KR950031477U - 웨이퍼 열처리용 전기로 - Google Patents

웨이퍼 열처리용 전기로

Info

Publication number
KR950031477U
KR950031477U KR2019940006892U KR19940006892U KR950031477U KR 950031477 U KR950031477 U KR 950031477U KR 2019940006892 U KR2019940006892 U KR 2019940006892U KR 19940006892 U KR19940006892 U KR 19940006892U KR 950031477 U KR950031477 U KR 950031477U
Authority
KR
South Korea
Prior art keywords
heat treatment
treatment furnace
wafer heat
wafer
furnace
Prior art date
Application number
KR2019940006892U
Other languages
English (en)
Other versions
KR200157388Y1 (ko
Inventor
차동열
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019940006892U priority Critical patent/KR200157388Y1/ko
Publication of KR950031477U publication Critical patent/KR950031477U/ko
Application granted granted Critical
Publication of KR200157388Y1 publication Critical patent/KR200157388Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR2019940006892U 1994-04-01 1994-04-01 웨이퍼 열처리용 전기로 KR200157388Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940006892U KR200157388Y1 (ko) 1994-04-01 1994-04-01 웨이퍼 열처리용 전기로

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940006892U KR200157388Y1 (ko) 1994-04-01 1994-04-01 웨이퍼 열처리용 전기로

Publications (2)

Publication Number Publication Date
KR950031477U true KR950031477U (ko) 1995-11-22
KR200157388Y1 KR200157388Y1 (ko) 1999-09-15

Family

ID=19380295

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940006892U KR200157388Y1 (ko) 1994-04-01 1994-04-01 웨이퍼 열처리용 전기로

Country Status (1)

Country Link
KR (1) KR200157388Y1 (ko)

Also Published As

Publication number Publication date
KR200157388Y1 (ko) 1999-09-15

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20080527

Year of fee payment: 10

EXPY Expiration of term