KR960008699A - Slider manufacturing method of thin film magnetic head and exposure apparatus thereof - Google Patents

Slider manufacturing method of thin film magnetic head and exposure apparatus thereof Download PDF

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Publication number
KR960008699A
KR960008699A KR1019940021645A KR19940021645A KR960008699A KR 960008699 A KR960008699 A KR 960008699A KR 1019940021645 A KR1019940021645 A KR 1019940021645A KR 19940021645 A KR19940021645 A KR 19940021645A KR 960008699 A KR960008699 A KR 960008699A
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KR
South Korea
Prior art keywords
exposure
slider
magnetic head
thin film
film magnetic
Prior art date
Application number
KR1019940021645A
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Korean (ko)
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KR100264005B1 (en
Inventor
동성운
Original Assignee
김광호
삼성전자 주식회사
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Priority to KR1019940021645A priority Critical patent/KR100264005B1/en
Publication of KR960008699A publication Critical patent/KR960008699A/en
Application granted granted Critical
Publication of KR100264005B1 publication Critical patent/KR100264005B1/en

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • G11B5/3106—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
    • G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
    • G11B5/60—Fluid-dynamic spacing of heads from record-carriers
    • G11B5/6005—Specially adapted for spacing from a rotating disc using a fluid cushion

Abstract

본 발명은 박막 자기헤드의 슬라이더 제조방법 및 그 노광장치에 관한 것으로, 좀 더 상세하게는 상기 방법은 a) 노광용 기판(12)위에 슬라이더 기판(8)을 배치시키고 상기 슬라이드 기판(8)위에 DLC막과 감광막(9)을 순차적으로 형성시키는 공정; b) 노광 마스크(13)를 일정속도로 이동 가능한 노광장치를 이용하여 감광막(9)이 곡면형태를 이루도록 노광시키는 공정; 및 c) 이온빔 에칭법을 이용하여 상기 곡면형 감광막(9)을 에칭시키는 공정으로 이루어지므로써 슬라이더의 ABS 가공치수 및 형태를 정밀하게 제어할 수 있으며 결함발생을 완화시키고 산화 또는 부식을 감소시킬 수 있으며 매체와의 접촉으로 인한 마모에 대처하면서 이륙시간을 줄일 수 있어 이로 인한 입지발생을 최소화할 수 있는 잇점이 있다.The present invention relates to a method for manufacturing a slider of a thin film magnetic head and an exposure apparatus thereof. More specifically, the method includes: a) arranging a slider substrate 8 on an exposure substrate 12 and a DLC on the slide substrate 8; Forming a film and a photosensitive film 9 sequentially; b) exposing the photosensitive film 9 to form a curved shape by using an exposure apparatus which is capable of moving the exposure mask 13 at a constant speed; And c) etching the curved photoresist 9 using ion beam etching, thereby precisely controlling the size and shape of the ABS machining of the slider, thereby reducing defects and reducing oxidation or corrosion. In addition, the take-off time can be reduced while coping with abrasion due to contact with the medium, thereby minimizing the occurrence of location.

한편, 박막 자기헤드의 슬라이더 제조용 노광장치는 상부에 노광램프(10)가 형성되고 하부에 노광용 기판(12)과 이를 안착시킬 수 있는 척(11)이 형성된 박막 자기헤드의 슬라이더 제조용 노광장치에 있어서, 상기 노광 램프(10)와 노광용 기판(12)사이에 노광 마스크(13)의 이동을 가능토록 한 가이드 레일(14)이 형성되고 노광 마스크(13)의 일측에 구동수단(15)이 형성된 것에 특징이 있다.On the other hand, the exposure apparatus for manufacturing a slider of a thin film magnetic head is a slider manufacturing exposure apparatus for a thin film magnetic head in which an exposure lamp 10 is formed at an upper portion thereof, and an exposure substrate 12 and a chuck 11 capable of seating the same are formed in a lower portion thereof. The guide rail 14 is formed between the exposure lamp 10 and the exposure substrate 12 to allow the movement of the exposure mask 13, and the driving means 15 is formed on one side of the exposure mask 13. There is a characteristic.

Description

박막자기헤드의 슬라이더 제조방법 및 그 노광장치Slider manufacturing method of thin film magnetic head and exposure apparatus thereof

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제4도는 본 발명에 따른 노광장치의 개략도이며,4 is a schematic view of an exposure apparatus according to the present invention,

제5도는 본 발명에 따른 노광 마스크와 슬라이더 로(row)의 배치도이고,5 is a layout view of an exposure mask and a slider row according to the present invention,

제6도는 본 발명에 따라 노광된 감광막의 노광에너지 분포도이다.6 is an exposure energy distribution diagram of a photosensitive film exposed according to the present invention.

Claims (10)

a) 노광용 기판(12)위에 슬라이더 기판(8)을 배치시키고 상기 슬라이드 기판(8)위에 DLC막과 감광막(9)을 순차적으로 형성시키는 공정; b)노광 마스크(13)을 일정속도로 이동 가능한 노광장치를 이용하여 감광막(9)이 곡면형태를 이루도록 노광시키는 공정; 및 c) 이온빔 에칭법을 이용하여 상기 곡면형 감광막(9)을 에칭시키는 공정으로 이루어지는 것을 특징으로 하는 박막 자기헤드의 슬라이더 제조방법.a) placing a slider substrate (8) on the exposure substrate (12) and sequentially forming a DLC film and a photosensitive film (9) on the slide substrate (8); b) exposing the photosensitive film 9 to form a curved shape by using an exposure apparatus which is capable of moving the exposure mask 13 at a constant speed; And c) etching said curved photosensitive film (9) using an ion beam etching method. 제1항에 있어서, 상기 b)공정의 감광막 노광공정은 슬라이더 레일 길이의 절반크기의 패턴을 갖는 노광 마스크(13)의 패턴(19) 일측단을 DLC막과 감광막(9)이 순차적으로 형성된 슬라이더 기판(8)의 중심에 정렬시키고 노광 램프(10)의 점등과 동시에 노광 마스크(13)를 이동시키는 것으로 이루어지는 것을 특징으로 하는 박막 자기헤드의 슬라이더 제조방법.2. The slider according to claim 1, wherein the photosensitive film exposing step of the step b) is performed by sequentially forming one end of the pattern 19 of the exposure mask 13 having the pattern of half the length of the slider rail. A method for manufacturing a slider of a thin film magnetic head, comprising: moving the exposure mask (13) at the same time as aligning the center of the substrate (8) and turning on the exposure lamp (10). 제1항에 있어서, 상기 c)공정이 감광막(9)에 대해 수직각도를 제외한 일정각도로 이온빔을 조사하는 것으로 이루어지는 것을 특징으로 하는 박막 자기헤드의 슬라이더 제조방법.The method of manufacturing a slider of a thin film magnetic head according to claim 1, wherein the step c) comprises irradiating the ion beam at a predetermined angle with respect to the photosensitive film (9). 제3항에 있어서, 상기 이온빔 조사각이 70~80°인 것을 특징으로 하는 박막 자기헤드의 슬라이더 제조방법.The method of claim 3, wherein the ion beam irradiation angle is 70 to 80 degrees. 제1항에 있어서, 상기 a)공정의 DLC막의 두께가 5~40㎛이고 감광막(9)의 두께가 1.4~1.6㎛인 것을 특징으로 하는 박막 자기헤드의 슬라이더 제조방법.The method of manufacturing a slider of a thin film magnetic head according to claim 1, wherein the DLC film in step a) has a thickness of 5 to 40 µm and a photosensitive film (9) has a thickness of 1.4 to 1.6 µm. 제1항에 있어서, 상기 b)공정의 노광 마스크(13)의 이동속도가 0.2~0.4mm/sec인 것을 특징으로 하는 박막 자기헤드의 슬라이더 제조방법.The method of manufacturing a slider of a thin film magnetic head according to claim 1, wherein the moving speed of the exposure mask (13) in step b) is 0.2 to 0.4 mm / sec. 상부에 노광 램프(10)가 형성되고 하부에 노광용 기판(12)과 이를 안착시킬 수 있는 척(11)이 형성된 박막 자기헤드의 슬라이더 제조용 노광장치에 있어서, 상기 노광 램프(10)와 노광용 기판(12)사이에 노광 마스크(13)의 이동을 가능토록 한 가이드 레일(14)이 형성되고 노광 마스크(13)의 일측에 구동수단(15)이 형성된 것을 특징으로 하는 박막 자기헤드의 슬라이더 제조용 노광장치.An exposure apparatus for manufacturing a slider of a thin film magnetic head having an exposure lamp 10 formed on an upper portion thereof, and a substrate 12 for exposure thereon and a chuck 11 capable of mounting the same, wherein the exposure lamp 10 and the substrate for exposure ( 12. An exposure apparatus for manufacturing a slider of a thin film magnetic head, characterized in that a guide rail 14 for allowing movement of the exposure mask 13 is formed between the two, and a driving means 15 is formed on one side of the exposure mask 13. . 제7항에 있어서, 상기 노광 마스크(13)와 구동수단(15) 사이에 감속기(17)가 형성된 것을 특징으로 하는 박막 자기헤드의 슬라이더 제조용 노광장치.8. An exposure apparatus for producing a slider of a thin film magnetic head according to claim 7, wherein a reduction gear (17) is formed between the exposure mask (13) and the driving means (15). 제7항에 있어서, 상기 구동수단(15)이 초음파 모터인 것을 특징으로 하는 박막 자기헤드의 슬라이더 제조용 노광장치.8. An exposure apparatus for producing a slider of a thin film magnetic head according to claim 7, wherein said drive means (15) is an ultrasonic motor. 제7항에 있어서, 상기 노광 램프(10)와 구동수단(15)에 콘트롤러(18)가 형성된 것을 특징으로 하는 박막 자기헤드의 슬라이더 제조용 노광장치.8. An exposure apparatus for producing a slider of a thin film magnetic head according to claim 7, wherein a controller (18) is formed in said exposure lamp (10) and said driving means (15). ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940021645A 1994-08-30 1994-08-30 Manufacturing method for slider of thin film magnetic head and its device KR100264005B1 (en)

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KR1019940021645A KR100264005B1 (en) 1994-08-30 1994-08-30 Manufacturing method for slider of thin film magnetic head and its device

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KR1019940021645A KR100264005B1 (en) 1994-08-30 1994-08-30 Manufacturing method for slider of thin film magnetic head and its device

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KR960008699A true KR960008699A (en) 1996-03-22
KR100264005B1 KR100264005B1 (en) 2000-08-16

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6209591B1 (en) 1999-02-02 2001-04-03 Steuben Foods, Inc. Apparatus and method for providing container filling in an aseptic processing apparatus
US6475435B1 (en) 1999-02-02 2002-11-05 Steuben Foods Incorporated Apparatus and method for providing sterilization zones in an aseptic packaging sterilization tunnel
US6536188B1 (en) 1999-02-02 2003-03-25 Steuben Foods, Inc. Method and apparatus for aseptic packaging
US6702985B1 (en) 1999-07-15 2004-03-09 Steuben Foods, Inc. Apparatus and method for providing container interior sterilization in an aseptic processing apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6209591B1 (en) 1999-02-02 2001-04-03 Steuben Foods, Inc. Apparatus and method for providing container filling in an aseptic processing apparatus
US6475435B1 (en) 1999-02-02 2002-11-05 Steuben Foods Incorporated Apparatus and method for providing sterilization zones in an aseptic packaging sterilization tunnel
US6536188B1 (en) 1999-02-02 2003-03-25 Steuben Foods, Inc. Method and apparatus for aseptic packaging
US6945013B2 (en) 1999-02-02 2005-09-20 Steuben Foods Incorporated Method and apparatus for aseptic packaging
US6702985B1 (en) 1999-07-15 2004-03-09 Steuben Foods, Inc. Apparatus and method for providing container interior sterilization in an aseptic processing apparatus

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