KR960008898B1 - Cleaning method of semiconductor wafer - Google Patents
Cleaning method of semiconductor wafer Download PDFInfo
- Publication number
- KR960008898B1 KR960008898B1 KR92025841A KR920025841A KR960008898B1 KR 960008898 B1 KR960008898 B1 KR 960008898B1 KR 92025841 A KR92025841 A KR 92025841A KR 920025841 A KR920025841 A KR 920025841A KR 960008898 B1 KR960008898 B1 KR 960008898B1
- Authority
- KR
- South Korea
- Prior art keywords
- cleaning
- water
- semiconductor wafer
- cleaning method
- solutions simultaneously
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 6
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 1
- 239000008367 deionised water Substances 0.000 abstract 1
- 229910021641 deionized water Inorganic materials 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR92025841A KR960008898B1 (en) | 1992-12-28 | 1992-12-28 | Cleaning method of semiconductor wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR92025841A KR960008898B1 (en) | 1992-12-28 | 1992-12-28 | Cleaning method of semiconductor wafer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR940016537A KR940016537A (ko) | 1994-07-23 |
| KR960008898B1 true KR960008898B1 (en) | 1996-07-05 |
Family
ID=19346958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR92025841A KR960008898B1 (en) | 1992-12-28 | 1992-12-28 | Cleaning method of semiconductor wafer |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR960008898B1 (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100333059B1 (ko) * | 1998-11-14 | 2002-10-25 | 삼성전자 주식회사 | 웨이퍼세정방법및이를수행하기위한세정장치 |
| KR100685735B1 (ko) * | 2005-08-11 | 2007-02-26 | 삼성전자주식회사 | 폴리실리콘 제거용 조성물, 이를 이용한 폴리실리콘 제거방법 및 반도체 장치의 제조 방법 |
-
1992
- 1992-12-28 KR KR92025841A patent/KR960008898B1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR940016537A (ko) | 1994-07-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| G160 | Decision to publish patent application | ||
| O035 | Opposition [patent]: request for opposition | ||
| SUBM | Submission of document of abandonment before or after decision of registration |