KR950007670B1 - Apparatus of a deposition by an evaporating sprayer in a normal pressure - Google Patents

Apparatus of a deposition by an evaporating sprayer in a normal pressure Download PDF

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KR950007670B1
KR950007670B1 KR1019930005443A KR930005443A KR950007670B1 KR 950007670 B1 KR950007670 B1 KR 950007670B1 KR 1019930005443 A KR1019930005443 A KR 1019930005443A KR 930005443 A KR930005443 A KR 930005443A KR 950007670 B1 KR950007670 B1 KR 950007670B1
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metal
plating
gas
deposition
steel sheet
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KR1019930005443A
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Korean (ko)
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KR940021757A (en
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주승기
하서용
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동부제강주식회사
송용호
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/137Spraying in vacuum or in an inert atmosphere
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06Metallic material
    • C23C4/08Metallic material containing only metal elements
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/14Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying for coating elongate material

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating With Molten Metal (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

The apparatus for vapor-plating metal of Zn, Al, Sn, or Pb on a steel plate, consists of a pretreatment section for cleaning the steel plate under a reducing atmosphere, and an evaporating deposition section for plating the vapor metal on the steel plate. The apparatus comprises: an air curtain (3) for forming an air cutoff layer by an inactive gas; a vapor metal supply part (4) including a spraying nozzle (5) for spraying the vapor metal on the steel plate; and a steel transfer part (6) for transferring the steel plate to perform the continuous vapor-plating.

Description

상압 증기분사에 의한 증착도금장치Deposition Plating Equipment by Atmospheric Pressure Steam Injection

제1도는 본 발명과 대비되는 종래의 연속 저진공 증착아연도금장치의 주요부분을 일례로 나타낸 개략 설명도.1 is a schematic explanatory view showing, as an example, the main part of a conventional continuous low vacuum evaporated zinc plating apparatus compared with the present invention.

제2도는 본 발명의 장치 개략 설명도.2 is a schematic illustration of the apparatus of the present invention.

제3도는 제2도에서의 에어커튼의 구조 설명도.3 is an explanatory view of the structure of the air curtain in FIG.

제4도는 제2도에서의 원료중기 공급부 폿(Pot)의 구조설명도.4 is a structural explanatory diagram of a pot of the raw material intermediate supply part in FIG.

제5도는 본 발명에 의한 상압하 연속 증기분사도금 생산설비의 관한 일실시예로서의 라인배치도.5 is a line arrangement diagram as an embodiment of the atmospheric pressure continuous steam injection plating production equipment according to the present invention.

제6도 및 제7도는 종래의 저진공 증착아연도금에 있어서 강판의 입구 및 출구를 완전히 밀폐한 밀폐작업 상태도이다.6 and 7 are closed working state diagrams in which the inlet and the outlet of the steel sheet are completely sealed in the conventional low vacuum evaporated zinc plating.

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

(ㄱ) 전처리 구역(A) pretreatment zone

1 : 강판 장착부 11 : 할로겐 램프(Halogan Lamp)1: Steel plate mounting part 11: Halogen lamp

12 : 기판12: substrate

(ㄴ)증착구역(B) Deposition area

1 : 강판장착부 12 : 기판1: steel plate mounting portion 12: substrate

2 : 셔터(Shutter) 3 : 에어커튼(Air Curtain)2: Shutter 3: Air Curtain

4 : 금속증기공급부 5 : 강판이동부4: metal vapor supply part 5: steel plate moving part

41 : 도금액 폿트 용융금속조 42 : 운반기체 가스라인41: plating liquid pot molten metal bath 42: carrier gas line

43 : 금속조가열로 44 : 노즐43: metal heating furnace 44: nozzle

45 : 노즐가열로 5 : 강판45: nozzle heating furnace 5: steel sheet

본 발명은 에어커튼(Air Curtain)을 이용하여 미리 도금장치의 내부를 산소농도가 낮은 불활성 분위기로 유지시킨 후, 아연(Zn), 납(Pb), 알미늄(Al), 주석 (Sn)등의 원료금속을 비등점 이상으로 가열하여 그 증기를 운반기체로 강판표면에 분사증착하는, 대기압 불활성가스 분위기에서의 증착도금법, 특히 그 중에서도 연속 공정에 의한 고 품질 도금강판의 대량 생산에 적합한 중착도금법을 이용한 중착도금강판의 제조장치에 관한 것이다.According to the present invention, after the inside of the plating apparatus is maintained in an inert atmosphere having low oxygen concentration by using an air curtain, zinc (Zn), lead (Pb), aluminum (Al), tin (Sn), etc. Evaporation plating method in an atmospheric pressure inert gas atmosphere, in which the raw material metal is heated above the boiling point and the vapor is spray-deposited on the surface of the steel sheet by a carrier gas, and in particular, the intermediate plating method suitable for mass production of high quality plated steel sheet by a continuous process The present invention relates to an apparatus for producing an intermediate plated steel sheet.

지금까지 개발된 도금법에는 핫디핑법(Hot Dipping)과 전기도금법, 그리고 최근에 개발된 질소분위기 저진긍 증착법이 있다.The plating methods developed so far include the hot dipping method, the electroplating method, and the recently developed nitrogen atmosphere low positive deposition method.

현재 대부분의 생산라인에 적용되고 있는 핫디핑법(Hot Dipping)은 제조방법이 비교적 단순하고 연속 대량생산이 용이하나 편면도금이 불가능하고 일정한 두께이하의 얇은 도금막의 형성이 어려우며, 형성된 도금층의 표면 및 두께가 불균일한 문제점을 가지고 있다.The hot dipping method currently applied to most production lines has a relatively simple manufacturing method and is easy to continuously mass-produce, but it is difficult to form one-sided plating, and it is difficult to form a thin plate film having a certain thickness or less. Has a non-uniform problem.

전기도금법은 낮은 온도(50∼70℃)의 금속전해액 내에서 전기화학적 반응을 이용하여 도금층을 형성하므로 계면에 철-아연등의 합금층이 형성되지 않으며 도금층의 조직이 매우 치밀하고 균일하다. 따라서, 내식성 및 표면성질이 우수한 고품질의 도금강판을 얻을 수 있으나, 도금막의 두께가 증가함에 따라서 도금층이 형성되는 반응시간이 생산비용이 비례적으조 증가하며 도금충의 형성되는 반응도중에도 계속적으로 전해액을 교환해 주어야 하는 등 여러가지 번거로움과 어려움이 있다.The electroplating method forms a plating layer using an electrochemical reaction in a metal electrolyte at a low temperature (50 to 70 ° C.), so that an alloy layer such as iron-zinc is not formed at the interface, and the structure of the plating layer is very dense and uniform. Therefore, high quality plated steel sheet having excellent corrosion resistance and surface properties can be obtained, but as the thickness of the plated film is increased, the reaction time during which the plated layer is formed increases in proportion to the production cost. There is a lot of hassle and difficulty to do.

진공증착법에서는 전기도금에서와 같이 합금층이 형성이 없고 막의 성질이 우수하며 두께조절도 용이하나 도금물질과 기판을 모두 10-5torr이상의 진공으로 유지해야 하기 때문에 연속적인 대량생산이 어렵다 이러한 어려움을 개선하는 방법으로 질소를 이용하여 10-2torr정도의 진공도를 만들고 이 분위기에서 연속 도금하는 공정에 대한 연구가 세계 여러나라에서 진행되고 있다.In the vacuum deposition method, as in electroplating, there is no alloy layer, excellent film properties, and easy thickness control, but continuous mass production is difficult because both the plating material and the substrate must be maintained at a vacuum of 10 -5 torr or more. As a method of improving, a process of forming a vacuum degree of about 10 -2 torr using nitrogen and performing continuous plating in this atmosphere has been conducted in many countries around the world.

진공증착에 의한 도금강판의 제조법에 따른 장치로서 가장 최근에 개발된 종래의 것으로는 일본특허공보 평 3-73636호(1991년 11월 22일 공고)의 장치를 들 수 있는데 여기에는 진공실을 밀폐하여 그 진공실내에서 강판을 연속 압연함과 동시에 강판표면의 로울간격을 제어하도록 된 장치로 되어 있고 이에 따라 흠 및 결함발생을 방지하기 위한 것으로 통상 증착실의 진공도도 0.01-0.2torr정도로 높게 유지하게 되어 있다.As a device according to the method of manufacturing a plated steel sheet by vacuum deposition, the most recently developed device is Japanese Patent Application Laid-Open No. 3-73636 (November 22, 1991). It is a device to control the roll gap of the steel plate surface while continuously rolling the steel plate in the vacuum chamber, and to prevent the occurrence of flaws and defects, the vacuum degree of the deposition chamber is usually maintained at about 0.01-0.2torr. have.

제1도는 전술한 저진공 증착도금 설비의 주요부 개략도이다. 이 설비는 기존의 용융도금 설비에서 전처리와 스킨패스밀(Skin Pass Mill)사이의 용융금속조와 냉각탑 대신에 새로 개발한 증착도금 설비를 연결한 방식을 취한 것으로 전처리와 후처리에는 기존의 설비를 사용할 수 있도록 하고 있다. 여기에서는 양면도금을 위하여 2개의 증착실(deposition chamber)을 갖추고 있으며, 로울(roll)형의 밀폐장치 (Seal Roller)를 도입부와 도출부와 연속으로 설치하여 진공도를 상압으로 순차적으로 낮추어 증착실을 전술한 바와 같은 진공상태로 유지하고 있다. 제3도와 제4도에는 각각 그 도입부와 도출부에 설치된 밀폐장치를 나타내었다. 도출부에 설치된 각 밀폐장치 사이에는 각각 진공펌프가 여러 단계로 연결되어 있고 여기서 배출된 질소 기체는 정화장치를 거쳐 다시 도금장치로 보내어진다.1 is a schematic view of the main part of the low vacuum deposition plating apparatus described above. This equipment is based on the method of connecting the newly developed evaporation plating equipment instead of the molten metal tank and cooling tower between the pretreatment and the skin pass mill in the existing melt plating equipment. To make it possible. Here, two deposition chambers are provided for double-sided plating, and a roll-type seal roller is installed continuously with the inlet and the outlet, and the vacuum chamber is sequentially lowered to atmospheric pressure. The vacuum is maintained as described above. 3 and 4 show the sealing devices installed in the inlet and the outlet, respectively. A vacuum pump is connected in several stages between each of the sealed devices installed in the lead-out unit, and the nitrogen gas discharged is sent to the plating device through the purification device.

이외에도 전처리 후 도입되는 강판을 냉각하거나 증착도금 후의 강판을 냉각하기 위해 냉각장치 (N2Gas Jet Cooler)와 전처리 과정과 증착장치 사이의 분위기 차단을 위한 질소기체실(N2, Gas Room), 그리고 진공을 만들면서 강판의 도입부에 형성되는 기체흐름에 의해 강판이 냉각되는 효과를 보상해 주는 가열장치(Edge Heater)가 있다.In addition, a cooling system (N 2 Gas Jet Cooler), a nitrogen gas chamber (N 2 , Gas Room) for blocking the atmosphere between the pretreatment process and the deposition apparatus, in order to cool the steel sheet introduced after the pretreatment or the steel plate after the deposition plating. There is a heating device (Edge Heater) to compensate for the effect of cooling the steel sheet by the gas flow formed in the introduction portion of the steel sheet while making a vacuum.

그러나, 위에서 소개한 최근의 일본의 종래기술과 그 외의 기술에서는 증착도금 분위기를 진공으로 유지하여야 하고 그것도 고진공도를 요구하기 때문에 아연도금층 은 양호하게 얻을 수 있으나 막대한 설비비와 설비유지비를 요하고 작업상의 번거로움으로 연속적인 대량생산이 어려우며 작업·설비유지 및 가동이 까다로워 균일품질 유지상 어려움이 뒤따르고 있는 실정이다.However, the recent Japanese prior art and other techniques introduced above have to maintain the deposition plating atmosphere in vacuum and also require high vacuum degree, so that the galvanized layer can be obtained satisfactorily, but it requires enormous equipment cost and maintenance cost. Due to the hassle, continuous mass production is difficult, and it is difficult to maintain uniform quality due to the difficulty in maintaining and operating the equipment.

첨부도면 제6도 및 제7도를 보면 종래의 연속 증착도금작업을 위해 강판의 입구와 출구를 완전히 밀폐하여 진공상태를 유지하고 있음을 알 수 있는데, 이는 작업상 설비고장. 정비작업제어 등에 대단히 불편하여 생산성이 매우 저하된다는 문제점이 있다.Referring to Figures 6 and 7 of the accompanying drawings, it can be seen that the inlet and the outlet of the steel sheet are completely sealed to maintain the vacuum state for the conventional continuous deposition plating operation. It is very inconvenient to control the maintenance work, there is a problem that productivity is very low.

따라서, 본 발명은 상술한 바의 진공설비를 사용하지 않도록 함으로써 막대한 설비비와 설비유지비를 생략하고 아울러 연속작업이 쉽고 설비의 정비교체. 작업콘트롤이 쉽도록 하는 장치를 제공하는데 그 목적이 있다.Therefore, the present invention eliminates enormous equipment costs and equipment maintenance costs by not using the vacuum equipment as described above, and also facilitates continuous operation and maintenance of equipment. The aim is to provide a device that facilitates work control.

본 발명은, 기본적으로 아연, 알미늄, 주석, 납 등의 금속을 강판에 증착도금하기 위한 중착도금장치에 있어서, 중착도금작업성을 높이기 위해 강판표면을 평활히 하고 세척하기 위한 환원성분위기하의 전처리 구역과 외부로부터의 질소등의 불활성 분위기 가스의 흡입에 의한 질소기체막 형성을 위한 에어커튼과 용융금속증기를 가열 ·공급 분사 함으로써 강판표면에 용융금속을 증착도금하기 위해 노즐을 구비한 금속증기공급부 및 이 금속증기가 공급 분사되어 중착도금 되도록 한 강판이동부로 이루어지는 증착도금구역으로 나뉘어 구성되는 것을 특징으로 하는 상압 증기분사에 의한 증착도금장치에 관한 것이다.In the intermediate plating apparatus for depositing and plating metals such as zinc, aluminum, tin, and lead on a steel sheet, the present invention is a pretreatment zone under a reducing atmosphere for smoothing and cleaning the surface of the steel sheet to increase the intermediate plating workability. A metal vapor supply unit having a nozzle for depositing and plating molten metal on the surface of a steel sheet by heating and supplying air curtain and molten metal vapor for forming a nitrogen gas film by suction of an inert atmosphere gas such as nitrogen from the outside and the outside; The vapor deposition plating apparatus according to the atmospheric pressure steam injection, characterized in that the metal vapor is divided into a deposition plating zone consisting of a steel plate moving portion for supply injection sprayed intermediate coating.

본 발명에서는 상술한 목적을 우수한 내식성 및 표면성질을 지니는 고품질 도금강판을 비교적 적은 생산비용으로 제조하기 위하여 대기압의 불활성 분위기하에 분사증착에 의해 도금층을 형성하는, 진공장치가 필요없으며 연속공정이 가능한 도금방법을 개발하였다.In the present invention, in order to produce a high-quality coated steel sheet having excellent corrosion resistance and surface properties at a relatively low production cost, the present invention does not require a vacuum apparatus, which forms a plating layer by spray deposition under an inert atmosphere at atmospheric pressure, and is capable of continuous process plating. The method was developed.

즉, 본 발명은 대기압하의 질소분위기하에 운반기체를 이용하여 기체상의 금속을 강판위에 분산시키기 위해 금속도금층을 형성하는 방법을 창안하고 대기압중착도금 장치의 입구 및 출구에 에어커튼(Air Curtain)을 설치하고 불활성 기체를 아울러 분사시켜주도록 한 장치에 관한 것이다.That is, the present invention creates a method for forming a metal plating layer to disperse a gaseous metal on a steel sheet using a carrier gas under a nitrogen atmosphere under atmospheric pressure, and to provide an air curtain at the inlet and outlet of the atmospheric pressure deposition plating apparatus. It relates to an apparatus for installing and injecting an inert gas as well.

도금장치 내부의 불활성 분위기는 에어커튼(Air Curtain)과 계속적인 도금장치 내부로의 질소유입으로 유지한다. 본 발명에서 고안한 에어커튼은 제5도에서와 같은 구조를 가지고 있는데 이것을 도금장치의 양쪽면에 설치하고 질소를 이용하여 기체차단막을 형성하므로써 도금장치 내외의 분위기를 서로 분리시킬 수 있다. 동시에 계속해서 도금장치 내부로 질소를 불어넣어주어 산소농토가 100ppm이하인 불활성 분위기를 만들어 준다The inert atmosphere inside the plating apparatus is maintained by the air curtain and the inflow of nitrogen into the plating apparatus continuously. The air curtain devised in the present invention has the same structure as in FIG. 5, which is installed on both sides of the plating apparatus and forms a gas barrier film using nitrogen to separate the atmosphere inside and outside the plating apparatus. At the same time, nitrogen is continuously blown into the plating apparatus to create an inert atmosphere with an oxygen concentration of 100 ppm or less.

도금상치의 내부가 대기압이므로 원료아연을 비등점(960℃)이상으로 가열하고 그때 발생되는 증기를 고순도의 질소를 운반기체로 사용하여 노즐을 통해 강판에 분사시켜 중착도금막을 형성한다.Since the inside of the plating phase is atmospheric pressure, the raw material zinc is heated above the boiling point (960 ° C.), and the vapor generated at that time is sprayed onto the steel sheet through a nozzle using high purity nitrogen as a carrier gas to form an intermediate plating film.

이하에 본 발명상의 일실예로서 아연증착도금을 할때의 본 발명의 장치구성 및 작용효과를 보다 상세히 설명 한다Hereinafter, as an example of the present invention will be described in more detail the device configuration and operation effects of the present invention when zinc deposition plating;

제2도는 본 발명상의 장치를 일례를 들어 나타낸 것이다 이 장치는 크게 전처리구역(ㄱ)과 증착도금구역(ㄴ)으로 나누어져 있다. 또한 상기 전처리구역(ㄱ)과 증착도금구역(ㄴ)은 셔터 (2)에 의하여 완전히 상호 차단 되어 있다.2 shows an example of the apparatus of the present invention. The apparatus is largely divided into a pretreatment zone (a) and a deposition plating zone (b). In addition, the pretreatment zone (a) and the deposition plating zone (b) is completely blocked by the shutter (2).

이 셔터(2)는 상부에 셔터(2)를 수납하는 셔터부(21)가 있고 이 셔터수납부 (21)의 일측면 및 하단부를 제외한 부위는 모두 외부와 봉쇄되어 막혀 있다The shutter 2 has a shutter 21 for accommodating the shutter 2 thereon, and all parts except one side and the lower end of the shutter accommodating portion 21 are sealed off from the outside.

상기 셔터수납부(21)의 일측면으로 불활성 가스로서 질소(N2)가스를 들어가서 증착구역(ㄴ)으로 흡입되도록 되어 있다. 물론 질소(N2)가스를 상기셔터수납부(21)를 통하지 않고 직접 증착구역(ㄴ)으로 흡입시켜도 좋다.Nitrogen (N 2 ) gas enters one side of the shutter housing 21 as an inert gas and is sucked into the deposition zone b. Of course, the nitrogen (N 2 ) gas may be sucked directly into the deposition zone b without passing through the shutter housing 21.

상기 전처리구역(ㄱ)은 그 내부에 강판(S)을 얹어 놓을 수 있는 기판(12)이 설치되고 이 기판위로 할로겐램프(11)를 다수 장착하여 전처리와 증착작업도중의 강판온도를 조절하여 준다.The pretreatment zone (a) is provided with a substrate (12) on which the steel plate (S) can be placed, and a plurality of halogen lamps (11) are mounted on the substrate to control the temperature of the steel sheet during the pretreatment and deposition operations. .

또한, 상기 후처리 구역은 증착구역(ㄴ)으로서 에어커튼(3)과 금속증기공급부 (4), 강판이동부(5)로 대별되어 구성되어 있다. 에어커튼(3)은 제3도에서 보는바와같이 알곤(Ar)이나 질소기체 불활성 가스로 차단막을 형성케 하여 장치의 내부와 외부의 분위기를 차단케 하는 것으로 단면이 통상 벌집(33) 형태로 구성되고 상부는 질소(N2)등 불활성 가스 유입구(31)를 배설하며 이 가스의 내부에서의 균일한 분배를 위하여 그 상부 양 옆으로 비스듬히 유도날개(32)를 통상 장착한다The post-treatment zone is composed of an air curtain 3, a metal vapor supply section 4, and a steel plate moving section 5 as deposition zones b. As shown in FIG. 3, the air curtain 3 forms a blocking film with argon (Ar) or a nitrogen inert gas to block the atmosphere inside and outside the apparatus. The upper part is inert gas inlet 31, such as nitrogen (N 2 ), and the induction blades 32 are usually mounted obliquely on both sides thereof for uniform distribution in the interior of the gas.

이에 따라 본원장치의 후처리구역인 증착구역(ㄴ)은 장치내부가 에어커튼(3)과 셔터부(2)로 부터 흡입되는 질소(N2)가스의 유입으로 항상 불활성 분위기가 유지된다. 여기에서 증착도금의 원료가 아연(Zn)인 경우를 일실시예로 들어 설명하기로 한다.Accordingly, the deposition zone (b), which is a post-treatment zone of the present apparatus, is always maintained in an inert atmosphere due to the inflow of nitrogen (N 2 ) gas sucked from the air curtain 3 and the shutter portion 2 inside the apparatus. Here, the case where the raw material of the deposition plating is zinc (Zn) will be described as an example.

아연증기 공급부(4)는 제2도 및 제4도에서 도시된 바와 같이 아연중기를 공급하기 위한 아연조(41)와, 이 아연조(41)에 아연증기를 분사시키기 위해 운반기체를 유입시키는 가스라인(42), 이 아연조(41)와 가스 라인(42) 전체를 아연의 비등점 이상으로 가열해 주는 아연조 가열로(43), 또한 상기 아연조(41)로 부터 아연증기를 분사 공급시켜 주는 통상 선형으로 된 노즐(44) 및 이 노즐(44)르 양측으로 가열해 주어 유동도를 유지해 주기 위한 노즐가열로(45)(도시안됨)와로 구성되는데. 이 아연증기 공급부(4)에서 아연증기가 노즐(44)을 통과하여 분사되는 동안 강판(S)이 노즐(44) 위를 연속적으로 통과하게 되므로 연속증착도금의 이루어진다. 이때 아연중기가 노즐(44)을 통과하는 동안 응고되어 노즐(44)에 달라붙지 않도록 노즐(44)을 가열 또는 보열해 주어야 한다.As shown in FIGS. 2 and 4, the zinc vapor supply unit 4 includes a zinc tank 41 for supplying zinc heavy steam and a carrier gas for injecting zinc vapor into the zinc tank 41. Zinc-line heating furnace 43 for heating the gas line 42, the zinc tank 41 and the entire gas line 42 above the boiling point of zinc, and also supplying and supplying zinc vapor from the zinc tank 41. It consists of a nozzle 44 of a linear shape and a nozzle heating furnace 45 (not shown) for heating the nozzles 44 on both sides to maintain fluidity. Since the zinc vapor is injected through the nozzle 44 in the zinc vapor supply part 4, the steel sheet S continuously passes over the nozzle 44, so that the continuous vapor deposition is performed. At this time, the zinc 44 should be heated or heated to prevent solidification while passing through the nozzle 44 to stick to the nozzle 44.

상술한 바의 본 발명상의 장치에 있어 전처리구역(ㄱ)내에 강판을 공급하고 예컨데 10m torr 정도의 진공으로 만든 뒤 N2: H2가스를 적정비율로 혼합한 뒤 퍼징하여 환원성분위기를 조성한다. 다음 퍼징을 계속하면서 강판을 가열하여 전처리 작업을 행하는데 이때 강판표면의 철산화물을 환원시켜 주고 이에 따라 고르게 되고 세척되는 강판과 아연도금막 사이의 밀착성이 개선된다In the apparatus according to the present invention as described above, the steel sheet is supplied into the pretreatment zone (a) and, for example, made into a vacuum of about 10 m torr, and then mixed with N 2 : H 2 gas at an appropriate ratio to purge to form a reducing component atmosphere. The steel plate is heated to perform pretreatment while continuing the next purging process, which reduces the iron oxide on the surface of the steel plate, thereby leveling and improving the adhesion between the steel plate and the zinc plated film to be cleaned.

상술한 전처리가 완료되면 강판(S)을 냉각시킨 후 셔터 (2)를 열로 인출하여 이미 질소 분위기로 유지되어 있는 증착구역(ㄴ)으로 이동시킨다.When the above-described pretreatment is completed, the steel sheet S is cooled, and the shutter 2 is extracted with heat to move to the deposition zone b that is already maintained in a nitrogen atmosphere.

증착구역(ㄴ)내에는 제 2도에서 도시된 바와 같이 일단측에 에어커튼(3)이 설치되어 질소가스(N2)의 유입으로 질소기체차단막이 형성되고, 이 불활성 분위기하에서 강판이 증착도금 되는 것이다.In the deposition zone b, as shown in FIG. 2, an air curtain 3 is installed at one end, and a nitrogen gas barrier film is formed by inflow of nitrogen gas N 2 , and the steel sheet is deposited in this inert atmosphere. Will be.

한편, 원료아연을 담은 전술한 아연조(41)와 이 아연조(41)를 가열하는 아연조가열로(43)는 제2도에 도시된 바와 같이 장치의 하면에 설치하연 상향 증기분사도금이 되도록 하고 온도조절기를 이용하여 아연조(41)를 원하는 온도로 일정하게 유지되도록 한다. 또한, 운반기체는 아연조의 바깥쪽을 돌아 들어오도록 하여 예열시켜주므로써 분사되는 증기가 유입되는 운반기체에 의해 크게 냉각되지 않도록 한다On the other hand, the above-described zinc bath 41 containing the raw zinc and the zinc bath heating furnace 43 for heating the zinc bath 41 is installed in the lower surface of the apparatus as shown in FIG. And using the thermostat to keep the zinc bath 41 constant at the desired temperature. In addition, the carrier gas is preheated by returning the outer side of the zinc bath so that the injected vapor is not greatly cooled by the inlet carrier gas.

이상의 일실시예로 설명한 도금액폿트(Pot) 또는 용융금속조(41)상의 금속증기 분무장치는 제4도에 상세히 도시된 바와 같이 상기 용융금속조(41)내에 용융된 아연이나, 알미늄, 주석등의 금속을 증착에 의해 도금하는데 있어 도금막을 형성하기 위해 운반기체가스라인(42)을 상기 용융금속조(41)내외로 장착하여 기체 아연등의 기체금속에 압력을 가진 운반기체 흐름을 불어넣어 노즐(44)을 통해 상향 분사되도록 한다The metal vapor spraying device on the plating liquid pot or the molten metal bath 41 described in the above-described embodiment is zinc, aluminum, tin, etc. melted in the molten metal bath 41 as shown in detail in FIG. In order to form a plating film in the plating of a metal by deposition, a carrier gas line 42 is mounted inside and outside the molten metal bath 41 to blow a carrier gas flow having a pressure to a gas metal such as gas zinc and a nozzle. To be jetted upward through (44)

제 5도는 상술한 본 발명상의 장치를 연속도금생산설비로 전환케 하기 위한 증착도금라인 배치도의 일실시예를 도시한 것이다. 하부 전처리구역(ㄱ)을 통과한 강판(S)은 질소와 수소와의 혼합가스로 환원성분위기가 조성되는 전처리구역(ㄱ)을 지나 밀폐된 셔터(2)의 중앙개구부를 통과한 다음, 예컨데 질소(N2)가스 퍼징되어 불활성 분위기하에 있는 후처리구역인 증착구역(ㄴ)으로 들어가게 되고, 도금액폿트(41)로부터 운반기체이송라인(42)을 통해 분사되는 운반기체가 아연(Zn), 납(Pb), 알미늄(Al), 주석 (Sn)등의 증착금속 중기가 노즐부(5)를 통해 캉판(S)의 양면까지도 동시에 분사가능하도록 한 증착도금장치에 의하여 연속이동되는 강판(S)은 소정의 두께로 증착도금 되는 것으로 되어 있다.5 shows one embodiment of a deposition plating line arrangement for converting the above-described apparatus of the present invention into a continuous plating production facility. The steel sheet (S) passing through the lower pretreatment zone (a) passes through the central opening of the closed shutter (2) through the pretreatment zone (a) where a reducing component atmosphere is formed by a mixed gas of nitrogen and hydrogen, and then, for example, nitrogen (N2) The gas is purged and enters the deposition zone b, which is a post-treatment zone under an inert atmosphere, and the carrier gas injected from the plating liquid pot 41 through the carrier gas transfer line 42 is zinc (Zn), lead ( Steel plate S continuously moved by a deposition plating apparatus in which deposited metal heavy metals such as Pb), aluminum (Al), tin (Sn), and the like can be simultaneously sprayed on both sides of the can plate (S) through the nozzle unit (5). It is supposed to be deposited by a predetermined thickness.

제5도 상부의 에어커튼(3)은 전술한 바와 같이 외부로부터 질소. 알곤 등의 불활성가스 흡입에 의해 퍼징되어 발생되는 질소기체에 의한 대기차단막을 형성하는 역할을 한다.The air curtain 3 above FIG. 5 is nitrogen from the outside as described above. It serves to form an air barrier membrane by nitrogen gas generated by purging by inhalation of inert gas such as argon.

발명은 전술한 바와 같이 종래의 증착도금라인에·막대한 비용이 소요되는 진공실 설치 및 밀폐식 진공하의 번거롭고도 불완전한 조업방식과 달리, 외부로부터 환원분위기 또는 불활성분위기를 조성하기 위한 불활성기체 또는 환원성분위기 조성용 기체를 흡입시키고 이러한 분위기를 조성함으로써 종래이 밀폐식 진공 분위기 조업에 비하여 일층 작업 및 설비고장, 정비를 용이하게 할 수 있도록 한 오픈(개방)스타일의 증착도금장치를 제공할 수 있게 하여주므로써 막대한 설비비의 절감은 물론 생산성, 작업성에 획기적인 개선효과를 가져오게 할 수 있게 하였다.As described above, in contrast to the cumbersome and incomplete operation of a vacuum chamber and a closed vacuum in a conventional deposition plating line, which requires a huge cost, an inert gas or a reducing component composition for forming a reducing atmosphere or an inert atmosphere from the outside is disclosed. By inhaling gas and creating such an atmosphere, it is possible to provide an open (open) style deposition plating apparatus that can facilitate further work, equipment failure, and maintenance compared to a closed vacuum atmosphere operation. In addition to reducing the cost, the company has also been able to bring dramatic improvements in productivity and workability.

Claims (3)

아연, 알미늄, 주석, 납 등의 금속을 강판에 중착도금하기 위한 증착도금장치에 있어서, 증착도금작업성을 높이기 위해 강판표면을 평활히 하고 세척하기 위한 환원성 분위기하의 전처리구역(ㄱ)과 강판을 증착 도금하게 되는 ㄴ으로 나뉘어지고 이 증착도금은 외부로 부터의 질소등의 불활성 분위기 가스의 흡입에 의한 알곤, 질소 등의 불활성 가스에 의한 공기차단막 형성을 위한 에어커튼(3)과 용융 금속중기를 가열 ·공급 분사 함으로써 강판표면에 용융금속을 증착도금하기 위해 분사노즐(5)을 구비한 금속증기공급부(4) 및 이 금속중기가 공급, 분사되어 연속적으로 증착도금되도록 한 강판이동부(6)와로 구성되는 것을 특징으로 하는 상압증기분사에 의한 증착도금장치.In the deposition plating apparatus for the intermediate plating of metals such as zinc, aluminum, tin, and lead on a steel sheet, the pretreatment zone (a) and the steel sheet under a reducing atmosphere for smoothing and cleaning the surface of the steel sheet to increase deposition plating workability The deposition plating is divided into two parts, and the deposition plating is carried out by the air curtain 3 and the molten metal heavy metal for forming an air barrier film by argon, inert gas such as nitrogen by inhalation of inert atmosphere gas such as nitrogen from the outside. Metal vapor supply section 4 having injection nozzles 5 for depositing molten metal on the surface of steel sheet by heating and supplying spraying, and steel sheet moving section 6 for supplying, spraying and continuously depositing metal plating. Deposition plating apparatus by atmospheric steam injection, characterized in that consisting of and. 제1항에 있어서, 상기 금속증기공급부(4)에는 금속중기를 공급하기 위한 통상의 금속용융조(41)를 포함구성하고, 이 금속용융조(4)내에는 금속증기를 분사노즐(44)로 분사시키기 위해 금속중기를 운반하는 운반기체가스라인(42)이 내장되고 이 금속용융조(41)와 이 운반기체가스라인(42)전체를 아래로부터 감싸고 금속의 비등점이상으로 금속을 가열해 주기 위한 금속용융가열로(43)가 상기 용융(4)하부에 구성되도록 한 것을 특징으로 하는 상압증기분사에 의한 증착도금장치.The metal vapor supply unit (4) comprises a conventional metal melting tank (41) for supplying heavy metals, and the metal vapor injection nozzle (44) is provided in the metal melting tank (4). The carrier gas gas line 42 carrying the heavy metal for injection into the furnace is embedded and the metal melting tank 41 and the whole carrier gas gas line 42 are covered from below and the metal is heated above the boiling point of the metal. Evaporation plating apparatus by atmospheric steam injection, characterized in that the metal melting heating furnace 43 is configured to be formed under the melting (4). 제1항에 있어서, 상기 에어커튼(3)은 질소등의 불활성가스가 유입되도록 한 다수의 가스유입구(31) 및 유입된 가스가 고르게 분포되도록 한 유도날개(32)와 그 단면내부가 벌집망조직(33)으로 구성되고 상기 가스유입구(31)의 반대편이 개구되어 증착도금구역(ㄴ)으로 상기 질소등의 불활성가스에 의한 기체차폐막을 형성하도록 한 것을 특징으로 하는 상압증기분사에 의한 증착도금장치.According to claim 1, The air curtain (3) is a plurality of gas inlet 31 for introducing an inert gas, such as nitrogen, and the induction blade (32) to distribute the introduced gas evenly and the inner surface of the honeycomb network Deposition plating by atmospheric steam injection, comprising a structure 33 and having an opposite side of the gas inlet 31 opened so as to form a gas shielding film by an inert gas such as nitrogen into the deposition plating zone b. Device.
KR1019930005443A 1993-03-31 1993-03-31 Apparatus of a deposition by an evaporating sprayer in a normal pressure KR950007670B1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100366787C (en) * 2003-08-08 2008-02-06 查姆株式会社 Film-plating device and method, and film-plating chamber special for said film-plating device
KR101347259B1 (en) * 2012-02-16 2014-01-06 성안기계 (주) Evaporating apparatus of organic matter

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100366787C (en) * 2003-08-08 2008-02-06 查姆株式会社 Film-plating device and method, and film-plating chamber special for said film-plating device
KR101347259B1 (en) * 2012-02-16 2014-01-06 성안기계 (주) Evaporating apparatus of organic matter

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