KR950028636U - 스퍼터링 장비의 주변 노광장치 - Google Patents

스퍼터링 장비의 주변 노광장치

Info

Publication number
KR950028636U
KR950028636U KR2019940004810U KR19940004810U KR950028636U KR 950028636 U KR950028636 U KR 950028636U KR 2019940004810 U KR2019940004810 U KR 2019940004810U KR 19940004810 U KR19940004810 U KR 19940004810U KR 950028636 U KR950028636 U KR 950028636U
Authority
KR
South Korea
Prior art keywords
equipment
peripheral exposure
sputtering
exposure equipment
sputtering equipment
Prior art date
Application number
KR2019940004810U
Other languages
English (en)
Other versions
KR200169674Y1 (ko
Inventor
전용만
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019940004810U priority Critical patent/KR200169674Y1/ko
Publication of KR950028636U publication Critical patent/KR950028636U/ko
Application granted granted Critical
Publication of KR200169674Y1 publication Critical patent/KR200169674Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR2019940004810U 1994-03-10 1994-03-10 스퍼터링 장비의 주변 노광장치 KR200169674Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940004810U KR200169674Y1 (ko) 1994-03-10 1994-03-10 스퍼터링 장비의 주변 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940004810U KR200169674Y1 (ko) 1994-03-10 1994-03-10 스퍼터링 장비의 주변 노광장치

Publications (2)

Publication Number Publication Date
KR950028636U true KR950028636U (ko) 1995-10-20
KR200169674Y1 KR200169674Y1 (ko) 2000-02-01

Family

ID=19378726

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940004810U KR200169674Y1 (ko) 1994-03-10 1994-03-10 스퍼터링 장비의 주변 노광장치

Country Status (1)

Country Link
KR (1) KR200169674Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100614635B1 (ko) * 1999-07-08 2006-08-22 삼성전자주식회사 반도체 제조 공정에 사용되는 노광 시스템

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100614635B1 (ko) * 1999-07-08 2006-08-22 삼성전자주식회사 반도체 제조 공정에 사용되는 노광 시스템

Also Published As

Publication number Publication date
KR200169674Y1 (ko) 2000-02-01

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