KR950025888U - Photoresist bubble size control device - Google Patents

Photoresist bubble size control device

Info

Publication number
KR950025888U
KR950025888U KR2019940002377U KR19940002377U KR950025888U KR 950025888 U KR950025888 U KR 950025888U KR 2019940002377 U KR2019940002377 U KR 2019940002377U KR 19940002377 U KR19940002377 U KR 19940002377U KR 950025888 U KR950025888 U KR 950025888U
Authority
KR
South Korea
Prior art keywords
control device
size control
bubble size
photoresist bubble
photoresist
Prior art date
Application number
KR2019940002377U
Other languages
Korean (ko)
Other versions
KR970001343Y1 (en
Inventor
장태덕
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019940002377U priority Critical patent/KR970001343Y1/en
Publication of KR950025888U publication Critical patent/KR950025888U/en
Application granted granted Critical
Publication of KR970001343Y1 publication Critical patent/KR970001343Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
KR2019940002377U 1994-02-07 1994-02-07 Bubble size controlling apparatus for photoresist KR970001343Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940002377U KR970001343Y1 (en) 1994-02-07 1994-02-07 Bubble size controlling apparatus for photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940002377U KR970001343Y1 (en) 1994-02-07 1994-02-07 Bubble size controlling apparatus for photoresist

Publications (2)

Publication Number Publication Date
KR950025888U true KR950025888U (en) 1995-09-18
KR970001343Y1 KR970001343Y1 (en) 1997-02-22

Family

ID=19377027

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940002377U KR970001343Y1 (en) 1994-02-07 1994-02-07 Bubble size controlling apparatus for photoresist

Country Status (1)

Country Link
KR (1) KR970001343Y1 (en)

Also Published As

Publication number Publication date
KR970001343Y1 (en) 1997-02-22

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