KR970056058U - Photoresist supply device - Google Patents

Photoresist supply device

Info

Publication number
KR970056058U
KR970056058U KR2019960004503U KR19960004503U KR970056058U KR 970056058 U KR970056058 U KR 970056058U KR 2019960004503 U KR2019960004503 U KR 2019960004503U KR 19960004503 U KR19960004503 U KR 19960004503U KR 970056058 U KR970056058 U KR 970056058U
Authority
KR
South Korea
Prior art keywords
supply device
photoresist supply
photoresist
supply
Prior art date
Application number
KR2019960004503U
Other languages
Korean (ko)
Other versions
KR200153640Y1 (en
Inventor
이규명
김종관
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019960004503U priority Critical patent/KR200153640Y1/en
Publication of KR970056058U publication Critical patent/KR970056058U/en
Application granted granted Critical
Publication of KR200153640Y1 publication Critical patent/KR200153640Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019960004503U 1996-03-12 1996-03-12 Photoresist supplying apparatus KR200153640Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960004503U KR200153640Y1 (en) 1996-03-12 1996-03-12 Photoresist supplying apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960004503U KR200153640Y1 (en) 1996-03-12 1996-03-12 Photoresist supplying apparatus

Publications (2)

Publication Number Publication Date
KR970056058U true KR970056058U (en) 1997-10-13
KR200153640Y1 KR200153640Y1 (en) 1999-08-02

Family

ID=19451721

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960004503U KR200153640Y1 (en) 1996-03-12 1996-03-12 Photoresist supplying apparatus

Country Status (1)

Country Link
KR (1) KR200153640Y1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100941072B1 (en) * 2007-12-27 2010-02-09 세메스 주식회사 Apparatus and method for supplying chemical

Also Published As

Publication number Publication date
KR200153640Y1 (en) 1999-08-02

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20070418

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee