KR950023800U - Plasma etching device - Google Patents

Plasma etching device

Info

Publication number
KR950023800U
KR950023800U KR2019940000163U KR19940000163U KR950023800U KR 950023800 U KR950023800 U KR 950023800U KR 2019940000163 U KR2019940000163 U KR 2019940000163U KR 19940000163 U KR19940000163 U KR 19940000163U KR 950023800 U KR950023800 U KR 950023800U
Authority
KR
South Korea
Prior art keywords
plasma etching
etching device
plasma
etching
Prior art date
Application number
KR2019940000163U
Other languages
Korean (ko)
Other versions
KR970005019Y1 (en
Inventor
김혜동
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019940000163U priority Critical patent/KR970005019Y1/en
Publication of KR950023800U publication Critical patent/KR950023800U/en
Application granted granted Critical
Publication of KR970005019Y1 publication Critical patent/KR970005019Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
KR2019940000163U 1994-01-07 1994-01-07 Plasma etching equipment KR970005019Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940000163U KR970005019Y1 (en) 1994-01-07 1994-01-07 Plasma etching equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940000163U KR970005019Y1 (en) 1994-01-07 1994-01-07 Plasma etching equipment

Publications (2)

Publication Number Publication Date
KR950023800U true KR950023800U (en) 1995-08-23
KR970005019Y1 KR970005019Y1 (en) 1997-05-22

Family

ID=19375344

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940000163U KR970005019Y1 (en) 1994-01-07 1994-01-07 Plasma etching equipment

Country Status (1)

Country Link
KR (1) KR970005019Y1 (en)

Also Published As

Publication number Publication date
KR970005019Y1 (en) 1997-05-22

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20081006

Year of fee payment: 12

EXPY Expiration of term