KR950011648A - Metal thin plate cleaning method and cleaning device - Google Patents

Metal thin plate cleaning method and cleaning device Download PDF

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Publication number
KR950011648A
KR950011648A KR1019940024058A KR19940024058A KR950011648A KR 950011648 A KR950011648 A KR 950011648A KR 1019940024058 A KR1019940024058 A KR 1019940024058A KR 19940024058 A KR19940024058 A KR 19940024058A KR 950011648 A KR950011648 A KR 950011648A
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KR
South Korea
Prior art keywords
liquid
thin plate
degreasing
metal thin
metal
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Application number
KR1019940024058A
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Korean (ko)
Other versions
KR0124479B1 (en
Inventor
고우지 사와다
야스요시 미야지
히로후미 니사무타
Original Assignee
이시다 아키라
다이닛뽕스크린 세이조오 가부시키가이샤
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Application filed by 이시다 아키라, 다이닛뽕스크린 세이조오 가부시키가이샤 filed Critical 이시다 아키라
Publication of KR950011648A publication Critical patent/KR950011648A/en
Application granted granted Critical
Publication of KR0124479B1 publication Critical patent/KR0124479B1/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C1/00—Magnetic separation
    • B03C1/02—Magnetic separation acting directly on the substance being separated
    • B03C1/30—Combinations with other devices, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

탈지와 정면처리에 따라서 금속박판의 표면에서 분리제거되어서 탈지액과 정면액중에 부유하고 있는 오염물질이 금속박판표면에 재부착하는 것을 방지하여 에칭공정에서의 핀홀과 레지스트의 막부유등이 일어나지 않도록 한다.It is separated and removed from the surface of the metal sheet by degreasing and frontal treatment to prevent re-attachment of contaminants suspended in the degreasing solution and the front liquid to the surface of the metal sheet so as to prevent pinholes and film leakage from the etching process. .

탈지액 또는 정면액(14)의 액중 또는 액면에 자석(22,28)을 설치하고 액중에 부유하고 있는 오염물질을 자석으로 흡착시켜 제거한다.Magnets 22 and 28 are installed in the liquid or liquid surface of the degreasing liquid or the front liquid 14, and the contaminants suspended in the liquid are adsorbed and removed by the magnet.

Description

금속박판의 세정방법 및 세정장치Metal thin plate cleaning method and cleaning device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명에 관한 금속박판의 세정방법을 실시하는데 사용되는 세정장치의 일실시예를 나타내는 단면사시도.1 is a cross-sectional perspective view showing one embodiment of a cleaning apparatus used to carry out the method for cleaning a metal sheet according to the present invention.

제2도는 본 발명을 전해탈지 또는 전해정면(整面)에 적용한 경우의 장치를 구성예를 나타내는 개략도.2 is a schematic view showing a configuration example of an apparatus in the case where the present invention is applied to an electrolytic degreasing or an electrolytic front face.

Claims (4)

포토에칭법에 의해 처리된 금속박판을 탈지액중 또는 정면액중으로 통과하는 것에 의해, 금속박판의 표면에 부착된 오염물질을 제거하는 금속박판의 세정방법에 있어서, 탈지액 또는 정면액의 액중 또는 액면에 자석을 설치해서, 금속박판의 표면에서 분리제거되어 탈지액 또는 정면액에 부유하고 있는 오염물질을 상기 자석에 흡착시켜서 제거하는 것을 특징으로 하는 금속박판의 세정방법.In the cleaning method of a metal thin plate which removes contaminants adhering to the surface of the metal thin plate by passing the metal thin plate treated by the photoetching method into the degreasing liquid or the front liquid, in the liquid of the degreasing liquid or the front liquid or A method of cleaning a metal sheet, comprising attaching a magnet to the liquid surface to remove contaminants separated and removed from the surface of the metal sheet and suspended in the degreasing liquid or the front liquid by adsorbing the magnet to the magnet. 탈지액 또는 정면액을 수용하고, 그 탈지액 중 또는 정면액중으로 통과되는 금속박판에서 그 표면에 부착된 오염물질을 제거하는 처리조와, 이 처리조내에서 금속박판을 반송하는 반송수단을 구비한 금속박판의 세정장치에 있어서, 상기 처리조내에 수용된 탈지액 도는 정면액의 액중 또는 액면에, 금속박판의 표면에 분리제거되어 탈지액 또는 정면액에 부유하고 있는 오염물질을 흡착해서 제거하는 자석을 배열설치한 것을 특징으로하는 금속박막의 세정장치.A metal containing a degreasing liquid or a front liquid, and a treatment tank for removing contaminants adhering to the surface from the metal thin plate passed in the degreasing liquid or the front liquid, and a conveying means for conveying the metal thin plate in the treatment tank. In a thin plate cleaning apparatus, magnets are adsorbed to remove or remove contaminants suspended in the degreasing solution or the front liquid in the liquid or liquid level of the degreasing solution or the front liquid contained in the treatment tank. A cleaning device for metal thin films, which is provided. 제2항에 있어서, 상기 처리조는 전해탈지조 또는 전해정면조이고, 금속박판을 전해 탈지 또는 전해정면하는 전해액의 액중 도는 액면에 자석이 배열설치된 금속박판의 세정장치.The cleaning apparatus of claim 2, wherein the treatment tank is an electrolytic degreasing tank or an electrostatic front bath, and a magnet is arranged on a liquid or liquid level of an electrolytic solution that electrolytically degreases or electrofronts the metal thin plate. 제2항 또는 제3항에 있어서, 금속박판의 양주면에 각각 대향하도록 자석을 배열설치한 금속박판의 세정장치.The cleaning device for metal sheets according to claim 2 or 3, wherein magnets are arranged so as to oppose each of the main surfaces of the metal sheets. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940024058A 1993-10-14 1994-09-24 Metal thin plate cleaning method and cleaning device KR0124479B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP93-281644 1993-10-14
JP5281644A JPH07108235A (en) 1993-10-14 1993-10-14 Method and apparatus for washing thin metal panel

Publications (2)

Publication Number Publication Date
KR950011648A true KR950011648A (en) 1995-05-15
KR0124479B1 KR0124479B1 (en) 1997-12-26

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ID=17641981

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940024058A KR0124479B1 (en) 1993-10-14 1994-09-24 Metal thin plate cleaning method and cleaning device

Country Status (2)

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JP (1) JPH07108235A (en)
KR (1) KR0124479B1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101182267B1 (en) 2010-07-12 2012-09-12 삼성디스플레이 주식회사 Cleaning device
KR101858642B1 (en) 2011-09-29 2018-05-16 한화테크윈 주식회사 Graphene transfer method
KR101372462B1 (en) * 2013-08-14 2014-03-11 주식회사 오피오 Foreign substance removing device
KR102439889B1 (en) * 2021-09-09 2022-09-02 일화마그네틱테크 주식회사 High-efficiency vehicle body washing facility line

Also Published As

Publication number Publication date
KR0124479B1 (en) 1997-12-26
JPH07108235A (en) 1995-04-25

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