KR960006314U - 세정액 분사노즐 - Google Patents

세정액 분사노즐

Info

Publication number
KR960006314U
KR960006314U KR2019940016604U KR19940016604U KR960006314U KR 960006314 U KR960006314 U KR 960006314U KR 2019940016604 U KR2019940016604 U KR 2019940016604U KR 19940016604 U KR19940016604 U KR 19940016604U KR 960006314 U KR960006314 U KR 960006314U
Authority
KR
South Korea
Prior art keywords
spray nozzle
cleaning solution
solution spray
cleaning
nozzle
Prior art date
Application number
KR2019940016604U
Other languages
English (en)
Other versions
KR0121319Y1 (ko
Inventor
진규안
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940016604U priority Critical patent/KR0121319Y1/ko
Publication of KR960006314U publication Critical patent/KR960006314U/ko
Application granted granted Critical
Publication of KR0121319Y1 publication Critical patent/KR0121319Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019940016604U 1994-07-06 1994-07-06 세정액 분사노즐 KR0121319Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940016604U KR0121319Y1 (ko) 1994-07-06 1994-07-06 세정액 분사노즐

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940016604U KR0121319Y1 (ko) 1994-07-06 1994-07-06 세정액 분사노즐

Publications (2)

Publication Number Publication Date
KR960006314U true KR960006314U (ko) 1996-02-17
KR0121319Y1 KR0121319Y1 (ko) 1998-08-01

Family

ID=19387701

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940016604U KR0121319Y1 (ko) 1994-07-06 1994-07-06 세정액 분사노즐

Country Status (1)

Country Link
KR (1) KR0121319Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100835516B1 (ko) * 2003-12-23 2008-06-04 동부일렉트로닉스 주식회사 화학 기계적 연마공정의 메가소닉 세척장치 및 이를이용한 세척방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100835516B1 (ko) * 2003-12-23 2008-06-04 동부일렉트로닉스 주식회사 화학 기계적 연마공정의 메가소닉 세척장치 및 이를이용한 세척방법

Also Published As

Publication number Publication date
KR0121319Y1 (ko) 1998-08-01

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Legal Events

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A201 Request for examination
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E701 Decision to grant or registration of patent right
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G701 Publication of correction
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Payment date: 20040326

Year of fee payment: 7

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