作所 集束エネルギビーム照射方法及びその装置
US5506684A (en) * 1991-04-04 1996-04-09 Nikon Corporation Projection scanning exposure apparatus with synchronous mask/wafer alignment system
US5477304A (en) * 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus

Also Published As

Publication number Publication date
KR100392442B1 (ko) 2003-10-11
US6166812A (en) 2000-12-26
JPH0864504A (ja) 1996-03-08

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