KR950027467A - Optical path control device and manufacturing method - Google Patents

Optical path control device and manufacturing method Download PDF

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Publication number
KR950027467A
KR950027467A KR1019940004519A KR19940004519A KR950027467A KR 950027467 A KR950027467 A KR 950027467A KR 1019940004519 A KR1019940004519 A KR 1019940004519A KR 19940004519 A KR19940004519 A KR 19940004519A KR 950027467 A KR950027467 A KR 950027467A
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South Korea
Prior art keywords
membrane
signal electrode
optical path
path control
control device
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KR1019940004519A
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Korean (ko)
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KR100207369B1 (en
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민용기
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배순훈
대우전자 주식회사
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Priority to KR1019940004519A priority Critical patent/KR100207369B1/en
Priority to PE1995263014A priority patent/PE18996A1/en
Priority to CN95192032A priority patent/CN1074226C/en
Priority to HU9602405A priority patent/HU220466B1/en
Priority to RU96119962A priority patent/RU2129759C1/en
Priority to AU19612/95A priority patent/AU683363B2/en
Priority to CA002191132A priority patent/CA2191132A1/en
Priority to CZ19962621A priority patent/CZ288251B6/en
Priority to BR9507022A priority patent/BR9507022A/en
Priority to MX9603949A priority patent/MX9603949A/en
Priority to JP7523368A priority patent/JPH09510025A/en
Priority to PL95316170A priority patent/PL176509B1/en
Priority to PCT/KR1995/000015 priority patent/WO1995024798A1/en
Priority to US08/400,065 priority patent/US5663830A/en
Priority to TW084102214A priority patent/TW279207B/zh
Priority to EP95103441A priority patent/EP0671645A3/en
Priority to UY23931A priority patent/UY23931A1/en
Publication of KR950027467A publication Critical patent/KR950027467A/en
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Publication of KR100207369B1 publication Critical patent/KR100207369B1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0102—Constructional details, not otherwise provided for in this subclass
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/02—Function characteristic reflective

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

본 발명은 광로조절장치 및 그 제조방법에 관한 것으로서, 트랜지스터가 매트릭스 형태로 내장되고 표면에 각각의 트랜지스터에 전기적으로 연결된 접속단자를 2개씩 갖는 구동기판과, 상기 구동기판에 상기 접속단자를 각각 에워싸여 분리되게 형성된 지지부와, 상기 지지부의 상부에 일측의 소정부분이 접촉되도록 실장되며 상기 지지부의 대향하는 면과 일치되도록 타측으로 소정길이 만큼 절단된 멤브레인과, 상기 멤브레인의 상부에 지지부와 중첩되며 타측으로 소정길이 만큼 신장되게 형성된 신호전극과, 상기 지지부와 멤브레인을 관통하도록 형성되어 접속단자와 신호전극을 전기적으로 연결하는 플러그와, 상기 신호전극의 상부에 형성된 변형부와, 상기 변형부를 포함하는 멤브레인의 상부에 형성된 반사막으로 이루어진 액츄에이터를 구비한다. 따라서, 변형부가 신호전극의 상부에만 형성되므로 변형부와 멤브레인의 열팽창계수차에 의한 스트레스와 상호작용에 의한 힐록을 방지하여 반사막이 평탄하고 크랙의 발생을 억제할 수 있다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical path control apparatus and a method of manufacturing the same, comprising: a driving substrate having two connecting terminals each having a transistor embedded in a matrix and electrically connected to each transistor on a surface thereof; A support part formed to be wrapped and separated, mounted to contact a predetermined part of one side on the upper part of the support part, and a membrane cut by a predetermined length to the other side to coincide with an opposite surface of the support part, and overlapping with the support part on the upper part of the membrane A signal electrode formed to extend by a predetermined length to the side, a plug formed to penetrate the support part and the membrane to electrically connect the connection terminal and the signal electrode, a deformation part formed on the signal electrode, and a membrane including the deformation part An actuator made of a reflective film formed on the top of the The. Therefore, since the deformation portion is formed only on the upper portion of the signal electrode, the reflection film is flat and the cracks can be suppressed by preventing the hillock due to the stress and the interaction caused by the thermal expansion coefficient aberration of the deformation portion and the membrane.

Description

광로조절장치 및 그 제조방법Optical path control device and manufacturing method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명에 따른 광로조절장치의 평면도,1 is a plan view of an optical path adjusting apparatus according to the present invention;

제2도는 제1도를 a-a 선으로 자른 단면도,2 is a cross-sectional view taken along line a-a of FIG. 1,

제3도 (A) 내지 (D)는 본 발명에 따른 광로조절장치의 제조공정도.3 (A) to (D) is a manufacturing process diagram of the optical path control apparatus according to the present invention.

Claims (23)

트랜지스터가 매트릭스 형태로 내장되고 표면에 각각의 트랜지스터에 전기적으로 연결된 접속단자를 2개씩 구동기판과; 상기 구동기판에 상기 접속단자를 각각 에워싸여 분리되게 형성된 지지부와, 상기 지지부의 상부에 일측의 소정분분이 접촉되도록 실장되며 상기 지지부의 대향하는 면과 일치되도록 타측으로 소정길이 만큼 절단된 멤브레인과, 상기 멤브레인의 상부에 지지부와 중첩되며 타측으로 소정길이 만큼 신장되게 형성된 신호전극과, 상기 지지부와 멤브레인을 관통하도록 형성되어 접속단자와 신호전극을 전기적으로 연결하는 플러그와, 상기 신호전극의 상부에 형성된 변형부와, 상기 변형부를 포함하는 멤브레인의 상부에 형성된 반사막으로 이루어진 액츄에이터를 구비하는 광로조절장치.A driving substrate comprising two connecting terminals each having a transistor embedded in a matrix and electrically connected to each transistor on its surface; A support part formed to be separated from each other by surrounding the connection terminal on the driving substrate, and a membrane mounted on the upper part of the support part to be in contact with a predetermined portion and cut to the other side by a predetermined length so as to coincide with an opposing surface of the support part; A signal electrode formed on the upper part of the membrane and overlapping with the support part and extending to the other side by a predetermined length; a plug formed to penetrate the support part and the membrane to electrically connect the connection terminal and the signal electrode; An optical path control device having a deformable portion and an actuator comprising a reflective film formed on an upper portion of the membrane including the deformable portion. 제1항에 있어서, 상기 신호전극이 멤브레인의 절단부분과 일치되게 신장된 광로조절장치.The optical path control device of claim 1, wherein the signal electrode extends to coincide with a cut portion of the membrane. 제2항에 있어서, 상기 신호전극과 중첩되는 반사막이 바이어스전극으로 이용되는 광로조절장치.The optical path control device of claim 2, wherein a reflective film overlapping the signal electrode is used as a bias electrode. 제1항에 있어서, 상기 신호전극과 변형부의 절단된 측면과 반사막사이에 유전막이 더 구비하는 광로조절장치.The optical path control device of claim 1, further comprising a dielectric film between the signal electrode and the cut side of the deformable part and the reflective film. 트랜지스터가 매트릭스 형태로 내장되고 표면에 이 트랜지스터 각각에 2개의 접속단자가 전기적으로 연결되도록 형성된 구동기판의 상부에 상기 접속단자와 접촉되지 않도록 희생막을 형성하는 공정과, 상기 희생막이 형성되지 않은 구동기판의 상부에 상기 접속단자를 에워싸는 지지부를 형성하는 공정과, 상기 희생막과 지지부의 상부에 멤브레인을 형성하고 상기 멤브레인과 지지부의 소정 부분을 접속단자가 노출되도록 제거하고 플러그를 형성하는 공정과, 상기 지지부 및 희생막의 소정부분과 중첩되도록 멤브레인의 상부에 신호전극과 변형부를 형성하는 공정과, 상기 변형부 및 반사막의 상부에 반사막을 형성하는 공정과, 상기 반사막부터 멤브레인까지를 희생막이 노출되도록 지지부의 일측면과 일치되게 제거함과 동시에 대향하는 지지부 사이의 신호전극과 중첩되지 않는 부분도 중첩된 부분과 분리시키는 공정과, 상기 희생막을 제거하는 공정을 구비하는 광로조절장치의 제조방법.Forming a sacrificial layer on the top of the driving substrate having transistors embedded in a matrix and having two connection terminals electrically connected to each of the transistors on the surface thereof, and a driving substrate on which the sacrificial layer is not formed; Forming a support portion surrounding the connection terminal at an upper portion of the substrate; forming a membrane on the sacrificial layer and the support portion; removing a predetermined portion of the membrane and the support portion to expose the connection terminal; Forming a signal electrode and a deformable part on an upper portion of the membrane so as to overlap a predetermined portion of the support part and the sacrificial film, forming a reflective film on the deformed part and the reflective film, and exposing the sacrificial film from the reflective film to the membrane. Opposite support at the same time removing and matching with one side And a step of separating the portion not overlapping with the signal electrode therebetween and the overlapping portion, and removing the sacrificial layer. 제5항에 있어서, 상기 희생막을 Mo, Cu, Fe, Ni 또는 Al들 중 어느 하나로 형성하는 광로조절장치의 제조방법.The method of claim 5, wherein the sacrificial film is formed of any one of Mo, Cu, Fe, Ni, and Al. 제6항에 있어서, 상기 희생막을 스퍼터링방법으로 형성하는 광로조절장치의 제조방법.The method of claim 6, wherein the sacrificial film is formed by a sputtering method. 제5항에 있어서, 상기 희생막(PSG)를 스핀코팅 또는 화학기상증착(CVD)하여 형성하는 광로조절장치의 제조방법.The method of claim 5, wherein the sacrificial film (PSG) is formed by spin coating or chemical vapor deposition (CVD). 제5항에 있어서, 상기 희생막을 다결정실리콘을 화학기상증착 방법으로 형성하는 광로조절장치의 제조방법.The method of claim 5, wherein the sacrificial film is formed of polysilicon by chemical vapor deposition. 제5 내지 제9항중 어느 한 항에 있어서, 상기 희생막을 1∼2㎛ 정도의 두께로 형성하는 광로조절장치의 제조방법.The method of manufacturing an optical path control device according to claim 5, wherein the sacrificial film is formed to a thickness of about 1 to 2 μm. 제5항에 있어서, 상기 지지부를 질화실리콘 산화실리콘 또는 탄화실리콘의 규화물중 어느 하나로 형성하는 광로조절장치의 제조방법.The method of manufacturing an optical path control device according to claim 5, wherein the support part is formed of any one of silicon nitride silicon oxide or silicon carbide. 제11항에 있어서, 상기 지지부를 포토리쏘그래피법에 의한 에칭 또는 리프트-오프법중 어느 하나로 한정하는 광로조절장치의 제조방법.The method of manufacturing an optical path control apparatus according to claim 11, wherein the support portion is defined by any one of etching or lift-off by photolithography. 제1항에 있어서, 상기 멤브레인을 지지부와 동일한 물질로 형성하는 광로조절장치의 제조방법.The method of claim 1, wherein the membrane is formed of the same material as the support. 제13항에 있어서, 상기 탄성부를 0.7∼2㎛ 정도의 두께로 형성하는 광로조절장치의 제조방법.The method of claim 13, wherein the elastic portion is formed to a thickness of about 0.7 to 2㎛. 제5항에 있어서, 상기 신호전극을 백금 또는 백금/티타늄들중 어느 하나로 형성하는 광로조절장치의 제조방법.The method of claim 5, wherein the signal electrode is formed of platinum or platinum / titanium. 제5항에 있어서, 상기 변형부를 압전 또는 전왜세라믹들중 어느 하나로 형성하는 광로조절장치의 제조방법.The method of manufacturing an optical path control device according to claim 5, wherein the deformable part is formed of any one of piezoelectric and electrostrictive ceramics. 제16항에 있어서, 상기 변형부를 Sol-Gel법, 스퍼터링 또는 CVD 법들중 어느 하나로 형성하는 광로조절장치의 제조방법.The method of claim 16, wherein the deformation part is formed by any one of a Sol-Gel method, a sputtering method, or a CVD method. 제17항에 있어서, 상기 변형부를 0.7∼2㎛ 정도의 두께로 형성하는 광로조절장치의 제조방법.18. The method of claim 17, wherein the deformation portion is formed to a thickness of about 0.7 to 2 µm. 제5항에 있어서, 상기 신호전극과 변형부의 측면에 유전막을 형성하는 공정을 더 구비하는 광로조절장치의 제조방법.The method of claim 5, further comprising forming a dielectric film on side surfaces of the signal electrode and the deformation unit. 제19항에 있어서, 상기 유전막을 질화실리콘, 산화실리콘 또는 탄화실리콘들 중 어느 하나로 형성하는 광로조절장치의 제조방법.20. The method of claim 19, wherein the dielectric film is formed of any one of silicon nitride, silicon oxide, or silicon carbide. 제5항에 있어서, 상기 반사막을 은 또는 알루미늄 등과 같이 반사 및 전기적 특성이 좋은 금속으로 형성하는 광로조절장치의 제조방법.The method of manufacturing an optical path control device according to claim 5, wherein the reflective film is formed of a metal having good reflection and electrical properties, such as silver or aluminum. 제21항에 있어서, 상기 반사막을 진공증착 또는 스퍼터링하여 형성하는 광로조절장치의 제조방법.The method of claim 21, wherein the reflective film is formed by vacuum deposition or sputtering. 제22항에 있어서, 상기 반사막을 500-1000Å 정도의 두께로 형성하는 광로조절장치의 제조방법.23. The method of claim 22, wherein the reflective film is formed to a thickness of about 500-1000 mW. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940004519A 1994-03-09 1994-03-09 Lightpath modulation device and its fabrication method KR100207369B1 (en)

Priority Applications (17)

Application Number Priority Date Filing Date Title
KR1019940004519A KR100207369B1 (en) 1994-03-09 1994-03-09 Lightpath modulation device and its fabrication method
PE1995263014A PE18996A1 (en) 1994-03-09 1995-03-01 ARRANGEMENT OF MIRRORS COMPOSED OF THIN FILMS OPERATED FOR USE IN A SET OF OPTICAL PROJECTION AND METHOD TO MANUFACTURE THE SAME
PL95316170A PL176509B1 (en) 1994-03-09 1995-03-02 Set of thin-film movable mirrors for use in an optical projection system and method of making same
RU96119962A RU2129759C1 (en) 1994-03-09 1995-03-02 Periodic structure of drive-coupled thin-film mirrors for optical projection systems and its manufacturing process
AU19612/95A AU683363B2 (en) 1994-03-09 1995-03-02 Thin film actuated mirror array for use in an optical projection system and method for the manufacture thereof
CA002191132A CA2191132A1 (en) 1994-03-09 1995-03-02 Thin film actuated mirror array for use in an optical projection system and method for the manufacture thereof
CZ19962621A CZ288251B6 (en) 1994-03-09 1995-03-02 Thin film actuated mirror array for use in an optical projection system and method for the manufacture thereof
BR9507022A BR9507022A (en) 1994-03-09 1995-03-02 Set of m x n thin film actuated mirrors in which m and n are whole numbers for use in an optical projection system optical projection system and process for manufacturing m x n thin film actuated mirrors for use in an optical projection system
CN95192032A CN1074226C (en) 1994-03-09 1995-03-02 Thin film actuated mirror array for use in an optical projection system and method for the manufacture thereof
JP7523368A JPH09510025A (en) 1994-03-09 1995-03-02 Thin film actuated mirror array for optical projection system and manufacturing method thereof
HU9602405A HU220466B1 (en) 1994-03-09 1995-03-02 Thin film actuated mirror array for use in an optical projection system and method for the manufacture thereof
PCT/KR1995/000015 WO1995024798A1 (en) 1994-03-09 1995-03-02 Thin film actuated mirror array for use in an optical projection system and method for the manufacture thereof
MX9603949A MX9603949A (en) 1994-03-09 1995-03-02 Thin film actuated mirror array for use in an optical projection system and method for the manufacture thereof.
US08/400,065 US5663830A (en) 1994-03-09 1995-03-07 Thin film actuated mirror array for use in an optical projection system and method for the manufacture thereof
TW084102214A TW279207B (en) 1994-03-09 1995-03-08
EP95103441A EP0671645A3 (en) 1994-03-09 1995-03-09 Thin film actuated mirror array for use in an optical projection system and method for the manufacture thereof.
UY23931A UY23931A1 (en) 1994-03-09 1995-03-09 SET OF DRIVEN MIRRORS, OF THIN FILM, TO BE USED IN AN OPTICAL PROJECTION SYSTEM AND A METHOD FOR THE MANUFACTURE OF THE SAME.

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KR1019940004519A KR100207369B1 (en) 1994-03-09 1994-03-09 Lightpath modulation device and its fabrication method

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